JPS5867496A - Marking method - Google Patents

Marking method

Info

Publication number
JPS5867496A
JPS5867496A JP56166763A JP16676381A JPS5867496A JP S5867496 A JPS5867496 A JP S5867496A JP 56166763 A JP56166763 A JP 56166763A JP 16676381 A JP16676381 A JP 16676381A JP S5867496 A JPS5867496 A JP S5867496A
Authority
JP
Japan
Prior art keywords
resin
fine powder
layer
white fine
marking
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56166763A
Other languages
Japanese (ja)
Inventor
Masumitsu Tanaka
田中 満洲光
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP56166763A priority Critical patent/JPS5867496A/en
Publication of JPS5867496A publication Critical patent/JPS5867496A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/24Ablative recording, e.g. by burning marks; Spark recording

Abstract

PURPOSE:To obtain a clear mark with lesser lesers energy in a short time by a method in which a marking layer is provided near the surface of an object to be printed, molded of a resin, and the marking layer is etched by means of lasers. CONSTITUTION:In the manufacture of a resin molding, e.g., electronic parts, etc., a resin component 21 is mixed with at least 30wt% or more a white fine powder 22, e.g., silicone oxide or alumina, in such a way that a white fine powder layer 12 containing the white fine powder 22 is formed in the area within maximumly 2mum from the surface 24 of the resin layer 11 composed of the resin component 21. Then, lasers is irradiated onto the resin surface 24 to etch the white fine powder layer 12 present within 5mum from the resin surface. By this, a clear mark with a contrast distictive to the resin layer 11 and the black fine powder 23 surrounding the etched part can be formed.

Description

【発明の詳細な説明】 この発明は、樹脂によって成型された部品あるいは装置
などの被印mlJ体に対するマーキング方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a marking method for marking objects such as parts or devices molded from resin.

従来、抵抗、コンデンサなどのような電子部品、あるい
はトランジスタ、ダイオード、集積回路のような半導体
装置に対し、製造メーカ名。
Conventionally, the manufacturer's name is used for electronic components such as resistors and capacitors, or semiconductor devices such as transistors, diodes, and integrated circuits.

品種名、住産コードなどのマーキングを行う場合には、
白色または銀色のマーキングインキを用いて直接又は間
接に印刷する方式、すなわち機械的転写方式のマーキン
グ方法が採られていた。
When marking the variety name, domestic product code, etc.,
A method of directly or indirectly printing using white or silver marking ink, that is, a mechanical transfer marking method has been adopted.

しかしながら、この機械的転写方式のマーキング方法に
2いては、インクのにじみの発生、乾燥工程の不可欠、
インクの適正な濃度への1喪が困難であるなど各種の間
融が未解決のまま収り桟されている。また1合理化が進
んでいる他工程と比較してマーキング工程の占める価格
However, with this mechanical transfer marking method, ink smearing occurs, the drying process is indispensable,
Various problems such as difficulty in achieving the proper concentration of ink remain unresolved. Also, the price occupied by the marking process compared to other processes where rationalization is progressing.

時間の割合が増大しているのが現状である。The current situation is that the proportion of time is increasing.

これに対し、近時のレーザ光線の応用の進展に伴い、現
状の間融点の要求l満たすべく、上記印刷方式の代りに
レーザマーキング方法が実用化されている。
On the other hand, with the recent progress in the application of laser beams, a laser marking method has been put into practical use instead of the above-mentioned printing method in order to meet the current melting point requirements.

従来、このレーザマーキング方法に2いては。Conventionally, there are two methods for this laser marking method.

レーザ光線による樹脂の蝕刻の深さを可能な限り深めに
し、全体表面より深い段差をつけることによって鮮明度
を高める技術を用いていた。
A technique was used to increase the sharpness of the resin by etching the resin with a laser beam as deeply as possible, creating a step deeper than the overall surface.

これは、141図に示すように成型された樹脂層lに含
まれる酸化ケイ素あるいはアルミナなどの白色微分2の
含装置が少なく、しかも樹脂層1中に均一に分散してい
るた怜である。このため、従来、樹脂層lの蝕刻深さh
を大きくせざるを得なく(普通lO〜20Pの深さ)、
レーデエネルギを比較的に多く要し、マーク速度の遅い
方式となっていた。な8%51%1因にどいて、1は黒
色着色を目的とした炭素又は酸化マンガンなどの黒色微
粉である。
This is due to the fact that the white differential 2 components such as silicon oxide or alumina contained in the molded resin layer 1 as shown in FIG. 141 are small and are uniformly dispersed in the resin layer 1. For this reason, conventionally, the etching depth h of the resin layer l
has no choice but to increase the depth (usually 10~20P deep),
This method requires a relatively large amount of radar energy and has a slow marking speed. 8% 51% 1st factor 1 is black fine powder such as carbon or manganese oxide for the purpose of black coloring.

この発明は上記事情に鑑みてなされたもので、その目的
は、レーザ蝕刻にgいて所要とするレーデエネルギが減
少し、かつマーキング速度が向上すなわち単位時間当り
の処理能力が同上すると共に、マークの鮮明度が向上し
たマーキング方法を提供することにある。
This invention was made in view of the above circumstances, and its objectives are to reduce the laser energy required for laser etching, increase the marking speed, i.e., increase the throughput per unit time, and provide clear marks. The object of the present invention is to provide a marking method with improved accuracy.

以下、図面を参照してこの発明の一実施例を説明する。Hereinafter, one embodiment of the present invention will be described with reference to the drawings.

使用する樹脂には少なくとも30東量慢以上の酸化ケイ
素又はアルミナなどの白色微粉を含有する合成Ij14
g″iI1例えばエポキシ系あるいはシリコーン系ある
いはアクリル系のものを使用Tる。今日のトランジスタ
、集積回路等では主にエポキシ系あるいはシリコン系の
樹脂が主体である。そして、その樹脂には白色微粉と共
に黒色着色を目的とTる炭素あるいは酸化マンガンなど
の黒色微粉を包含せしめ、トランスファモールド又はキ
ャスティング技術によってパッケージソゲするのが一般
的な方法である。
The resin used is a synthetic Ij14 containing white fine powder such as silicon oxide or alumina of at least 30 or more.
For example, epoxy, silicone, or acrylic resins are used.Today's transistors, integrated circuits, etc. are mainly made of epoxy or silicone resins. A common method is to incorporate black fine powder such as carbon or manganese oxide for the purpose of black coloring, and package it by transfer molding or casting technology.

第2図はこのような方法によって成型された被印刷体と
なる樹脂を示すものである。同図において、11は主と
して樹脂成分21からなる樹脂114,121は主とし
て白色微粉22からなりマーク層となる白色微粉層、1
3は樹脂成分21と白色微粉22が略均−に分散してい
る分散層、23は黒色微粉、24は成型時に金型などと
後していた個所に相当する樹脂表面である。なχ。
FIG. 2 shows the resin used as the printing material molded by such a method. In the same figure, 11 is a resin 114 mainly consisting of a resin component 21, 121 is a white fine powder layer mainly consisting of white fine powder 22 and serving as a mark layer;
3 is a dispersion layer in which a resin component 21 and a white fine powder 22 are dispersed approximately evenly, 23 is a black fine powder, and 24 is a resin surface corresponding to a portion that was left behind by a mold during molding. Na χ.

上記白色微粉層12は、#脂中に少なくとも30重量%
以上の白色微粉21f含臀しているため。
The white fine powder layer 12 is at least 30% by weight in #fat.
This is because it contains the above white fine powder 21f.

樹脂表面24から最大限度5μm以内の所に存在してい
る。
It exists within a maximum of 5 μm from the resin surface 24.

このような構成において、樹脂表面24に従来より小さ
くエネルギ調整されたレーザ光線を照射すると、第3因
に示すように樹脂表面24の蝕刻が進み、樹脂表面24
よりもやや深いところ(5μm以内)に存在する白色微
粉層lJへ到達する。このとき、白色微粉層l−2は樹
脂層1i1124から最大限度5μm以内のところに存
在しているから、小さいレーザエネルギで短時間のうち
に白色微粉層11への蝕刻が可能となる。
In such a configuration, when the resin surface 24 is irradiated with a laser beam whose energy is adjusted to be smaller than before, the resin surface 24 is etched as shown in the third factor, and the resin surface 24 is
It reaches the white fine powder layer lJ that exists at a slightly deeper place (within 5 μm) than the white powder layer lJ. At this time, since the white fine powder layer l-2 exists within a maximum of 5 μm from the resin layer 1i1124, the white fine powder layer 11 can be etched in a short time with small laser energy.

また、白色微粉層J−7への蝕刻を目的とするも。Also, the purpose is to etch the white fine powder layer J-7.

のであるから、蝕刻部分(マーク)の周囲の樹脂層11
並びに黒色微粉23とは対照的なコントラストを成し、
マークが鮮明となる。第4因はその蝕刻状態を示す平面
図である。
Therefore, the resin layer 11 around the etched portion (mark)
It also forms a contrast with the black fine powder 23,
The mark becomes clear. The fourth factor is a plan view showing the state of etching.

尚、上記実施例に8いては、マーク層として酸化ケイ素
あるいはアルミナなどの白色微粉層1’ICついて説明
したが、これに限定Tるものではな(、その他の色の金
属酸化物や有機物からなる発色剤あるいは肴色剤などで
あってもよい。
In Example 8 above, the mark layer is a white fine powder layer 1'IC made of silicon oxide or alumina, but is not limited to this. It may also be a coloring agent or a flavoring agent.

以上のようにこの発明によれ+f、樹jl中(:。As described above, according to this invention, +f, tree jl (:.

該樹脂とは異なる色の術粉末を少なくとも30重社チ以
上含有させ、この微粉末を主成分とするマーク層を樹□
脂表面から深さ5μm以内に形成し、このマーク層ンレ
ーザ光線で蝕刻するよう(ニジたので、所要とTるレー
ザエネルギが減少し、かつマーキング速度が向上して単
位時間当りの処理能力が向上する。また、マーク層と樹
脂表面が対照的なコントラス)Y成するよう/)( な色にすれば、マークの鮮明度上同上する。
Contain at least 30 layers of powder of a color different from that of the resin, and form a mark layer containing this fine powder as the main component.
The mark layer is formed within 5 μm in depth from the surface of the fat and etched with a laser beam, which reduces the amount of laser energy required and increases the marking speed, increasing throughput per unit time. In addition, if the mark layer and the resin surface are painted in a contrasting color, the sharpness of the mark will improve.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来のレーザ光線による蝕刻状態を示す被印刷
体の断面図、882図はこの発明の一実施例に係る被印
刷体の断rkJ因、第3図は上記被印刷体の蝕刻状態!
示す断面図、第4因は同じく平面図である。 散層、21・・・樹脂成分、22・・・白色微粉、z3
・・・黒色微粉。
FIG. 1 is a cross-sectional view of a printing material showing the state of etching by a conventional laser beam, FIG. !
The sectional view shown and the fourth factor are also plan views. dispersed layer, 21...resin component, 22...white fine powder, z3
...Black fine powder.

Claims (1)

【特許請求の範囲】[Claims] (1)  樹脂により成型された被印刷体にレーザ光線
を照射してマーキングを行う方法にどいて。 前記樹脂の表面から深さ5μm以内にマーク層を設け、
このマーク層″4f前記レーザ光線により蝕刻すること
を特徴とするマーキング方法。 (乃 1紀マークl−は、前記樹脂とは異なる色の微粉
末を主成分とし、かつこの微粉末は的記樹脂中に少なく
とも30J1:FITS以上含有されている特許請求の
範囲第1項記載のマーキング方法。
(1) A method of marking a printing material molded from resin by irradiating it with a laser beam. A mark layer is provided within a depth of 5 μm from the surface of the resin,
A marking method characterized in that this mark layer "4f is etched by the laser beam. (No. The marking method according to claim 1, wherein at least 30J1:FITS is contained in the marking method.
JP56166763A 1981-10-19 1981-10-19 Marking method Pending JPS5867496A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56166763A JPS5867496A (en) 1981-10-19 1981-10-19 Marking method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56166763A JPS5867496A (en) 1981-10-19 1981-10-19 Marking method

Publications (1)

Publication Number Publication Date
JPS5867496A true JPS5867496A (en) 1983-04-22

Family

ID=15837251

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56166763A Pending JPS5867496A (en) 1981-10-19 1981-10-19 Marking method

Country Status (1)

Country Link
JP (1) JPS5867496A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6047065A (en) * 1983-08-25 1985-03-14 Nitto Electric Ind Co Ltd Molding resin composition
JPS60119760A (en) * 1983-11-30 1985-06-27 Nitto Electric Ind Co Ltd Resin-sealed semiconductor device
JPS6220354A (en) * 1985-07-18 1987-01-28 Matsushita Electric Works Ltd Resin-sealed electronic component
JPS62152791A (en) * 1985-12-27 1987-07-07 Sumitomo Bakelite Co Ltd Laser marking method for electronic part
JPS63205291A (en) * 1987-02-23 1988-08-24 Nkk Corp Laser marking method
JPS63170168U (en) * 1987-04-24 1988-11-07
JPH023385A (en) * 1988-06-16 1990-01-08 Honshu Paper Co Ltd Thermal recording body
JPH05305763A (en) * 1991-10-17 1993-11-19 Leonhard Kurz Gmbh & Co Mark forming method by laser radiation and emboss foil therefor
US5939182A (en) * 1994-05-19 1999-08-17 Minnesota Mining And Manufacturing Company Polymeric article having improved hydrophilicity and a method of making the same
KR20170009401A (en) 2015-07-17 2017-01-25 한국엔지니어링플라스틱 주식회사 Polyoxymethylene composition using laser making

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6047065A (en) * 1983-08-25 1985-03-14 Nitto Electric Ind Co Ltd Molding resin composition
JPS621656B2 (en) * 1983-08-25 1987-01-14 Nitto Electric Ind Co
JPS60119760A (en) * 1983-11-30 1985-06-27 Nitto Electric Ind Co Ltd Resin-sealed semiconductor device
JPH021374B2 (en) * 1983-11-30 1990-01-11 Nitto Denko Corp
JPS6220354A (en) * 1985-07-18 1987-01-28 Matsushita Electric Works Ltd Resin-sealed electronic component
JPS62152791A (en) * 1985-12-27 1987-07-07 Sumitomo Bakelite Co Ltd Laser marking method for electronic part
JPS63205291A (en) * 1987-02-23 1988-08-24 Nkk Corp Laser marking method
JPS63170168U (en) * 1987-04-24 1988-11-07
JPH023385A (en) * 1988-06-16 1990-01-08 Honshu Paper Co Ltd Thermal recording body
JPH05305763A (en) * 1991-10-17 1993-11-19 Leonhard Kurz Gmbh & Co Mark forming method by laser radiation and emboss foil therefor
US5939182A (en) * 1994-05-19 1999-08-17 Minnesota Mining And Manufacturing Company Polymeric article having improved hydrophilicity and a method of making the same
KR20170009401A (en) 2015-07-17 2017-01-25 한국엔지니어링플라스틱 주식회사 Polyoxymethylene composition using laser making

Similar Documents

Publication Publication Date Title
JPS5867496A (en) Marking method
JPS56160050A (en) Semiconductor device and manufacture thereof
US5232651A (en) Method of sealing electric parts mounted on electric wiring board with resin composition
JPS60155493A (en) Marking material and marking method
JPS6315446A (en) Manufacture of semiconductor device
JP2002124603A (en) Epoxy resin composition, semiconductor device and method for determining visibility of laser mark
US1155352A (en) Lithographic plate for offset and direct printing.
JPS5613722A (en) Manufacture of semiconductor device
JPH03208363A (en) Correction of mark and marking
JPS60202119A (en) Resin composition and laser marking thereof
GB979779A (en) Method of making printed circuits
JPS63209148A (en) Resin-sealed semiconductor device
JPS6335096B2 (en)
JPS5929195A (en) Marking method
KR920001755A (en) Semiconductor device and manufacturing method thereof
JPS556429A (en) Selective ethching method
JPS55156949A (en) Screen printing method
JPH04171833A (en) Method of marking semiconductor device
JPS5678122A (en) Formation of pattern
JP2002113584A (en) Method for laser beam marking on semiconductor package
JPS6147692A (en) Method of producing printed circuit board
KR810001362Y1 (en) Electronic components
JPS61248448A (en) Semiconductor device
ATE65620T1 (en) DYE-CONTAINING LAYER OF A PHOTOPOLYMERIZABLE COMPOUND AND METHOD OF MAKING RELIEF AND PRINTING MOLDS.
JPH0750227A (en) Manufacture of solid electrolytic capacitor