JPS5844758B2 - Barrel plating method - Google Patents

Barrel plating method

Info

Publication number
JPS5844758B2
JPS5844758B2 JP14439276A JP14439276A JPS5844758B2 JP S5844758 B2 JPS5844758 B2 JP S5844758B2 JP 14439276 A JP14439276 A JP 14439276A JP 14439276 A JP14439276 A JP 14439276A JP S5844758 B2 JPS5844758 B2 JP S5844758B2
Authority
JP
Japan
Prior art keywords
dummy
plating
barrel
tank
reed switch
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14439276A
Other languages
Japanese (ja)
Other versions
JPS5368632A (en
Inventor
敏人 原
章 山中
剛男 須藤
佑二 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP14439276A priority Critical patent/JPS5844758B2/en
Publication of JPS5368632A publication Critical patent/JPS5368632A/en
Publication of JPS5844758B2 publication Critical patent/JPS5844758B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Chemically Coating (AREA)

Description

【発明の詳細な説明】 本発明は、バレルめつき処理方法特に該めっきにおいて
被めっき物と共に用いるダミーに関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a barrel plating method, particularly to a dummy used together with the object to be plated in the plating process.

リードスイッチは第2図に示すようにガラス管11およ
び該ガラス管に封止されたリード片12゜13からなる
As shown in FIG. 2, the reed switch consists of a glass tube 11 and reed pieces 12 and 13 sealed in the glass tube.

ガラス管11の外に突出したリード片部分即ち端子部に
は錫(Sn )めっきなどのめっきを施すが、このめっ
きを行なうにはバレル方式が便利である。
The lead piece portion, ie, the terminal portion, protruding from the glass tube 11 is plated with tin (Sn) or the like, and a barrel method is convenient for carrying out this plating.

第1図はこのめっき方式で用いるバレル槽を示し、1は
バレル槽8の本体、2は該枠体の内側に張られたサラン
ネットなどの網、3は電極を兼ねるバレル槽支持軸、4
,5は軸3の支持腕、6は軸3に間隔をおいて下方に突
出するように複数個設けられた補助電極である。
Figure 1 shows the barrel tank used in this plating method, where 1 is the main body of the barrel tank 8, 2 is a mesh such as Saran net stretched inside the frame, 3 is a barrel support shaft that also serves as an electrode, and 4 is a barrel tank used in this plating method.
, 5 is a support arm of the shaft 3, and 6 is a plurality of auxiliary electrodes provided on the shaft 3 at intervals so as to project downward.

端子部をめっきすべき多数のリードスイッチ10は多数
のダミーボール7と共にバレル槽8内に装入し、電解液
を収容しためつぎ槽9に該バレル槽を浸し、軸3に負電
圧、めつき槽内電極(図示しない)に正電圧を印加しか
つバルブ槽8を回転させながらめっきを行なう。
A large number of reed switches 10 whose terminals are to be plated are placed in a barrel tank 8 together with a large number of dummy balls 7, and the barrel tank is immersed in a spout tank 9 containing an electrolytic solution, and a negative voltage is applied to the shaft 3. Plating is performed while applying a positive voltage to an electrode (not shown) in the tank and rotating the valve tank 8.

電流経路は電極たる回転軸3、補助電極6、ダミーボー
ル7およびリードスイッチ10の端子部(リードスイッ
チの接点は一般に開放状態)、電解後、めつき槽内電極
で作られる。
A current path is formed by the rotating shaft 3 serving as an electrode, the auxiliary electrode 6, the dummy ball 7, the terminal portion of the reed switch 10 (the contact of the reed switch is generally open), and the electrode in the plating bath after electrolysis.

バレル槽8の回転により槽内下部空間に装入されたリー
ドスイッチ10およびダミーボール7は最初はバレル槽
8と共に所定角回動し、高く持ち上げられた方からくず
れ落ち、これを繰り返して攪拌され、これによりめっき
が均一になる。
Due to the rotation of the barrel tank 8, the reed switch 10 and the dummy ball 7 charged into the lower space of the tank first rotate by a predetermined angle together with the barrel tank 8, and then fall down from the side that was raised higher, and this is repeated until they are stirred. , this makes the plating uniform.

補助電極6は確実に通電路が形成されるようにするもの
で、ダミーボールγとリードスイッチ10の堆積体中へ
突き出し、ダミーボールおよびまたはリードスイッチの
端子部と接触して電気回路を作る。
The auxiliary electrode 6 ensures that a current-carrying path is formed, and protrudes into the stack of the dummy balls γ and the reed switch 10 and comes into contact with the terminals of the dummy balls and/or the reed switch to form an electric circuit.

この接触は、リードスイッチおよびダミーボールをバレ
ル槽8内に多量に、中心の支持軸3を埋めるレベルまで
装入しても行なうことができるが、このように多量に入
れると全体の重量が犬になり、また攪拌が互いに激しく
衝突しながら行なわれる等の理由でリードスイッチのガ
ラス管11から突出したリード片12.13の端子部が
折曲するという不都合が生じる。
This contact can also be made by loading a large amount of reed switches and dummy balls into the barrel tank 8, to the extent that they fill the center support shaft 3, but if such a large amount is inserted, the overall weight will be reduced. Moreover, since stirring is carried out while violently colliding with each other, the terminal portions of the reed pieces 12 and 13 protruding from the glass tube 11 of the reed switch may be bent.

リードスイッチ10およびダミーボール7はバレル槽8
の軸3より低い下部空間のみにある様に少量入れ、電気
回路形成は補助電極6により行なうようにすると、端子
部の折曲なくめっきが行なわれる。
Reed switch 10 and dummy ball 7 are in barrel tank 8
If a small amount is placed only in the lower space below the axis 3 of the auxiliary electrode 6 and the electric circuit is formed using the auxiliary electrode 6, plating can be performed without bending the terminal portion.

ダミーボール7は多数のリードスイッチ10の間に入っ
て該リードスイッチの攪拌を助け、またその端子部が電
極3,6へ確実に接触するように中継する媒体の役割を
持つ。
The dummy ball 7 enters between a large number of reed switches 10 to help stir the reed switches, and also serves as a relay medium so that the terminal portions of the reed switches are in reliable contact with the electrodes 3 and 6.

従ってダミーボールは導電体であり、かつバレル槽8の
回転中宮にリードスイッチ群の中に入ってよく混じり合
い、端子片によく接触するものでなければならない。
Therefore, the dummy balls must be electrically conductive, enter the reed switch group during the rotation of the barrel tank 8, mix well, and contact the terminal pieces well.

従来このダミーボールには金属ボールを用いていた。Conventionally, a metal ball has been used as this dummy ball.

しかしこの場合は比重が金属ボールの方が遥かに大きい
のでリードスイッチが上に、金属ボールが下になり、両
者分離してしまう傾向がある。
However, in this case, the specific gravity of the metal ball is much greater, so the reed switch is on top and the metal ball is on the bottom, and there is a tendency for the two to separate.

この傾向は、金属ボールにめっきがなされて重量が犬に
なると益々顕著になる。
This tendency becomes even more pronounced when the metal ball is plated and its weight increases.

このような状態では浮き上って回路的に切離されたリー
ドスイッチの端子部にはめっきが行なわれず、こうして
めつきむらが生じる。
In such a state, the terminal portion of the reed switch that is lifted up and disconnected in terms of circuitry is not plated, resulting in uneven plating.

なおリードスイッチ端子部のめつき厚みは5μm以上な
いと半田上げ性、耐腐食性などが充分でない。
Note that unless the plating thickness of the reed switch terminal is 5 μm or more, solderability and corrosion resistance will not be sufficient.

そしてめっき厚みにむらがあって一部に薄過ぎるものが
あると、個々に厚み測定して選別する厄介な操作でもし
ない限り、全体を不合格とする外はなく、これを避ける
には過剰にめっきをして薄過ぎるものがないようにする
ことになり、めっき時間、所要電力および材料の増大を
招く。
If the plating thickness is uneven and some parts are too thin, there is no choice but to reject the entire plating unless you go through the troublesome process of measuring and sorting the thickness of each plating, and to avoid this, excessive Plating must be done so that nothing is too thin, increasing plating time, power requirements, and materials.

それ数本発明は、リードスイッチ端子部つまり被めっき
物中によく混入することができそして確実に電気回路形
成に寄与することができるダミーを得て、均一なめっき
を可能にしようとするものである。
In addition, the present invention aims to obtain a dummy that can be mixed well into the reed switch terminal portion, that is, the object to be plated, and can reliably contribute to the formation of an electric circuit, thereby making uniform plating possible. be.

本発明のバレルめつき処理方法はプラスチックの球体ま
たは円筒体の表面に導電膜を被着してなるダミーを用い
、該ダミーを被めっき物と共にバレル槽に装入し、該バ
レル槽をめっき槽に浸たしかつ回転させながら通電して
めっきを行なうことを特徴とするが、次に実施例を参照
しながらこれを詳細に説明する。
The barrel plating method of the present invention uses a dummy made of a plastic sphere or cylinder with a conductive film coated on the surface, the dummy is placed in a barrel tank together with the object to be plated, and the barrel tank is placed in a plating tank. The plating process is characterized in that plating is carried out by immersing the plate in water and applying electricity while rotating it.This will be described in detail below with reference to Examples.

本発明ではダミーとして例えばABS樹脂などの球形プ
ラスチックからなる球体の表面に銅を無電解めっきした
ものを用いる。
In the present invention, as a dummy, a sphere made of spherical plastic such as ABS resin, whose surface is electrolessly plated with copper, is used.

かSるダミーは比重が小さく、被めっき物であるリード
スイッチとよく混合することができ、しかもリードスイ
ッチの端子部を折曲するようなことがない。
The dummy has a low specific gravity, can be mixed well with the reed switch to be plated, and does not bend the terminal portion of the reed switch.

またこのダミーはリードスイッチ端子部への通電回路形
成に有効でなければならないが、これには径を次のよう
に定める。
Furthermore, this dummy must be effective in forming a current-carrying circuit to the reed switch terminal portion, and its diameter is determined as follows.

即ち第3図で7は該プラスチックのダミーボール、10
aはリードスイッチの端子部Xはダミーボールの半径、
dは端子部の半径であるが、端子部10aがダミーボー
ル7とよく接触して電極3,6に確実に接続されるよう
にするには、これらのx、dに次の関係を持たせるとよ
い即ち端子部10aは第3図に示すように、ダミーボー
ル7の集合体が作る空洞Vを埋める大きさであるのがよ
く、この場合端子部10aは四方から電流を供給されて
均一にめっきされる。
That is, in FIG. 3, 7 is the plastic dummy ball, 10
a is the terminal part of the reed switch, X is the radius of the dummy ball,
d is the radius of the terminal portion, but in order to ensure that the terminal portion 10a comes into good contact with the dummy ball 7 and is reliably connected to the electrodes 3 and 6, x and d should have the following relationship. In other words, as shown in FIG. 3, the terminal portion 10a is preferably large enough to fill the cavity V formed by the aggregate of the dummy balls 7. In this case, the terminal portion 10a is supplied with current from all sides so that the current is uniformly supplied to the terminal portion 10a. Plated.

端子部が空洞に密嵌する条件は (x+d ) = 4%//7X 、”、 X−(J7十1)d ・・・・(1)
である。
The conditions for the terminal part to fit tightly into the cavity are (x+d) = 4%//7X,", X-(J71)d...(1)
It is.

ダミーボールが第3図より小さくても端子部10aの周
囲を覆って該端子部と良好に接触することができるから
(1)式の関係は X≦(v’2+1)d ・・・・(2)とする
ことができる。
Even if the dummy ball is smaller than that shown in FIG. 3, it can cover the periphery of the terminal portion 10a and make good contact with the terminal portion, so the relationship in equation (1) is X≦(v'2+1)d... 2).

しかしダミーの径を小にするとその個数が犬になり、ダ
ミーの表面積も広くなってめっき損失が増大する。
However, if the diameter of the dummies is made small, the number of dummies increases, and the surface area of the dummies also increases, increasing plating loss.

従って(1)式の関係にするのが適切である。Therefore, it is appropriate to use the relationship expressed by equation (1).

リードスイッチの端子部の半径は例えば0.5 mmで
あるが、これに対するダミーの半径は1.2mrn以下
である。
The radius of the terminal portion of the reed switch is, for example, 0.5 mm, whereas the radius of the dummy is 1.2 mrn or less.

ところでか\る微小半径のプラスチック球体は製造しに
く\、従って高価である。
However, plastic spheres with a micro radius are difficult to manufacture and therefore expensive.

球体でなく円筒体であると、これは製造しやすく従って
廉価であるので、これを代用してもよい。
A cylindrical body instead of a sphere may be used instead, since this is easier to manufacture and therefore less expensive.

しかし円筒体の場合は球体はど混合および回路形成など
が良好でなく、このため多量に用いる必要がある。
However, in the case of a cylindrical body, mixing of spheres and circuit formation are not good, and therefore a large amount needs to be used.

ダミーが多量なら当然波めっき物であるリードスイッチ
が少量になり、めっき装置の処理能力が下ると共に、ダ
ミーにもめっきがなされるから無1駄も多くなる。
If there are a large number of dummies, naturally there will be a small amount of wave-plated reed switches, which will reduce the throughput of the plating equipment and also cause more waste because the dummies will also be plated.

従って特性的には球体プラスチックダミーが優れている
Therefore, the spherical plastic dummy is superior in terms of characteristics.

球体プラスチックダミーの径を(2)式に従って選定し
ても使用中にめっきされて径が増大し、重量が犬になる
が、これは適当な時期に溶解、電気分解などにより除去
すればよい。
Even if the diameter of the spherical plastic dummy is selected according to equation (2), the diameter will increase due to plating during use and the weight will increase, but this can be removed at an appropriate time by melting, electrolysis, etc.

プラスチックの種類としてはABS樹脂以外の他のもの
でもよく、またダミーの表面に施す導電膜は銅基材の適
宜の良導電性材料でよい。
The type of plastic may be other than ABS resin, and the conductive film applied to the surface of the dummy may be made of a suitable copper-based material with good conductivity.

更にダミー表面に導電膜を施すのに無電解めっきの外に
蒸着その他の方法を用いてもよい。
Furthermore, in addition to electroless plating, vapor deposition or other methods may be used to apply the conductive film to the dummy surface.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図a、b、およびCはバレル槽の正面図、端面図、
および縦断面図、第2図はリードスイッチの説明図、第
3図は最適ダミー径の説明図である。 図面で7はダミー、8はバレル槽、9はめつき槽、10
a、12.13は被めっき物である。
Figures 1a, b, and C are front and end views of the barrel tank;
2 is an explanatory diagram of the reed switch, and FIG. 3 is an explanatory diagram of the optimum dummy diameter. In the drawing, 7 is a dummy, 8 is a barrel tank, 9 is a plating tank, and 10 is
a, 12.13 are objects to be plated.

Claims (1)

【特許請求の範囲】 1 プラスチックの球体または円筒体の表面に導電膜を
被着してなるダミーを用い、該ダミーを被めっき物と共
にバレル槽に装入し、該バレル槽をめっき槽に浸たしか
つ回転させながら通電してめっきを行なうことを特徴と
するバレルめつき処理方法。 2 ダミーの半径Xを被めっき物の半径dに対してX<
(J2+1)dの関係を持つように定められたことを特
徴とする特許請求の範囲第1項記載のバレルめつき処理
方法。 3 ダミーがABS樹脂等の球状プラスチックの球体か
らなることを特徴とする特許請求の範囲第1項または第
2項に記載のバレルめつき処理方法。 4 導電体膜が銅等の良導電性の金属の無電解めつきに
より形成されることを特徴とする特許請求の範囲第1項
〜第3項のいずれかに記載のバレルめつき処理方法。
[Claims] 1. Using a dummy made of a plastic sphere or cylinder with a conductive film coated on the surface, the dummy is placed in a barrel tank together with the object to be plated, and the barrel tank is immersed in the plating tank. A barrel plating processing method characterized by plating by applying electricity while rotating. 2 The radius of the dummy is X<
The barrel plating method according to claim 1, characterized in that the relationship is determined to be (J2+1)d. 3. The barrel plating method according to claim 1 or 2, wherein the dummy is made of a spherical plastic sphere such as ABS resin. 4. The barrel plating method according to any one of claims 1 to 3, wherein the conductive film is formed by electroless plating of a highly conductive metal such as copper.
JP14439276A 1976-12-01 1976-12-01 Barrel plating method Expired JPS5844758B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14439276A JPS5844758B2 (en) 1976-12-01 1976-12-01 Barrel plating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14439276A JPS5844758B2 (en) 1976-12-01 1976-12-01 Barrel plating method

Publications (2)

Publication Number Publication Date
JPS5368632A JPS5368632A (en) 1978-06-19
JPS5844758B2 true JPS5844758B2 (en) 1983-10-05

Family

ID=15361070

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14439276A Expired JPS5844758B2 (en) 1976-12-01 1976-12-01 Barrel plating method

Country Status (1)

Country Link
JP (1) JPS5844758B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58224198A (en) * 1982-06-21 1983-12-26 Hitachi Ltd Plating method
JPS59127825A (en) * 1983-01-13 1984-07-23 松下電器産業株式会社 Method of forming terminal electrode of laminated porcelain capacitor
JPH0830280B2 (en) * 1986-04-04 1996-03-27 ロ−ム株式会社 Barrel plating method for electronic parts

Also Published As

Publication number Publication date
JPS5368632A (en) 1978-06-19

Similar Documents

Publication Publication Date Title
JP2005505102A (en) Current collector structure and method for improving the performance of lead acid batteries
JPH04505072A (en) Conductive components containing conductive metal oxides
JPS5844758B2 (en) Barrel plating method
US3878062A (en) Electroplating apparatus and method
CN105161726A (en) Sand electroless plating metal polar plate and preparing method thereof
CN1157503C (en) Method for producing very small metal ball
JPH06508716A (en) Fixed alkaline zinc anode for storage batteries with improved electrical conductivity and storage capacity
US2425919A (en) Method of making metal molding material
JP3697481B2 (en) Solder plating method for fine metal balls
JPS5916269A (en) Manufacture of positive plate for alkaline battery
US3669754A (en) Process of making a molded negative electrode
JPS6140319B2 (en)
US703875A (en) Active material for storage batteries and process of making same.
US4356075A (en) Rigid dangler assembly for electroplating barrels
JP2002105694A (en) Method and apparatus for barrel plating
CN209066041U (en) Electroplanting device is used in a kind of processing of surface of metal product
JP4496635B2 (en) Manufacturing method of electronic parts
US719872A (en) Electrolytic apparatus.
US3798067A (en) Electrolytic cell and method for making same
RU2684295C1 (en) Method and device with a rotating magnet for electrochemical metallisation of magnetic powders
JPH02253557A (en) Manufacture of hydrogen storage battery
JP3454796B2 (en) Method for producing conductive fine particles
JPS58111358A (en) Swelling device for molded film on external lead of semiconductor device molded previously
JPS59196575A (en) Manufacture of sintered substrate for cell
JPS6115999A (en) Dummy for barrel plating and method for subjecting electronic parts to barrel plating