JPS5835925A - 半導体装置 - Google Patents

半導体装置

Info

Publication number
JPS5835925A
JPS5835925A JP13492581A JP13492581A JPS5835925A JP S5835925 A JPS5835925 A JP S5835925A JP 13492581 A JP13492581 A JP 13492581A JP 13492581 A JP13492581 A JP 13492581A JP S5835925 A JPS5835925 A JP S5835925A
Authority
JP
Japan
Prior art keywords
layer
insulating
region
semiconductor substrate
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13492581A
Other languages
English (en)
Japanese (ja)
Other versions
JPS644664B2 (enrdf_load_stackoverflow
Inventor
Tadahiro Nagayama
長山　忠洋
Akira Tomono
明 伴野
Kazuo Hagimura
萩村　和夫
Norio Totsuka
戸塚　憲男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Oki Electric Industry Co Ltd
Original Assignee
Nippon Telegraph and Telephone Corp
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp, Oki Electric Industry Co Ltd filed Critical Nippon Telegraph and Telephone Corp
Priority to JP13492581A priority Critical patent/JPS5835925A/ja
Publication of JPS5835925A publication Critical patent/JPS5835925A/ja
Publication of JPS644664B2 publication Critical patent/JPS644664B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Formation Of Insulating Films (AREA)
JP13492581A 1981-08-28 1981-08-28 半導体装置 Granted JPS5835925A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13492581A JPS5835925A (ja) 1981-08-28 1981-08-28 半導体装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13492581A JPS5835925A (ja) 1981-08-28 1981-08-28 半導体装置

Publications (2)

Publication Number Publication Date
JPS5835925A true JPS5835925A (ja) 1983-03-02
JPS644664B2 JPS644664B2 (enrdf_load_stackoverflow) 1989-01-26

Family

ID=15139742

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13492581A Granted JPS5835925A (ja) 1981-08-28 1981-08-28 半導体装置

Country Status (1)

Country Link
JP (1) JPS5835925A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03169667A (ja) * 1989-11-30 1991-07-23 Mita Ind Co Ltd インクリボンの巻取制御装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49107177A (enrdf_load_stackoverflow) * 1973-02-13 1974-10-11
JPS55133556A (en) * 1979-04-03 1980-10-17 Matsushita Electronics Corp Planar semiconductor device and method of fabricating the same

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49107177A (enrdf_load_stackoverflow) * 1973-02-13 1974-10-11
JPS55133556A (en) * 1979-04-03 1980-10-17 Matsushita Electronics Corp Planar semiconductor device and method of fabricating the same

Also Published As

Publication number Publication date
JPS644664B2 (enrdf_load_stackoverflow) 1989-01-26

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