JPS59145525A - レジスト現像方法 - Google Patents

レジスト現像方法

Info

Publication number
JPS59145525A
JPS59145525A JP2005683A JP2005683A JPS59145525A JP S59145525 A JPS59145525 A JP S59145525A JP 2005683 A JP2005683 A JP 2005683A JP 2005683 A JP2005683 A JP 2005683A JP S59145525 A JPS59145525 A JP S59145525A
Authority
JP
Japan
Prior art keywords
development
sample
chamber
laminar flow
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005683A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0144011B2 (enrdf_load_stackoverflow
Inventor
Katsunobu Nakagawa
中川　勝信
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp, Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electronics Corp
Priority to JP2005683A priority Critical patent/JPS59145525A/ja
Publication of JPS59145525A publication Critical patent/JPS59145525A/ja
Publication of JPH0144011B2 publication Critical patent/JPH0144011B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005683A 1983-02-09 1983-02-09 レジスト現像方法 Granted JPS59145525A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005683A JPS59145525A (ja) 1983-02-09 1983-02-09 レジスト現像方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005683A JPS59145525A (ja) 1983-02-09 1983-02-09 レジスト現像方法

Publications (2)

Publication Number Publication Date
JPS59145525A true JPS59145525A (ja) 1984-08-21
JPH0144011B2 JPH0144011B2 (enrdf_load_stackoverflow) 1989-09-25

Family

ID=12016413

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005683A Granted JPS59145525A (ja) 1983-02-09 1983-02-09 レジスト現像方法

Country Status (1)

Country Link
JP (1) JPS59145525A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62195118A (ja) * 1986-02-21 1987-08-27 Hitachi Ltd フオトレジスト現像装置
CN104714376B (zh) * 2015-04-02 2018-09-18 合肥鑫晟光电科技有限公司 一种显影设备及显影方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104849968B (zh) * 2015-05-28 2019-12-31 合肥京东方光电科技有限公司 一种显影机及显影方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS513173A (en) * 1974-06-25 1976-01-12 Matsushita Electric Industrial Co Ltd Hakumakupataanseizosochi
JPS5575223A (en) * 1978-12-04 1980-06-06 Fujitsu Ltd Manufacturing semiconductor device
JPS565312U (enrdf_load_stackoverflow) * 1979-06-25 1981-01-17
JPS5727168A (en) * 1980-07-28 1982-02-13 Hitachi Ltd Equipment for wet treatment
JPS57117237A (en) * 1981-01-13 1982-07-21 Toshiba Corp Manufacturing device for semiconductor device
JPS57192955A (en) * 1981-05-25 1982-11-27 Toppan Printing Co Ltd Developing method

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS513173A (en) * 1974-06-25 1976-01-12 Matsushita Electric Industrial Co Ltd Hakumakupataanseizosochi
JPS5575223A (en) * 1978-12-04 1980-06-06 Fujitsu Ltd Manufacturing semiconductor device
JPS565312U (enrdf_load_stackoverflow) * 1979-06-25 1981-01-17
JPS5727168A (en) * 1980-07-28 1982-02-13 Hitachi Ltd Equipment for wet treatment
JPS57117237A (en) * 1981-01-13 1982-07-21 Toshiba Corp Manufacturing device for semiconductor device
JPS57192955A (en) * 1981-05-25 1982-11-27 Toppan Printing Co Ltd Developing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62195118A (ja) * 1986-02-21 1987-08-27 Hitachi Ltd フオトレジスト現像装置
CN104714376B (zh) * 2015-04-02 2018-09-18 合肥鑫晟光电科技有限公司 一种显影设备及显影方法

Also Published As

Publication number Publication date
JPH0144011B2 (enrdf_load_stackoverflow) 1989-09-25

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