JPS5820885Y2 - pattern inspection equipment - Google Patents

Description

[Detailed Description of the Invention] The present invention relates to a pattern inspection device for printed board photomasks, etc.

A pattern inspection apparatus for inspecting whether a completed pattern such as a photomux has a predetermined line width has a configuration as shown in FIG.

The pattern surface of the sample pattern 1 to be inspected is scanned by an optical scanning device 2 and read out as a black and white binary signal, which is stored in a pattern data memory 3.

The contents stored in the pattern data memory 3 are inspected by an inspection device 4 to determine whether the pattern has a desired shape or size.

These pattern inspection devices are generally configured to focus on and inspect the portion stored in the pattern data memory 3 as the black signal 1.

Therefore, as shown in FIG. 2, when inspecting the negative pattern 6 or using the cap 1-1 between patterns in
When measuring the length of the white portion, special measures such as subtraction processing were required in the inspection device.

The purpose of this invention is to provide a pattern inspection device that solves these problems.The purpose of this invention is to scan the pattern surface of a sample to be inspected with a light beam, etc., and read out the pattern state as a binary signal. In a pattern inspection device that reads out the contents of this storage device after storing it in a storage device and inspects the pattern state, it is possible to further reduce the distance by having a switching circuit that stores the binarized signal as it is or inverts it and stores it in the storage device. be related to

Next, the present invention will be specifically explained with reference to the drawings.

FIG. 2 shows a pattern inspection device according to an embodiment of the present invention.

In this pattern inspection apparatus, when measuring the length of a single positive film or measuring the gap length between patterns on a negative film 6, the A input of the switching circuit 5 is set to 1° and 8 manual power to O.

In this case, the black and white binary signal of the pattern to be inspected is recorded in the pattern memory 3 as it is.

In addition, when measuring the gap length of positive film 1 or pattern length of negative film 6, input A is set to 0. Switch the B input to 1.

In this case, the black and white binary signal of the sample pattern to be inspected is inverted and recorded in the pattern data memory 3.

In other words, the gap portion of the positive film 1 and the pattern portion of the negative film 6 are recorded as a black signal.

As explained above, according to the pattern inspection apparatus of the present invention, it is possible to perform inspection by easily switching between positive or negative, pattern length measurement, and gap length measurement with one pattern inspection apparatus.

[Brief explanation of drawings]

FIG. 1 is a block diagram of a conventional pattern inspection apparatus, and FIG. 2 is a block diagram of a pattern inspection apparatus according to an embodiment of the present invention. In the figure, 1 is a positive film, 2 is an optical scanning device, 3 is a pattern data memory, 4 is an inspection device, 5 is a switching circuit, 6
indicates negative film.

Claims (1)

[Scope of utility model registration request] The patterned surface of the sample to be inspected is scanned with a light beam, etc.
In a pattern inspection device that reads out a pattern state as a binary signal, stores it in a storage device, reads out the contents of this storage device, and inspects the pattern state, the binary signal is transferred to the storage device as it is or after being inverted. 1. A pattern inspection device characterized by having a switching circuit for storing data.