JPS59135728A - 電子ビ−ム露光方法 - Google Patents

電子ビ−ム露光方法

Info

Publication number
JPS59135728A
JPS59135728A JP954783A JP954783A JPS59135728A JP S59135728 A JPS59135728 A JP S59135728A JP 954783 A JP954783 A JP 954783A JP 954783 A JP954783 A JP 954783A JP S59135728 A JPS59135728 A JP S59135728A
Authority
JP
Japan
Prior art keywords
rectangular
electron beam
cross
exposure
section
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP954783A
Other languages
English (en)
Japanese (ja)
Other versions
JPH047090B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Kenji Nakagawa
健二 中川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP954783A priority Critical patent/JPS59135728A/ja
Publication of JPS59135728A publication Critical patent/JPS59135728A/ja
Publication of JPH047090B2 publication Critical patent/JPH047090B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Electron Beam Exposure (AREA)
JP954783A 1983-01-24 1983-01-24 電子ビ−ム露光方法 Granted JPS59135728A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP954783A JPS59135728A (ja) 1983-01-24 1983-01-24 電子ビ−ム露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP954783A JPS59135728A (ja) 1983-01-24 1983-01-24 電子ビ−ム露光方法

Publications (2)

Publication Number Publication Date
JPS59135728A true JPS59135728A (ja) 1984-08-04
JPH047090B2 JPH047090B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-02-07

Family

ID=11723297

Family Applications (1)

Application Number Title Priority Date Filing Date
JP954783A Granted JPS59135728A (ja) 1983-01-24 1983-01-24 電子ビ−ム露光方法

Country Status (1)

Country Link
JP (1) JPS59135728A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5843603A (en) * 1995-08-25 1998-12-01 Kabushiki Kaisha Toshiba Method of evaluating shaped beam of charged beam writer and method of forming pattern
JP2017143187A (ja) * 2016-02-10 2017-08-17 株式会社ニューフレアテクノロジー 成形アパーチャアレイの評価方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5843603A (en) * 1995-08-25 1998-12-01 Kabushiki Kaisha Toshiba Method of evaluating shaped beam of charged beam writer and method of forming pattern
JP2017143187A (ja) * 2016-02-10 2017-08-17 株式会社ニューフレアテクノロジー 成形アパーチャアレイの評価方法

Also Published As

Publication number Publication date
JPH047090B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-02-07

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