JPS5851528A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS5851528A
JPS5851528A JP15015981A JP15015981A JPS5851528A JP S5851528 A JPS5851528 A JP S5851528A JP 15015981 A JP15015981 A JP 15015981A JP 15015981 A JP15015981 A JP 15015981A JP S5851528 A JPS5851528 A JP S5851528A
Authority
JP
Japan
Prior art keywords
pattern
substrate
light
pseudo
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15015981A
Other languages
English (en)
Japanese (ja)
Other versions
JPS612296B2 (enrdf_load_stackoverflow
Inventor
Osami Ban
伴　修実
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15015981A priority Critical patent/JPS5851528A/ja
Publication of JPS5851528A publication Critical patent/JPS5851528A/ja
Publication of JPS612296B2 publication Critical patent/JPS612296B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP15015981A 1981-09-22 1981-09-22 半導体装置の製造方法 Granted JPS5851528A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15015981A JPS5851528A (ja) 1981-09-22 1981-09-22 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15015981A JPS5851528A (ja) 1981-09-22 1981-09-22 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS5851528A true JPS5851528A (ja) 1983-03-26
JPS612296B2 JPS612296B2 (enrdf_load_stackoverflow) 1986-01-23

Family

ID=15490787

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15015981A Granted JPS5851528A (ja) 1981-09-22 1981-09-22 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS5851528A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5921037A (ja) * 1982-07-26 1984-02-02 Nec Corp 半導体装置のパタ−ンのモニタ方法
JP2008140672A (ja) * 2006-12-04 2008-06-19 Matsushita Electric Ind Co Ltd スイッチ装置及びこれを用いたリモコン送信機
JP2008140671A (ja) * 2006-12-04 2008-06-19 Matsushita Electric Ind Co Ltd スイッチ装置及びこれを用いたリモコン送信機

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5921037A (ja) * 1982-07-26 1984-02-02 Nec Corp 半導体装置のパタ−ンのモニタ方法
JP2008140672A (ja) * 2006-12-04 2008-06-19 Matsushita Electric Ind Co Ltd スイッチ装置及びこれを用いたリモコン送信機
JP2008140671A (ja) * 2006-12-04 2008-06-19 Matsushita Electric Ind Co Ltd スイッチ装置及びこれを用いたリモコン送信機

Also Published As

Publication number Publication date
JPS612296B2 (enrdf_load_stackoverflow) 1986-01-23

Similar Documents

Publication Publication Date Title
US6091488A (en) Method of and apparatus for automatic high-speed optical inspection of semi-conductor structures and the like through fluorescent photoresist inspection
JPH0318708A (ja) 表面検査方法及び装置
JPH061370B2 (ja) マスク欠陥検査装置
KR20060066658A (ko) 얼룩 결함 검사 방법과 시스템, 및 포토 마스크의 제조방법
JP3813336B2 (ja) 集積回路の故障箇所特定方法および故障箇所特定装置
JPH0325738B2 (enrdf_load_stackoverflow)
JPS5851528A (ja) 半導体装置の製造方法
JPS61201107A (ja) 透明な膜の表面検査方法
KR100515376B1 (ko) 반도체 웨이퍼 검사장비 및 검사방법
JP2007192652A (ja) パターン検査装置、パターン検査方法、及び検査対象試料
JP3068636B2 (ja) パターン検査方法および装置
JP3335715B2 (ja) ビアホール検査装置
JPS60120519A (ja) ホトマスクおよび自動欠陥検査装置
JPS62263646A (ja) ウエハ検査装置
JPH04221839A (ja) パターン付半導体ウエーハ検査装置の較正用マスク及び検査装置の較正方法
JPH0318851A (ja) フォトマスクおよびその検査法
JPH04344447A (ja) 透明ガラス基板の欠陥検出装置
JPH08102478A (ja) 結晶欠陥検出装置
JPS63122119A (ja) 縮小投影露光装置用フオトマスクの検査方法
JPH06229939A (ja) 異物検査装置
JPS6138537A (ja) カラ−フイルタ−検査方法
JPS6165444A (ja) 被検査チツプの回路パタ−ン外観検査方法並びにその装置
JPH01206203A (ja) 膜厚不良検査方法
JP2006093172A (ja) 半導体デバイスの製造方法
JPS5891636A (ja) パタ−ン欠陥検査方法