JPS58198526A - Heat-resistant epoxy resin composition - Google Patents

Heat-resistant epoxy resin composition

Info

Publication number
JPS58198526A
JPS58198526A JP8268782A JP8268782A JPS58198526A JP S58198526 A JPS58198526 A JP S58198526A JP 8268782 A JP8268782 A JP 8268782A JP 8268782 A JP8268782 A JP 8268782A JP S58198526 A JPS58198526 A JP S58198526A
Authority
JP
Japan
Prior art keywords
epoxy resin
parts
trisphenol
heat
curing agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8268782A
Other languages
Japanese (ja)
Other versions
JPH0160168B2 (en
Inventor
Takaaki Fukai
深井 孝彰
Shuichi Ebihara
海老原 秀一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Gas Chemical Co Inc
Original Assignee
Mitsubishi Gas Chemical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Gas Chemical Co Inc filed Critical Mitsubishi Gas Chemical Co Inc
Priority to JP8268782A priority Critical patent/JPS58198526A/en
Publication of JPS58198526A publication Critical patent/JPS58198526A/en
Publication of JPH0160168B2 publication Critical patent/JPH0160168B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:An epoxy resin composition of high heat resistance, consisting essentially of a triglycidyl ether of a trisphenol as an epoxy resin and a trisphenol as a curing agent. CONSTITUTION:The titled composition consisting essentially of a triglycidyl ether of a trisphenol of formula I (wherein R1 is a lower alkyl residue), e.g., tris(4-glycidoxyphenyl)methane, as an epoxy resin, and a trisphenol of formula II(wherein R2 is a lower alkyl residue), e.g., tris(4-hydroxyphenyl)methane, as a curing agent. Combination of the resin with the curing agent can provide a composition having heat resistance for higher than that of conventional heat- resistant epoxy resin compositions.

Description

【発明の詳細な説明】 本発明はエポキシ樹脂組成物に関するもので、その目的
とするところは高い耐熱性を有する組成物を提供するこ
とにある。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an epoxy resin composition, and an object thereof is to provide a composition having high heat resistance.

エポキシ樹脂は接着性、耐薬品性、電気特性等に優れた
特性を示すため、接着剤、塗料、電気絶縁材料郷広い用
途に用いられているが、近年の使用条件はしだいに過酷
なものとなっており、従来のエポキシ樹脂組成物では使
用が困難な場合も多くなってきている。
Epoxy resin exhibits excellent properties such as adhesiveness, chemical resistance, and electrical properties, so it is used in a wide range of applications such as adhesives, paints, and electrical insulation materials. However, in recent years, the conditions of use have become increasingly harsh. Therefore, it is becoming increasingly difficult to use conventional epoxy resin compositions.

過酷化してきている使用条件の一つに耐熱性があり、接
着剤、塗料、電気絶縁材料等いずれ4M在よりさらに高
い耐熱性を有すゐ#I威物が望iれている。
One of the usage conditions that is becoming increasingly severe is heat resistance, and there is a demand for products such as adhesives, paints, and electrically insulating materials that have even higher heat resistance than 4M.

本発明者らはこのような状況に艦みエポキシ樹脂の有す
る優れた特性を失なわず、今まで19も高い耐熱性を有
する組成物を得んとして鋭意研究の結果、本発明を完成
させたものである。
The present inventors have completed the present invention as a result of intensive research in order to obtain a composition that does not lose the excellent properties of the epoxy resin and has heat resistance that is 19 times higher than that of the present inventors. It is something.

エポキシ樹脂は一般に硬化剤と称されるアミン類、酸無
水物類、フェノール類を併用して硬化させるのが普通で
あるが、耐薬品性という点においては硬化反応により生
成する結合が極性の強い、化学的に活性な構造を与える
“7jン類、酸無水物類による硬化物よりもフェノール
I’iKよる硬化物の方が化学的に安定であ咬優れてい
る。このため、本発明者らはエポキシ樹脂の耐熱性を改
良するに当や耐薬品性に優れたフェノール類を硬化剤と
する方法での改^を検討した。
Epoxy resins are usually cured using a combination of amines, acid anhydrides, and phenols, which are generally called curing agents, but in terms of chemical resistance, the bonds formed during the curing reaction are highly polar. The cured product of phenol I'iK is chemically more stable and has better texture than the cured product of ``7j'' and acid anhydrides, which give a chemically active structure. investigated the use of phenols, which have excellent chemical resistance, as a curing agent to improve the heat resistance of epoxy resins.

エポキシ樹脂を7エノール類で硬化させる組成物のうち
で、耐熱性に優れるものとしては、エポキシ樹脂にノボ
ラック型の多官能エポキシ樹脂を用い、硬化剤として多
官能フェノールでありフェノールノボラックを用い九も
のが広く知られている。多官能エポキシ樹脂を用いるこ
とにより、汎用のビスフェノールAジグリシジルエーテ
ルを用いた組成物に比し高い耐熱性を得ることができる
が、それでも・その組成物を硬化させた場合のガラス転
移温度Fi160℃11度Ktき′ない。
Among compositions for curing epoxy resins with 7 enols, those with excellent heat resistance use a novolac type polyfunctional epoxy resin as the epoxy resin and a polyfunctional phenol phenol novolac as a curing agent. is widely known. By using a polyfunctional epoxy resin, it is possible to obtain higher heat resistance than a composition using general-purpose bisphenol A diglycidyl ether; however, when the composition is cured, the glass transition temperature Fi160°C 11 degrees Kt is not reached.

このため、本発明者らは耐薬品性に優れるフェノール硬
化エポキシ樹脂組成物の耐熱性をさらに向上させるべく
、エポキシ樹脂、フェノール類の種々の組み合せについ
て検討した結果、従来知られる耐熱性エポキシ樹脂組成
物に比しけるかに高い耐熱性を有する1成物を見出し本
発明を完成させた。
Therefore, in order to further improve the heat resistance of phenol-cured epoxy resin compositions that have excellent chemical resistance, the present inventors investigated various combinations of epoxy resins and phenols, and found that conventionally known heat-resistant epoxy resin compositions The present invention was completed by discovering a single product that has much higher heat resistance than other products.

すなわち本発明は、(a)、エポキシ樹脂としてド記一
般式〔I〕で表わされるトリスフェノールのトリグリシ
ジルエーテルを、(bL 煙化剤として、下記一般式[
11]で示されるトリスフェノールを必須成分としてな
る耐熱性エポキシ樹脂組成物である。
That is, the present invention provides (a) a triglycidyl ether of trisphenol represented by the following general formula [I] as an epoxy resin, (bL) a fuming agent, and a trisphenol triglycidyl ether represented by the following general formula [I] as an epoxy resin;
11] is a heat-resistant epoxy resin composition containing trisphenol as an essential component.

一般式(I) 一般式(n) (上式(1)、(H)中のR1、R1は低級アルキル残
基を示す) 本発明の紡記一般式(1)  で表わされるエポキシ樹
脂としては、トリス(4−クリシトキンフェニル)メタ
ン、1,1.2−トリス(4−グリシドキシフェニル)
エタン、1,1.3−)リス(4−グリシドキシフェニ
ル)フロパンなどが例示さね、又、前記一般式(II)
で表わされる硬化剤としては、トリス(4−ヒドロキン
フェニル) メタン、1,1.2−)リス (4−ヒド
ロキシフェニル)エタン、1 、1 、3−1−IIス
(4−ヒドロキシフェニル)フロパンなトカ例示される
が、目的によってFi、特性を損なわない範囲で他のエ
ポキシ化合物や他の硬化剤を併用してもよい。
General formula (I) General formula (n) (R1 and R1 in the above formulas (1) and (H) represent lower alkyl residues) As the spinning epoxy resin of the present invention represented by the general formula (1), , tris(4-chrysitoquinphenyl)methane, 1,1,2-tris(4-glycidoxyphenyl)
Examples include ethane, 1,1.3-)lis(4-glycidoxyphenyl)furopane, and the general formula (II)
Examples of the curing agent represented by: tris(4-hydroquinphenyl)methane, 1,1,2-)lis(4-hydroxyphenyl)ethane, 1,1,3-1-IIs(4-hydroxyphenyl) An example is fluoropane, but depending on the purpose, other epoxy compounds or other curing agents may be used in combination without impairing Fi and properties.

本発明において使用するエポキシ樹脂とフェ/−−ル類
の割合は耐熱性の点からエポキシ基に対するフェノール
性水識基の割合で0.5〜2が好ましく、さらに好まし
いのは0.8〜1゜2であや、最も好ましいのは1であ
る。
From the viewpoint of heat resistance, the ratio of the epoxy resin to the phenolic water group used in the present invention is preferably 0.5 to 2, more preferably 0.8 to 1. The value is 2, and the most preferred value is 1.

本発明の耐熱性エポキシ樹脂を硬化させるに際しては、
硬化速度の促進の為に通常、イミダノール類、3級アミ
ン類、沸化ホウ素化合物郷の触媒を使用することができ
る。ヌ、用途などにより、従来公知の補強材、充てん剤
、離型剤、離燃剤、染顔料、カップリング剤などを適宜
使用することができる。無機質補強材もしくは充てん剤
としては、シリカ、石英ガラス粉、アルミナ、ケイ酸カ
ルシウム、炭酸カルシウム、タルク、カオリン等の無機
質粉体やガラス繊維、カーボン繊維等の無機質縁線、ガ
ラスバルーン、シラスバルーン等の中空球体が例示され
、電気特性の点からは、シリカ、石英ガラス粉が特に好
ましい。無機質充てん材の使用割合Lエポキシ樹脂と硬
化剤の合計100重量部に対し50〜500重量部が好
ましく中でも100〜3011部が特に好オしい。無機
質充てん材の併用により強度が改良され、熱膨張率、熱
伝導率等も改良されることから耐熱性の機構部品用とし
て適するだけでなく電気PI#用としても使用しやすい
ものとなる。電気絶縁用として用いる場合は無機質フィ
ラーの中でも電気特性に優れるシリカ粉末及び石英ガラ
ス粉末を主体とするものが特に適しているが、このシリ
カ粉末及び石英ガラス粉末併用による物性改良により、
高集積化、ハイパワー化により近都とみに耐熱性の重要
性が増して来九半導体の封止樹脂には非常に好適な組成
物となり封止材料としての利用が有用である。
When curing the heat-resistant epoxy resin of the present invention,
Catalysts such as imidanols, tertiary amines, and boron fluoride compounds can generally be used to accelerate the curing rate. Depending on the purpose, etc., conventionally known reinforcing materials, fillers, mold release agents, flame release agents, dyes and pigments, coupling agents, etc. can be used as appropriate. Examples of inorganic reinforcing materials or fillers include inorganic powders such as silica, quartz glass powder, alumina, calcium silicate, calcium carbonate, talc, and kaolin, inorganic edge wires such as glass fiber and carbon fiber, glass balloons, and glass balloons. Hollow spheres are exemplified, and silica and quartz glass powders are particularly preferred from the viewpoint of electrical properties. The ratio L of the inorganic filler used is preferably 50 to 500 parts by weight per 100 parts by weight of the epoxy resin and curing agent, and particularly preferably 100 to 3011 parts. The combined use of an inorganic filler improves the strength, and also improves the coefficient of thermal expansion, thermal conductivity, etc., making it not only suitable for heat-resistant mechanical parts but also easy to use for electrical PI#s. When used for electrical insulation, among inorganic fillers, those mainly composed of silica powder and quartz glass powder, which have excellent electrical properties, are particularly suitable.
As heat resistance becomes more important in urban areas due to higher integration and higher power, it has become a very suitable composition for semiconductor encapsulation resins and is useful as a encapsulation material.

本発明組成物の調製の丸め各成分を混合する方法として
は目的により種々のものが適用可能であるが、溶剤によ
る溶液混合、−一〜ター、熱ロール等による溶融混合、
ボールミルによる粉体混合等従来一般に知られた方法が
使用可能である。
Rounding of the Preparation of the Composition of the Invention Various methods can be used to mix the components depending on the purpose, including solution mixing using a solvent, melt mixing using a hot roll, etc.
Conventionally known methods such as powder mixing using a ball mill can be used.

以下に実施例および比較例を示して本発明をへ体的に説
明する。
The present invention will be explained in detail by showing Examples and Comparative Examples below.

実#fFl11 トリス (4〜グリシドキシフエニA)メタン(エポキ
シ当量166)   1001m、トリス(4−ヒドロ
キシフェニル)メタン(OH当量98)59部および2
−7ヱニルイミダゾール 195部をニーダ−で加熱溶
融混合した後、冷却1、粉砕した。
Fruit #fFl11 Tris (4-glycidoxyphenylene A) methane (epoxy equivalent 166) 1001 m, tris (4-hydroxyphenyl) methane (OH equivalent 98) 59 parts and 2
-7 Enylimidazole 195 parts were heat-melted and mixed in a kneader, then cooled 1 and pulverized.

この樹脂組成物を、金型温度 170℃、硬化時間 2
分で加圧成形し、得られた成形片を175℃で、5時間
ポストキュアーした。この成形片の熱膨張を2短蝕の昇
温速度の条件で石英管ディヲトメーターを用いて測定し
、ガラス領埴の熱膨張係数及び二次転位温度(ガラス転
位温度Tg)を求めた。
This resin composition was applied at a mold temperature of 170°C and a curing time of 2.
The resulting molded piece was post-cured at 175° C. for 5 hours. The thermal expansion of this molded piece was measured using a quartz tube diotometer under the condition of a heating rate of 2 short erosions, and the thermal expansion coefficient and secondary transition temperature (glass transition temperature Tg) of the glass mold were determined.

結果を第1表に示した。The results are shown in Table 1.

実施例2 1.1.3−)リス(4−グリシドキシフェニル)プロ
パン(軟化点60℃、エポキシ当量180)   10
0部、トリス (4−ヒドロキンフェニル)メタン 5
411Sおよび2− フエごルイミダゾール 1.5部
を用いて実施例1と同様にして加熱混合、冷却粉砕、成
形、ポストキュアーし、同様に測定した。結果を第1P
K示した。
Example 2 1.1.3-) Lis(4-glycidoxyphenyl)propane (softening point 60°C, epoxy equivalent 180) 10
0 parts, tris(4-hydroquinphenyl)methane 5
411S and 1.5 parts of 2-fegolimidazole were heated and mixed, cooled and pulverized, molded and post-cured in the same manner as in Example 1, and measured in the same manner. 1st page of results
K showed.

比較例1 実[Fl I において、トリス(4−ヒドロキンフェ
ニル)メタンにかえてフェノールノボラック(軟化点8
5℃、OH当量105)   63部を用いる他は同様
にした。結果を第1表に示し、た。
Comparative Example 1 In real [Fl I, phenol novolac (softening point 8
The same procedure was followed except that 63 parts of OH equivalent (105) were used at 5°C. The results are shown in Table 1.

比較例2 実施例Iにおいて、トリス(4−グリシドキシフェニル
) メタン及びトリス (4−ヒドロキシフェニル)メ
タンにかえてそれぞれ、クレノ゛−ルツボラック型エポ
キン樹脂(軟化点70″C−、エポキシ当、11 21
5)   100部、フェノールノボラック(軟化点8
5℃、OH当量 105)  49部用いる他は同様と
した。結果を第1表に示した。
Comparative Example 2 In Example I, instead of tris(4-glycidoxyphenyl)methane and tris(4-hydroxyphenyl)methane, klenorucborac type epoxy resin (softening point 70''C-, epoxy equivalent) was used. , 11 21
5) 100 parts phenol novolac (softening point 8
The same procedure was followed except that 5°C and 49 parts of OH equivalent (105) were used. The results are shown in Table 1.

実施例3 トリス(4−グリシドキシフェニル) メタン100M
、)リス (4−ヒドロキシフェニル)メタン 59部
、及び2−7エニルイミダゾール 1.5部をニーダー
にて加熱溶融混合した後、冷却し粉砕した。
Example 3 Tris(4-glycidoxyphenyl) methane 100M
, ) 59 parts of lith (4-hydroxyphenyl)methane and 1.5 parts of 2-7 enylimidazole were heated and melted and mixed in a kneader, then cooled and pulverized.

この樹脂粉 160.5部に、シリカ粉末380部、ス
テアリン蒙カルシウム 2部、及びγ−グリシドキシプ
ロビルトリメトキシンラン 2部を加え、プレングーで
混合した後、熱ロールで加熱混練し、冷却、粉砕して成
形材料を得た。
To 160.5 parts of this resin powder, 380 parts of silica powder, 2 parts of calcium stearin, and 2 parts of γ-glycidoxypropyltrimethoxine were added, mixed with pre-mix, heated and kneaded with a hot roll, and cooled. , and crushed to obtain a molding material.

この成形材料を用いて金型温度 170℃、砕化時間 
2分でトランスファー成形して試験片を得、これを17
5℃、5時間ポストキュアーした。
Using this molding material, the mold temperature was 170℃, and the crushing time was
A test piece was obtained by transfer molding in 2 minutes, and this was
Post-cure was performed at 5°C for 5 hours.

この試験片を用いて、実施例1と同様の熱膨張の測定、
初期の体積抵抗率、加圧水蒸気(121’C12気圧)
によるプレッシャークツカーデート(PCT)後の体積
抵抗率、及び曲げ強度の測定をした。結果を第2表に示
した。
Using this test piece, the same thermal expansion measurement as in Example 1,
Initial volume resistivity, pressurized steam (121'C12 atm)
The volume resistivity and bending strength after pressure curdling (PCT) were measured. The results are shown in Table 2.

比較例3 クレゾールノボラック型エポキシ樹脂(軟化点70℃、
エポキシ嶋量215)   100%1フエノールノボ
ラツク(軟化点85℃、014%11105)  49
部、及び2−7エニルイミダゾール 1.5部をニーグ
ーで加熱溶融混合した後、冷却、粉砕した。
Comparative Example 3 Cresol novolac type epoxy resin (softening point 70°C,
Epoxy weight 215) 100% 1-phenol novolak (softening point 85°C, 014% 11105) 49
1 part and 1.5 parts of 2-7 enylimidazole were heated and melted and mixed in a Nigu, then cooled and pulverized.

この樹脂粉 150.5部に、シリカ粉末36011、
ステアリン酸カルシウム 2部及びγ−グリシドキシプ
ロビルトリメトキンシラン2部を加え実施例3と同様に
して成形材料を得た。
To 150.5 parts of this resin powder, 36011 silica powder,
A molding material was obtained in the same manner as in Example 3 by adding 2 parts of calcium stearate and 2 parts of γ-glycidoxypropyl trimethochynesilane.

この成形材料を用いる他は実施例3と同4!1にした結
果を第2麦に示した。
The results were shown in the second barley using the same method as in Example 3 except that this molding material was used.

第2表Table 2

Claims (1)

【特許請求の範囲】 1、L  エポキシ樹脂として下記一般式(I)(式中
のR5は低級アルキル残基) で表わされるトリスフェノールのトリグリシジルエーテ
ルと す、硬化剤として下記一般式tn) (式中のR2は低級アルキル残基) で表わされるトリスフェノールとを必須成分としてなる
耐熱性エポキシ樹脂組成物 2 エポキシ樹脂(a)のエポキシ基に対する硬化剤(
b)のフェノール性水酸基の割合が0.5〜2である特
許請求の範囲第1項記載のエポキシ樹脂組成物
[Claims] 1.L The epoxy resin is a triglycidyl ether of trisphenol represented by the following general formula (I) (in the formula, R5 is a lower alkyl residue), and the curing agent is the following general formula (tn) ( R2 in the formula is a lower alkyl residue) Heat-resistant epoxy resin composition 2 containing trisphenol represented by the following as an essential component: A curing agent for the epoxy group of the epoxy resin (a)
The epoxy resin composition according to claim 1, wherein the proportion of phenolic hydroxyl groups in b) is 0.5 to 2.
JP8268782A 1982-05-17 1982-05-17 Heat-resistant epoxy resin composition Granted JPS58198526A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8268782A JPS58198526A (en) 1982-05-17 1982-05-17 Heat-resistant epoxy resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8268782A JPS58198526A (en) 1982-05-17 1982-05-17 Heat-resistant epoxy resin composition

Publications (2)

Publication Number Publication Date
JPS58198526A true JPS58198526A (en) 1983-11-18
JPH0160168B2 JPH0160168B2 (en) 1989-12-21

Family

ID=13781324

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8268782A Granted JPS58198526A (en) 1982-05-17 1982-05-17 Heat-resistant epoxy resin composition

Country Status (1)

Country Link
JP (1) JPS58198526A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61200118A (en) * 1985-03-01 1986-09-04 Sumitomo Bakelite Co Ltd Epoxy resin composition for sealing photosemiconductor
JPS63183918A (en) * 1987-01-27 1988-07-29 Ube Ind Ltd Epoxy resin composition
EP0282977A2 (en) * 1987-03-16 1988-09-21 Shin-Etsu Chemical Co., Ltd. Epoxy resin composition
JPS644615A (en) * 1987-06-26 1989-01-09 Hitachi Ltd Thermosetting resin composition and its application
JPH01101658A (en) * 1987-10-15 1989-04-19 Nitto Denko Corp Semiconductor device
JPH01249826A (en) * 1988-03-31 1989-10-05 Toshiba Corp Epoxy resin molding material for sealing semiconductor
JPH0294654A (en) * 1988-09-30 1990-04-05 Nitto Denko Corp Semiconductor device
US6034185A (en) * 1997-04-09 2000-03-07 Chang Chun Plastics Co., Ltd. Epoxy resin composition containing polyalkyl phenol resins and/or polyalkyl phenol epoxy resins
WO2001055277A1 (en) * 2000-01-19 2001-08-02 Hitachi Chemical Co., Ltd. Adhesive film for semiconductor, lead frame with adhesive film for semiconductor and semiconductor device using the same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4830799A (en) * 1971-08-19 1973-04-23
JPS5734122A (en) * 1980-08-11 1982-02-24 Mitsubishi Petrochem Co Ltd Thermosetting resin composition

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4830799A (en) * 1971-08-19 1973-04-23
JPS5734122A (en) * 1980-08-11 1982-02-24 Mitsubishi Petrochem Co Ltd Thermosetting resin composition

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61200118A (en) * 1985-03-01 1986-09-04 Sumitomo Bakelite Co Ltd Epoxy resin composition for sealing photosemiconductor
JPS63183918A (en) * 1987-01-27 1988-07-29 Ube Ind Ltd Epoxy resin composition
EP0282977A2 (en) * 1987-03-16 1988-09-21 Shin-Etsu Chemical Co., Ltd. Epoxy resin composition
JPS644615A (en) * 1987-06-26 1989-01-09 Hitachi Ltd Thermosetting resin composition and its application
JPH01101658A (en) * 1987-10-15 1989-04-19 Nitto Denko Corp Semiconductor device
JPH01249826A (en) * 1988-03-31 1989-10-05 Toshiba Corp Epoxy resin molding material for sealing semiconductor
JPH0294654A (en) * 1988-09-30 1990-04-05 Nitto Denko Corp Semiconductor device
US6034185A (en) * 1997-04-09 2000-03-07 Chang Chun Plastics Co., Ltd. Epoxy resin composition containing polyalkyl phenol resins and/or polyalkyl phenol epoxy resins
WO2001055277A1 (en) * 2000-01-19 2001-08-02 Hitachi Chemical Co., Ltd. Adhesive film for semiconductor, lead frame with adhesive film for semiconductor and semiconductor device using the same
US6733880B2 (en) 2000-01-19 2004-05-11 Hitachi Chemical Co., Ltd. Adhesive film for semiconductor, lead frame with adhesive film for semiconductor and semiconductor device using the same

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