JPS59147240A - Evaporation quantity monitor - Google Patents
Evaporation quantity monitorInfo
- Publication number
- JPS59147240A JPS59147240A JP2241983A JP2241983A JPS59147240A JP S59147240 A JPS59147240 A JP S59147240A JP 2241983 A JP2241983 A JP 2241983A JP 2241983 A JP2241983 A JP 2241983A JP S59147240 A JPS59147240 A JP S59147240A
- Authority
- JP
- Japan
- Prior art keywords
- light
- space
- metal
- substrate
- vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/255—Details, e.g. use of specially adapted sources, lighting or optical systems
Abstract
Description
【発明の詳細な説明】 本発明は蒸発量モニタに関するものである。[Detailed description of the invention] The present invention relates to an evaporation amount monitor.
兵学蒸着方法やスパッタリングにおいて、高分子フィル
ム等の基体に付着する蒸着金属等の厚さを制御すること
は、その蒸着フィルム等の各種特性を決めるうえで′、
非常に重要な作業となっている。In the military vapor deposition method and sputtering, controlling the thickness of the deposited metal attached to the substrate such as a polymer film is important in determining the various characteristics of the deposited film.
This is a very important work.
そのために従来は、例えば原子吸光式モニタを用いてい
るが、基体が帯状物等の場合には、基体の全幅方向に亘
る蒸発物質全体の吸光度を測定するかまたは光路の一部
に蒸発物質を流入させるような方式が用いられていた。For this purpose, for example, an atomic absorption monitor is conventionally used, but if the substrate is a strip, the absorbance of the entire evaporated substance over the entire width of the substrate is measured, or the evaporated substance is placed in a part of the optical path. A method was used that allowed the water to flow in.
それ故、前者の場合には蒸発物質の幅方向の平均値であ
り、後者の場合には幅方向の一部の舶Ｃあり、いずれも
、幅方向の各部の蒸発物質の間を測定づることができな
い欠点があった。Therefore, in the former case, it is the average value of the evaporated substance in the width direction, and in the latter case, there is a part of the vessel C in the width direction.In both cases, it is the average value of the evaporated substance in the width direction. There was a drawback that it could not be done.
また、光源から受光部までの光路を金属製の円筒等によ
り形成しているために、光路が直線的で、発光部と受光
部との位置合わＩの調整が困難である欠点があった。Furthermore, since the optical path from the light source to the light receiving section is formed by a metal cylinder or the like, the optical path is linear, which makes it difficult to adjust the alignment I between the light emitting section and the light receiving section.
本発明は、以上の欠点を改良し、基体の任意の箇所の蒸
発量を測定できかつ組み立ての容易な蒸発量モニタの提
供を［１的とするものである。One object of the present invention is to improve the above-mentioned drawbacks and provide an evaporation amount monitor that can measure evaporation amount at any location on a substrate and is easy to assemble.
本発明は、上記の目的を達成するために、原子吸光式の
蒸発量モニタにおいて、発光部と受光部との間に光ファ
イバーを設け、該光ファイバ二を通し前記発光部からの
光を前記受光部に導くことを特徴とする蒸発量モニタを
提供するものである。In order to achieve the above object, the present invention provides an atomic absorption type evaporation monitor in which an optical fiber is provided between a light emitting part and a light receiving part, and the light from the light emitting part is passed through the optical fiber 2 to the light receiving part. The present invention provides an evaporation amount monitor that is characterized in that it leads to
以下、本発明の実施例を図面に基づいて説明する。Embodiments of the present invention will be described below based on the drawings.
図において、１は、高分子フィルム等の帯状の基体であ
り、キレン２の表面を走ｂ Ｌでいる。３は、ルツボな
との蒸発源であり、アルミャ】亜鉛、コバル１−、ニラ
クル等の金属４が収容されている。In the figure, numeral 1 is a strip-shaped substrate such as a polymer film, and it runs along the surface of the glass 2. 3 is an evaporation source of a crucible, which contains metals 4 such as alumina, zinc, cobal, and niracle.
５はボローカソードランプ等からなる発光部である。６
は光電子増倍管等からなる受光部である。Reference numeral 5 denotes a light emitting section consisting of a borrowed cathode lamp or the like. 6
is a light receiving section consisting of a photomultiplier tube or the like.
７ａ及び７ｂは一端が各々発光部５及び受光部６に取り
付（）られた光ファイバーであり、他端が互いに、発光
部５からの光が受光部６に導かれるように、基体１の下
方の任意の位置に配置されている。7a and 7b are optical fibers whose one ends are attached to the light emitting section 5 and the light receiving section 6, respectively, and whose other ends are attached below the base 1 so that the light from the light emitting section 5 is guided to the light receiving section 6. placed at any position.
づなわら、蒸Ｊｅ源３を抵抗加熱や高周波加熱し、収容
されている金属４を治融し蒸発さける。蒸発し１＝金属
は基体１に何着づるが、付着づる途中で光ファイバー７
ａ及び７ｂの端に設（）られた空間８を通る。そのため
に、発光部５からの光の透過率が金属蒸気によって減少
し、この透過光を受光部６で受光づることにｊ：つて空
間８が位置する箇所の蒸着金属の付着速成が測定できる
。しかも、光ファイバー７８及び７ｂは従来の金属製の
筒に比べて柔軟性に富み、任意の位置に空間８を設定て
きるので、基体１の幅方向について任意の箇所の蒸着金
属の付着速度にしたがって蒸着量を測定できる。また、
発光部５と受光部６とは、どんなにズしていても光ファ
イバー７８及び７ｂを任意の形の光路にすることによっ
て、光を発光部５から受光部６に導くことができるので
、取りイ」（ブが容易になる。In other words, the vaporized Je source 3 is subjected to resistance heating or high frequency heating to melt and evaporate the metal 4 contained therein. Evaporation 1 = How many metals are attached to the substrate 1, but in the middle of the attachment, the optical fiber 7
It passes through the space 8 provided at the ends of a and 7b. Therefore, the transmittance of light from the light emitting section 5 is reduced by the metal vapor, and by receiving this transmitted light at the light receiving section 6, it is possible to measure the deposition rate of the vapor deposited metal at the location where the space 8 is located. Moreover, the optical fibers 78 and 7b are more flexible than conventional metal tubes, and the space 8 can be set at any position, so that the space 8 can be set at any position in accordance with the deposition rate of the vapor-deposited metal at any position in the width direction of the base 1. Deposition amount can be measured. Also,
Even if the light emitting part 5 and the light receiving part 6 are misaligned, the light can be guided from the light emitting part 5 to the light receiving part 6 by making the optical fibers 78 and 7b into an optical path of an arbitrary shape. (It becomes easier.
以上の通り、本発明によれば、光路に光）７・イバーを
用いているので、基体の幅方向の１工意の箇所の蒸着量
を容易に測定ひき特性の良い蒸着フィルム等を製造でき
、また、製造の容易な蒸発量モニタが１与られる。As described above, according to the present invention, since an optical fiber is used in the optical path, it is possible to easily measure the amount of vapor deposited at a single point in the width direction of the substrate, and to produce a vapor-deposited film with good characteristics. , and an easy-to-manufacture evaporation monitor.
図は本発明の実施例を用いた蒸着装置の内部の側面図を
示づ。
５・・・発光部、 ６・・・受光部、
７ａ、７ｂ・・・光ファイバー。
特許出願人 日立コンデンサ株式会社The figure shows a side view of the interior of a vapor deposition apparatus using an embodiment of the present invention. 5... Light emitting section, 6... Light receiving section, 7a, 7b... Optical fiber. Patent applicant Hitachi Capacitor Co., Ltd.
Claims (1)
部とに光ファイバーを取り（＝ＪＵ、該光ファイバーを
通しＣ前記光源からの光を前記受光部に導くことを特徴
とする蒸発量モニタ。(1) An atomic absorption type evaporation monitor characterized in that an optical fiber is provided between the light source and the light receiving section (=JU, and the light from the light source C is guided to the light receiving section through the optical fiber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2241983A JPS59147240A (en) | 1983-02-14 | 1983-02-14 | Evaporation quantity monitor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2241983A JPS59147240A (en) | 1983-02-14 | 1983-02-14 | Evaporation quantity monitor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS59147240A true JPS59147240A (en) | 1984-08-23 |
Family
ID=12082146
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2241983A Pending JPS59147240A (en) | 1983-02-14 | 1983-02-14 | Evaporation quantity monitor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59147240A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6060109A (en) * | 1996-03-27 | 2000-05-09 | Nisshin Steel Co., Ltd. | Atomic absorption analysis for measuring and controlling the amount of a metal vapor in vapor deposition coating line and apparatus therefor |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3899688A (en) * | 1972-11-24 | 1975-08-12 | Jacques A Perieres | Device for checking the content of hydrocarbons in a mixture of water and hydrocarbons |
| JPS5376088A (en) * | 1976-12-17 | 1978-07-06 | Mitsui Shipbuilding Eng | Particle concentration detector |
| JPS551574A (en) * | 1978-06-20 | 1980-01-08 | Matsushita Electric Ind Co Ltd | Fine particle detector |
-
1983
- 1983-02-14 JP JP2241983A patent/JPS59147240A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3899688A (en) * | 1972-11-24 | 1975-08-12 | Jacques A Perieres | Device for checking the content of hydrocarbons in a mixture of water and hydrocarbons |
| JPS5376088A (en) * | 1976-12-17 | 1978-07-06 | Mitsui Shipbuilding Eng | Particle concentration detector |
| JPS551574A (en) * | 1978-06-20 | 1980-01-08 | Matsushita Electric Ind Co Ltd | Fine particle detector |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6060109A (en) * | 1996-03-27 | 2000-05-09 | Nisshin Steel Co., Ltd. | Atomic absorption analysis for measuring and controlling the amount of a metal vapor in vapor deposition coating line and apparatus therefor |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20100180818A1 (en) | Dynamic Film Thickness Control System/Method and its Utilization | |
| JPH0377873B2 (en) | ||
| EP1326097A3 (en) | Process for forming a thin film and apparatus therefor | |
| CA1268618A (en) | Method for making an optical waveguide element | |
| JPS59147240A (en) | Evaporation quantity monitor | |
| CA2098447A1 (en) | Vapour-deposition material for the production of optical coatings of medium refractive index | |
| KR20160104190A (en) | Apparatus and mehtod for measuring a deposition rate | |
| SE8205395D0 (en) | METHOD AND APPARATUS FOR THE VAPOR DEPOSIT OF MATERIAL UPON A SUBSTRATE | |
| US3541301A (en) | Source for evaporation in a vacuum | |
| JPH0130909B2 (en) | ||
| JPS5424983A (en) | Weathering resistant film for reflecting heat rays | |
| JPS5739172A (en) | Apparatus for preparing thin film | |
| SU889743A1 (en) | Evaporator | |
| JPS648521A (en) | Optical recording medium | |
| JPS6472193A (en) | Backlight apparatus for liquid crystal display element | |
| JPH0730447B2 (en) | Thin film formation method | |
| JPS5581440A (en) | Electron tube with photoelectric screen and its manufacturing method | |
| GB1084591A (en) | Improvements in and relating to laser apparatus and to the manufacture thereof | |
| JPH04183864A (en) | Vacuum film forming device and production of vapor deposited film | |
| SU605860A1 (en) | Vacuum device for depositing films | |
| JPS58164779A (en) | Vapor deposition apparatus | |
| JPS57197505A (en) | Thin film lens | |
| Gates | Notes on the Evaporation of Thin Metallic Films | |
| JPH09145609A (en) | Vapor deposition speed measurement instrument for vapor deposition device | |
| JPH07120624A (en) | Light source device |