JPS5887253U - electron beam source - Google Patents

electron beam source

Info

Publication number
JPS5887253U
JPS5887253U JP18387381U JP18387381U JPS5887253U JP S5887253 U JPS5887253 U JP S5887253U JP 18387381 U JP18387381 U JP 18387381U JP 18387381 U JP18387381 U JP 18387381U JP S5887253 U JPS5887253 U JP S5887253U
Authority
JP
Japan
Prior art keywords
electron beam
beam source
emission surface
heating current
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18387381U
Other languages
Japanese (ja)
Other versions
JPH0143809Y2 (en
Inventor
出沢　正徳
英一 後藤
染谷　輝夫
Original Assignee
日本電子株式会社
理化学研究所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本電子株式会社, 理化学研究所 filed Critical 日本電子株式会社
Priority to JP18387381U priority Critical patent/JPS5887253U/en
Publication of JPS5887253U publication Critical patent/JPS5887253U/en
Application granted granted Critical
Publication of JPH0143809Y2 publication Critical patent/JPH0143809Y2/ja
Granted legal-status Critical Current

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  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本考案の一実施例を示した電子ビーム源の熱陰
極部を示したもの、第２図乃至第３図は本考案の他の実
施例を示した電子ビーム源の熱陰極部を示したもの、第
４図は電子放出面各部からの熱電子放出を一様にする為
の装置例を示したものである。 １．１’　　：゛エミッション面、ＩＩｓ　　’２＋　
　Ｉ３＋Ｉ４．　　Ｉ５．　　Ｉｓ、　　Ｉａ、　　Ｉ
ｂ、　　Ｉｃ、　　Ｉｄ：加熱電流、Ｌｌ、　Ｌ２．　
Ｌ３．　Ｌ、、　ｌ、、　Ｌ、、　Ｌａ、　Ｌｂ、　Ｌ
ｃ、　ＬｄＨ導板。FIG. 1 shows a hot cathode section of an electron beam source showing one embodiment of the present invention, and FIGS. 2 and 3 show a hot cathode section of an electron beam source showing other embodiments of the present invention. FIG. 4 shows an example of a device for uniformizing thermionic emission from each part of the electron emitting surface. 1.1': ゛Emission surface, IIs '2+
I3+I4. I5. Is, Ia, I
b, Ic, Id: heating current, Ll, L2.
L3. L,, l,, L,, La, Lb, L
c, LdH conductive plate.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 電子放出面と該放出面に加熱電流を導く為の２つ以上の
溝部とを有する熱陰極と、該各々の溝部に流す加熱電流
を個々に制御する手段とを具備した電子ビーム源。An electron beam source comprising: a hot cathode having an electron emission surface and two or more grooves for guiding a heating current to the emission surface; and means for individually controlling the heating current flowing through each groove.
JP18387381U 1981-12-10 1981-12-10 electron beam source Granted JPS5887253U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18387381U JPS5887253U (en) 1981-12-10 1981-12-10 electron beam source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18387381U JPS5887253U (en) 1981-12-10 1981-12-10 electron beam source

Publications (2)

Publication Number Publication Date
JPS5887253U true JPS5887253U (en) 1983-06-13
JPH0143809Y2 JPH0143809Y2 (en) 1989-12-19

Family

ID=29983522

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18387381U Granted JPS5887253U (en) 1981-12-10 1981-12-10 electron beam source

Country Status (1)

Country Link
JP (1) JPS5887253U (en)

Also Published As

Publication number Publication date
JPH0143809Y2 (en) 1989-12-19

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