JPS58194396A - Method of producing circuit board with micropins - Google Patents

Method of producing circuit board with micropins

Info

Publication number
JPS58194396A
JPS58194396A JP7696382A JP7696382A JPS58194396A JP S58194396 A JPS58194396 A JP S58194396A JP 7696382 A JP7696382 A JP 7696382A JP 7696382 A JP7696382 A JP 7696382A JP S58194396 A JPS58194396 A JP S58194396A
Authority
JP
Japan
Prior art keywords
layer
wiring board
conductor
wiring
pad
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7696382A
Other languages
Japanese (ja)
Inventor
啓順 田中
小野瀬 勝秀
勇 小高
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP7696382A priority Critical patent/JPS58194396A/en
Publication of JPS58194396A publication Critical patent/JPS58194396A/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明は、基板本体上に配線層が形成さ机、ぞの配線層
が基板本体十に形成されたパッド層に連結されてなる構
成の配線基板を具備し、そのパッド層上に配線基板の配
線層を外部に連結する為のマイクロビンが植立されてな
る構成のマイクロビン付配線基板の製法に関づる。
DETAILED DESCRIPTION OF THE INVENTION The present invention comprises a wiring board having a structure in which a wiring layer is formed on a board main body, each wiring layer is connected to a pad layer formed on a board main body, and The present invention relates to a method for producing a wiring board with microbins having a structure in which microbins for connecting the wiring layer of the wiring board to the outside are planted on a pad layer.

断種マイクロビン付配線基板として、従来、第1図にて
全体としてUで示す如き、絶縁性を有する基板本体1の
主面2上に、それを外部に臨ませる複数の窓3を穿設し
てなる絶縁層4が形成され、又、主面2上に、絶縁層4
の複数の窓3内の位置に於て、夫々複数のパッド層5が
形成され、一方、絶縁層4上(こ、複数のパッド層5に
夫々連結して延長せる、複数の配線層6が形成され、而
して、枚数の配線@6及び複数のパッド層5の外周部領
域が、絶縁層1及び複数のパツ°ド層5の外周部領域1
−に連続延(、ける複数のパッド層5を夫々外部に臨;
1、せる複数の窓7を穿設してなる、絶縁層8にて埋設
されてなる態様を以って、基板本体11−に、複数の配
線層6が形成され、それ等?!2数の配線層6が、基板
本体1上に形成された複数パッド層5に夫々連結されて
なる構成の配線基板9を具備し、而して、その配線基板
9の複数のパッド層5上に、配線基板9の複数の配線層
6を外部に連結する為の縦断面でみて逆T字状の複数の
マイク「】ビン10を、半田11を用いて植立せしめて
なる構成のものが提案されている。
Conventionally, as a wiring board with a sterilization microbin, a plurality of windows 3 are formed on the main surface 2 of an insulating board body 1, as shown by U in FIG. 1, to expose the board to the outside. An insulating layer 4 is formed on the main surface 2.
A plurality of pad layers 5 are formed at positions within the plurality of windows 3, respectively, and a plurality of wiring layers 6 are formed on the insulating layer 4 (here, a plurality of wiring layers 6 are respectively connected and extended to the plurality of pad layers 5). The number of wiring lines @6 and the outer peripheral region of the plurality of pad layers 5 are the same as the outer peripheral region 1 of the insulating layer 1 and the plurality of pad layers 5.
- continuously extending a plurality of pad layers 5 to the outside;
1. A plurality of wiring layers 6 are formed on the substrate main body 11- by a mode in which a plurality of windows 7 are formed and embedded in an insulating layer 8. ! The wiring board 9 has a configuration in which two wiring layers 6 are respectively connected to the plurality of pad layers 5 formed on the board body 1, and the wiring board 9 has a structure in which two wiring layers 6 are respectively connected to the plurality of pad layers 5 formed on the substrate body 1. In this example, a plurality of microphones 10 having an inverted T shape when viewed in vertical section are used to connect a plurality of wiring layers 6 of a wiring board 9 to the outside, and are made of a plurality of microphones 10, which are planted using solder 11. Proposed.

断る構成を有するマイクロビン付配線基板Uは、配線基
板9のパッド層5上に、配線基板9の配線層6を外部に
連結する為のマイクロビン10を植立してなる構成を有
するので、斯る構成を有4ろマイクロビン付配線基板U
を、Ul及びU2として2つ有し、而して、それ等2つ
のマイクロビン付配線基板1ノ1及びU2の配線層6を
nに連結する必要がある場合、その連結を容易になすこ
とが出来るという特徴を有するしのCある。
The wiring board U with microbins having the configuration of refusing the wiring board U has a configuration in which the microbins 10 for connecting the wiring layer 6 of the wiring board 9 to the outside are planted on the pad layer 5 of the wiring board 9. A wiring board U with a 4-filter microbin having such a configuration
, as Ul and U2, and when it is necessary to connect the wiring layers 6 of the two wiring boards 1 and U2 with microbins to n, the connection can be easily made. There is a type C that has the characteristic of being able to do.

即ら、第2図に示す如き、絶縁基板21に、イの相対向
する主面22及び23間に延長せる複数の孔24が形成
され、それ等孔24内に、人々例えば水銀の如き流動性
導体25が収容保持されてなる態様を以って、絶縁基板
21に、複数の孔24及びそれ等孔2/I内に夫々収容
保持されてなる流動性導体25による複数のソケット2
6を構成してなる構成の、]コネクタ板を予め用意し置
りば、その]コネクタ板に、マイクロビン付配線基板U
1及びU2を、イれ等のマイクロビン10を夫々コネク
タ板Bのソケット26内にコネクタ板Bの主面22及び
23側より挿入せしめた態様を以ってill!結する丈
けで、マイクロビン付配線基板1ノ1及びU2のマイク
ロビン10が、]コネクタ板のソケット26を構成せる
流動性導体25を介して互に連結されるので、マイクロ
ビン付配線基板U1及びU2の配線層6を、互に連結づ
ることか出来るという特販を有するものである。
That is, as shown in FIG. 2, a plurality of holes 24 are formed in the insulating substrate 21 and extend between the opposing main surfaces 22 and 23 of the insulating substrate 21. In this manner, a plurality of sockets 2 are formed in the insulating substrate 21 by a plurality of holes 24 and fluid conductors 25 respectively accommodated and held in the holes 2/I.
6, if you prepare and place the connector board in advance, the wiring board U with microbin is attached to the connector board.
1 and U2 are inserted into the sockets 26 of the connector plate B from the main surfaces 22 and 23 sides of the connector plate B, respectively. The micro-bins 10 of the micro-bin-equipped wiring board 1 no. The special feature is that the wiring layers 6 of U1 and U2 can be connected to each other.

所で、斯る特徴を有りるマイク[1ビンイ・1配線基板
Uの製法としで、従来、第4図反で;第5図を伴なって
以下述べる方法が提案される。
By the way, as a method for manufacturing a microphone having such characteristics [one bin and one wiring board U], the method described below with reference to FIG. 4 and FIG. 5 has been proposed.

即ち、予め、第4図に示す如き、第1図にて    1
上述せる配線基楡9と同様の、基扱木(A11−に複数
の配線層6が形成され、それ客複数の配線層6が基板本
体1−トに形成された複数のパッドFJ5に連結されて
なる構成の配@基板9を用意する。
That is, in advance, in Figure 1 as shown in Figure 4, 1
Similar to the wiring board 9 described above, a plurality of wiring layers 6 are formed on the base tree (A11-), and the plurality of wiring layers 6 are connected to a plurality of pads FJ5 formed on the board body 1-. A wiring board 9 having the following configuration is prepared.

−h、第5図Aに示す如き導体板31を予め用意し、而
して、第5図Bに示す如く、その導体板31の主面32
上に、導体板33に複数の孔34を穿設してなる構成の
マスク、電極35を、1面32と平行に近接対向せしめ
、そのマスク電極35及び導体板31間に所要の電源3
6を接続して、マスク電極35及び導体板31間でhQ
電をなさしめ、これにより、導体板31の、\ノスク電
極35の孔34以外の領域に対向するft1t+iJを
1.面32側より除去せしめ、これに応じて、マスク電
極35を、導体板31の主面32ど対向せる他の主面3
2′側に、その主面32′ と平行なる関係を保って下
降せしめるという、導体板31に対する、その主面32
側よりのマスク電極35を用いた放電加工処理をなし、
斯くて、第5図Cに示寸如く、導体板31に、その−を
面32′側とは反対側に於て、横断面でみて、マスク電
極35の孔34に対応する大いさを有する複数の導体柱
37を形成する。
-h, a conductor plate 31 as shown in FIG. 5A is prepared in advance, and the main surface 32 of the conductor plate 31 as shown in FIG.
On the top, a mask and an electrode 35 having a configuration in which a plurality of holes 34 are bored in a conductive plate 33 are placed close to each other in parallel with one surface 32, and a required power source 3 is connected between the mask electrode 35 and the conductive plate 31.
6 and hQ between the mask electrode 35 and the conductor plate 31.
As a result, ft1t+iJ of the conductor plate 31 facing the area other than the hole 34 of the Nosk electrode 35 is increased to 1. The mask electrode 35 is removed from the main surface 32 of the conductor plate 31 on the opposite main surface 3.
The main surface 32 of the conductor plate 31 is lowered toward the 2' side while maintaining a parallel relationship with the main surface 32' of the conductor plate 31.
Perform electrical discharge machining using a mask electrode 35 from the side,
Thus, as shown in FIG. 5C, a plurality of holes are formed on the conductor plate 31, with the - side opposite to the surface 32', and having a size corresponding to the hole 34 of the mask electrode 35 when viewed in cross section. A conductor column 37 is formed.

次に、第5図りに示す如く、複数の導体柱37の上端面
38上に、導体板/11に上述ぜるマスク電極35の孔
34に比し小なる孔42を穿設してなる構成のマスク電
極13を、その複数の孔42が夫々複数の導体柱37の
上端面38に対向せる関係の得られる状態で、」一端面
38と平行に近接対向せしめ、イのマスク電極43及び
導体板31間に所要の電源44を接続して、マスク電極
43及び複数の導体柱37間で放電をなさしめ、これに
より、複数の導体柱37の夫々につき、そのマスク電極
43の孔42以外の領域に対向覆る領域を1一端面38
側より除去せしめ、これに応じて、マスク電極43を、
導体板31の主面32′側に、その」−面32′と平行
なる関係を保って下降せしめるという、複数の導体柱3
7に対づろ、ぞれ等の1−※:::而38面よりのマス
電極43を用いたbV電加]鴇理をなし、斯くて、第5
図Fに承り如く、複数の導体柱37、その上端面38側
に於て、夫々横断面でみてマスク電極43の孔42に対
応する大いさを有する導体柱部45を形成する。
Next, as shown in the fifth diagram, holes 42 smaller than the holes 34 of the mask electrode 35 described above are formed in the conductor plate/11 on the upper end surfaces 38 of the plurality of conductor columns 37. The mask electrodes 13 of (A) are placed in parallel with one end surface 38 and closely opposed to each other in such a manner that the plurality of holes 42 are respectively opposed to the upper end surfaces 38 of the plurality of conductor columns 37. A required power source 44 is connected between the plates 31 to generate a discharge between the mask electrode 43 and the plurality of conductor columns 37, and thereby, for each of the plurality of conductor columns 37, the holes other than the holes 42 of the mask electrode 43 are 1 end face 38 covering the area facing the area
Accordingly, the mask electrode 43 is removed from the side.
A plurality of conductor pillars 3 are arranged on the main surface 32' side of the conductor plate 31 and descend while maintaining a relationship parallel to the "-plane 32'.
7, each of the 1-*:::bV electric current using the mass electrode 43 from the 38th surface], thus, the 5th
As shown in FIG. F, on the upper end surfaces 38 of the plurality of conductor columns 37, conductor column portions 45 each having a size corresponding to the hole 42 of the mask electrode 43 when viewed in cross section are formed.

次に、複数の導体柱37を、それ等の第5図Fでホブ導
体柱部45より導体板31の主面32′側を通る導体板
31の主面32′と平行な面46に沿って切断し、斯く
て、第5図Fに示づ如き、複数の導体柱37の面46よ
り導体柱部45側の部でなる縦断面ぐみて逆T字状の複
数のマイクロビン10を得る。
Next, the plurality of conductor columns 37 are arranged along a plane 46 parallel to the principal surface 32' of the conductor plate 31 that passes from the hob conductor column section 45 to the principal surface 32' side of the conductor plate 31 in FIG. 5F. In this way, as shown in FIG. .

然る后、第5図Fにて上述せる如くに得られる縦断面で
みて逆T字状の複数のマイクロビン10庖、第5図Gに
示す如く、第4図にて上述口る如くに予め用意せる配線
基板9の複数のパッド層5Fに、半田11を用いて位置
決めして植立せしめ、斯くて、目的とせるマイクロビン
イ・1配線基板Uを得る。
After that, as shown in FIG. 5F, a plurality of 10 microbins having an inverted T-shape when seen in the vertical cross section obtained as described above in FIG. 5F, as shown in FIG. The plurality of pad layers 5F of the wiring board 9 prepared in advance are positioned and planted using the solder 11, thus obtaining the intended microbin-1 wiring board U.

以−1にて、従来提案されている第1図にて上述υるマ
イクロビン付配線基板Uの製法が明らかとなったが、断
る従来の製法の場合、第5図Fにて上述せる如く得られ
る複数のマイクロビン10を、予め用意せる配線基板9
の複数のパッド層5上に半田11を用いて植立するに多
くの手間と時間とを要し、このことは、各マイクロビン
10がそれに対するパッド層51−の所定位置に正確に
位置決めして植立されていないものとすれば、マイクロ
ビン付配線基板()を第3図にて前述せる如くに]ネク
タ板Bに円滑に連結することが出来ない理由で、各マイ
クロビン10がそれに対するパッド層5上の所定の位置
に正確に位置決めして植立していなければならないので
筒型である。
In the above-1, the manufacturing method of the wiring board U with microbins shown in FIG. A wiring board 9 on which a plurality of obtained microbins 10 can be prepared in advance.
It takes a lot of effort and time to plant the solder 11 on the plurality of pad layers 5, and this means that each microbin 10 must be accurately positioned at a predetermined position on the pad layer 51-. If the wiring board with microbins 10 is not planted in the connector plate B, each microbin 10 may not be connected smoothly to the connector board B as described above in FIG. It has a cylindrical shape because it must be accurately positioned and planted at a predetermined position on the pad layer 5.

又、上述せる従来の製法の場合、マイク「】ビン10が
°導体数31より出発して、それに苅する放電加工処理
によってその導体板31に導体柱37を形成し、次に、
その導体柱37に対する放電加工処理によってその導体
柱37に導体柱部452形成賦然6后・■柱37fl;
71断     、11するという工程を杼で得られる
ので、マイクロビン10が、導体板31の人なる材料分
の無駄を伴なって得られ、依ってマイクロビン10が高
価にしか得られないものである。このことは、]ネクタ
板Bのソケット26を構成せる流動性導体25が水銀で
なる場合、マイクロビン10が水銀に侵されイ【い白金
でなることを要し、この為導体板31が白金でなるを要
することになる場合筒型である。
In addition, in the case of the conventional manufacturing method described above, the microphone bottle 10 starts with 31 conductors, and the conductor pillars 37 are formed on the conductor plate 31 by electrical discharge machining, and then,
The conductor column portion 452 is formed on the conductor column 37 by the electric discharge machining process on the conductor column 37.
Since the steps of 71 cutting and 11 can be obtained using a shuttle, the microbin 10 can be obtained with the waste of material for the conductor plate 31, and therefore the microbin 10 can only be obtained at a high price. be. This means that if the fluid conductor 25 constituting the socket 26 of the connector plate B is made of mercury, the microbottle 10 must be made of platinum, which cannot be corroded by mercury. If it becomes necessary, it is cylindrical.

依って、本発明は、−上述せる従来の製法の欠点のない
、新規なマイクロビン付配線基板の製法を提案せんとす
るもので、以下詳述する所より明らかとなるであろう。
Therefore, the present invention aims to propose a novel method for manufacturing a wiring board with a microbin, which does not have the drawbacks of the conventional manufacturing method described above, and will become clear from the detailed description below.

第6図は、本発明によるマイクロビン付配線基板の製法
の実施例を示し、予め第6図Aに示づ如き、第4図にて
に述せる配線基板9と同様の、基板本体1Fに複数の配
線層6が形成され、イれ等複数の配線層6が基板本体1
上に形成された複、数のパッド層5に連結されてなる構
成の配am板9を用意する。尚、第6図Δに於て、上述
せろもt板本体1、パッド層5及び゛配線層6以外の第
4図にて上述せる配線基板9との対応部分には同一符号
を則しτ訂I8′l説明はJれを省略する。
FIG. 6 shows an embodiment of the method for manufacturing a wiring board with a microbin according to the present invention. A plurality of wiring layers 6 are formed, and a plurality of wiring layers 6, such as a plurality of wiring layers 6, are formed on the substrate main body 1.
An ammeter plate 9 configured to be connected to a plurality of pad layers 5 formed above is prepared. In addition, in FIG. 6 Δ, the same reference numerals are given to the parts corresponding to the wiring board 9 described above in FIG. Revision I8'l The explanation is omitted.

而して、第6図Bに示す如く、配線基板9のパッド層5
を具備する側の主面上に例えば500人の厚さの例えば
クロムでなる保護層51を、例えば蒸着によって形成す
る。
Thus, as shown in FIG. 6B, the pad layer 5 of the wiring board 9
A protective layer 51 made of, for example, chromium and having a thickness of, for example, 500 mm is formed on the main surface of the side provided with, for example, by vapor deposition.

次に、第6図Gに示す如く、聯体層51.トに、熱架橋
形有機高分子材、ポリミド等で11ろ有機高分子材層5
2を耐重る。尚、この場合の、有機高分子材層52が導
体@51Fに配されてなる構成は、有機高分子材の塗布
により得ることが出来る外、予めシート状に得られてい
る有機高分子材層を加熱して貼着することに」、り冑る
ことが出家、図に於いては後置の場合が示されている。
Next, as shown in FIG. 6G, the unitary layer 51. On top of that, an organic polymer material layer 5 made of thermally crosslinkable organic polymer material, polyimide, etc.
Can withstand 2. In addition, in this case, the structure in which the organic polymer material layer 52 is arranged on the conductor @ 51F can be obtained by coating the organic polymer material, or by using the organic polymer material layer obtained in advance in the form of a sheet. By heating and pasting it, it is said that it is possible to become a priest.

次に、第6図りに示す如く、有機高分子材層52上に、
例えばアルミニウムでなる円形のマスクH54を、例え
ばフォトリソグラフィ法によって形成する。この場合、
マスク層54は、F方よりみて、パッド層5の絶縁Pf
!8の窓に臨む領域内に納まる位置及び大いさを有して
いる。
Next, as shown in the sixth diagram, on the organic polymer material layer 52,
A circular mask H54 made of, for example, aluminum is formed by, for example, photolithography. in this case,
The mask layer 54 is the insulation Pf of the pad layer 5 when viewed from the F direction.
! It has a position and size that fits within the area facing the window No. 8.

次に有機高分子材層52に対するマスク層54をマスク
とせる、例えば酸素ガスを用いた反応性イオンエツチン
グ処理でなるエツチング処理によって、第6図Eに示す
如く、有機高分子材層52のマスク層54下の領域以外
の領域を除去し、マスク層54下の領域による、有機高
分子材でむろ柱55を形成する。この場合、有機高分子
材層52下に保護層51が形成され、イの保1層51に
よって、パッド層5がエツチングされることから保護さ
れているので、パッド−5がエツチングされることはな
いものである。
Next, as shown in FIG. 6E, the organic polymer layer 52 is masked by etching, for example, reactive ion etching using oxygen gas, using the mask layer 54 for the organic polymer layer 52 as a mask. A region other than the region under the layer 54 is removed, and a continuous column 55 is formed from the organic polymer material in the region under the mask layer 54. In this case, a protective layer 51 is formed under the organic polymer material layer 52, and the pad layer 5 is protected from being etched by the protective layer 51 (a), so that the pad 5 is not etched. It's something that doesn't exist.

次に、第6図Fに示ず如く、柱55上のマスク層54と
保護層51とをそれ等に対する共通の丁ツfング液を用
いて又は各別のエラチングミt用いて除去し、かくて、
パッド層5上に、ぞれに比し小I=る横断面の有機高分
子材でなる警1を形成する。この場合保護層51の柱5
5下の領域が層56として残り、この電柱55がパッド
層5上に層56を介して形成されて4する構成を有する
Next, as shown in FIG. 6F, the mask layer 54 and the protective layer 51 on the pillars 55 are removed using a common etching solution for them or by using a separate etching solution for each. hand,
On the pad layer 5, a pad 1 made of an organic polymer material and having a cross section smaller than the pad layer 5 is formed. In this case, the pillar 5 of the protective layer 51
The area under the pad layer 5 remains as a layer 56, and the utility pole 55 is formed on the pad layer 5 via the layer 56.

次に、第6図Gに示す如< 、 t155のタト表面に
後述づる無電解鍍金処理時の触媒と/、、−ろ、例えば
P (lイオン等の貴金属イオンでなる活性層58を形
成する。
Next, as shown in FIG. 6G, an active layer 58 made of noble metal ions such as P(l ions) is formed on the surface of t155 using a catalyst for electroless plating to be described later. .

次に、第6図Hに示す如く、ト述せる如くに外表面に活
性層58の形成されてなる柱55及びパッド層5に対す
る例えば銅、白金等でなる導体材の無電解鍍金処理によ
り、柱55の外表面上及びパッド層5上に連続延長ける
導体層59を形成し、斯くて柱55の外表面上及び/<
ラド層5トに連続延長せる導体層59の形成されでなる
構成を、縦断面で・みて逆T字状のマイクロビン10と
して形成する。
Next, as shown in FIG. 6H, the pillars 55 having the active layer 58 formed on their outer surfaces and the pad layer 5 are electrolessly plated with a conductive material such as copper or platinum, as described above. A continuous conductor layer 59 is formed on the outer surface of the pillar 55 and on the pad layer 5, thus forming a conductive layer 59 on the outer surface of the pillar 55 and /<
A structure in which a conductor layer 59 is continuously extended to the RAD layer 5 is formed as an inverted T-shaped microbin 10 when viewed in longitudinal section.

次に、マイクロビン10を構成往る柱55の外表面上及
びパッド層5上−形成された導体層59が、例えば銅の
如き酸化し易い導体材でな     Iる場合、第6図
Iに示す如く、マイクロビン10に対する例えば白金の
如き酸化し難い導体材を用いた鍍金をなし、導体層59
の表面にII酸化付導体層60を形成りる。
Next, if the conductive layer 59 formed on the outer surface of the pillar 55 constituting the microbin 10 and on the pad layer 5 is not made of a conductive material that easily oxidizes, such as copper, then FIG. As shown, the microbin 10 is plated using a conductive material that is difficult to oxidize, such as platinum, and a conductive layer 59 is formed.
A conductor layer 60 with II oxidation is formed on the surface of the substrate.

斯くで、第6図H叉は第6図1に示す如き、第1図にて
上述せると同様の、基板本体1上に配線層6が形成され
、その配線層6が基板本体1Fに形成されてなるパッド
層5に連結されてなる構成の配線基板9を具備し、その
パッド層5Fに配線基板9の配線層6を外部に連結する
為のマイクロビン10が植立されてなる構成の、目的と
せるマイクロビン付配線基板(Jを得る。
Thus, as shown in FIG. 6H or FIG. 61, a wiring layer 6 is formed on the substrate body 1, similar to that described above in FIG. 1, and the wiring layer 6 is formed on the substrate body 1F. The wiring board 9 has a structure connected to a pad layer 5 formed by the wiring board 9, and a microbin 10 for connecting the wiring layer 6 of the wiring board 9 to the outside is planted on the pad layer 5F. , obtain a wiring board with a microbin (J).

以北にで、本発明によるマイクロビン付配線l板Uの製
法の第1の実施例が明らかとなったが、断る製法によれ
ば、それが、基板本体1上に配線層6が形成され、その
配線層6が基板本体1」二に形成けるパッド層5に連結
されてなる構成の配線基板9を予め用意する工程(第6
図A)と、その配線基板9のパッド層5上にそれ(ご化
し小なる横断面を右する右機高分子材でなろ奪155を
形成する工程(第6図B〜F)と、争)55の外表面ト
及びパッド層5上に連続延長せる導体層59を、鍍金処
理により形成し、その柱55の外表面上及びパッド層5
上に連続延長せる導体層5つの形成されてなる構成をマ
イクロビン10として形成する工程(第C”+ l’i
4 G及びH)とを含んで、目的とせるマイク11ビン
イ・J配線基板Uを得るという方法であり、そこに、第
4図及び第5図にて上述せる従来の製法の場合の如くに
、予め用意せる配線基板9の複数のパッド層5に、別途
予め用意せる複数のマイクロビン10を多くの手間と時
間とを要して植立する要がないので、目的とせるマイク
ロビン付配線基板(Jを、そのマイクロビン10がそれ
に対するパッド層5上の所定の位置に正確に位置決めし
て植立されてなる構成を有するものとして容易に得るこ
とが出来、又第4図及び第5図にて上述ける従来の製法
の場合の如くにマイクロビン10が導体板より出発して
1qられるものではなく、しかもマイクロビン10が、
全断面を通じC導体で構成されているものではなく、有
機高分子材でなる社55の外表面上及びパツド15Fに
導体層5つが形成されてなる構成をイ」づるので、マイ
クロビン10を構成するに要4る導体材が少くて済み、
依って目的とせるマイクロビン付配線基板1ノを廉価に
提供し得る等の人なる特徴を有するものである。 尚、
上述に於ては本発明によるマイク[1ビン付配線基板の
製法の一例を述べたに留まり、有機高分子材でなる15
5を形成する工程に於て、その有機高分子材でなる柱5
5を、保護層51を用いることなしに形成することも出
来るものである。
From this point forward, the first embodiment of the manufacturing method of the wiring board U with microbins according to the present invention has been revealed, but according to the manufacturing method that is refused, the wiring layer 6 is formed on the board body 1. , a step (sixth
Figure A), and the process of forming a round strip 155 on the pad layer 5 of the wiring board 9 (Figures 6 B to F) with a polymeric material that has a small cross section. ) A conductor layer 59 that extends continuously on the outer surface of the pillar 55 and the pad layer 5 is formed by plating treatment, and
A step of forming a microbin 10 with a structure in which five conductor layers are continuously extended on top (No. C"+l'i
4 G and H) to obtain the intended microphone 11/J wiring board U, and then as in the case of the conventional manufacturing method described above in FIGS. 4 and 5. Since there is no need to take a lot of time and effort to plant a plurality of separately prepared microbins 10 on a plurality of pad layers 5 of a wiring board 9 which can be prepared in advance, the desired wiring with microbins can be achieved. The substrate (J) can be easily obtained as having a structure in which the microbin 10 is accurately positioned and planted at a predetermined position on the pad layer 5 with respect to the substrate (J), and FIGS. Unlike the conventional manufacturing method described above in the figure, the microbin 10 is not 1q starting from the conductor plate, and moreover, the microbin 10 is
The microbin 10 is not composed of a C conductor throughout the entire cross section, but has a configuration in which five conductor layers are formed on the outer surface of the conductor 55 made of an organic polymer material and on the pad 15F. Therefore, less conductor material is required,
Therefore, the present invention has unique characteristics such as being able to provide a desired wiring board with a microbin at a low cost. still,
The above description has only described an example of the method for manufacturing a wiring board with a microphone [1 bottle] according to the present invention.
In the process of forming column 5, the column 5 made of the organic polymer material
5 can also be formed without using the protective layer 51.

又、有機高分子材でなる柱55の外表面上及びパッド層
5上に連続延長せる導体層59を、鍍金処理により形成
し、その柱55の外表面上及びパッド層5に連続延長せ
る導体層59の形成されて仕る構成をマイクロビン10
として形成づろ工程に於て、その鍍金処理を、無電解鍍
金処理とするに代え、電解鍍金処理と覆ることも出来る
ものである。尚、この場合の電解鍍金処理は、パッド層
5の一端を電源に接続してなせば良いものである。
Furthermore, a conductor layer 59 made of an organic polymer material that is continuously extended on the outer surface of the pillar 55 and on the pad layer 5 is formed by plating treatment, and the conductor layer 59 is continuously extended on the outer surface of the pillar 55 and on the pad layer 5. The structure in which the layer 59 is formed is the microbin 10.
In the forming process, the plating process can be replaced with electrolytic plating process instead of electroless plating process. Incidentally, the electrolytic plating treatment in this case may be performed by connecting one end of the pad layer 5 to a power source.

その地番発明の精神をURL、 l=い範囲で種々の変
型変更をなし得るであろう。
Various modifications and changes can be made within the scope of the URL and the spirit of the lot number invention.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、従来のマイクロビン付配線基板を示す路線的
断面図、第2図は2つのマイクロビン付配線基板の配線
層を亙に連結するに用いるコネクタ板を示す路線的断面
図、第3図は第2図に示す]ネクタ板を用いて2つの−
、マイクロビン付配線基板の配IIA層を連結ぜる状態
を示づ路線的断面図、第4図及び第5図A〜Gは従来の
マイクロビンf」配線基板の製法を示す順次の工程に於
ける路線的断面図である。 第6図A〜1は本発明によるマイクロビン付配線基板の
製法の実施例を示す順次の−L稈に於ける路線的断面図
である。 1・・・・・・・・・・・・・・・基板本体5・・・・
・・・・・・・・・・・パッド層6・・・・・・・・・
・・・・・・配線層9・・・・・・・・・・・・・・・
配線基板10・・・・・・・・・・・・・・・マイクロ
ピン51・・・・・・・・・・・・・・・保護層52・
・・・・・・・・・・・・・・右機高分子材層5.4・
・・・・・・・・・・・・・・マスク層553・・・・
・・・・・・・・・・・有機高分子材でなる柱59・・
・・・・・・・・・・・・・、導体層60・・・・・・
・・・・・・・・・耐酸化性導体層出願人  日本電信
電話公社 l ψ                   (Oq) く; 二          〇 ロ          − く    : (口 ロζ −〇 == qフ     − 一一一
FIG. 1 is a cross-sectional view showing a conventional wiring board with micro-bins; FIG. 2 is a cross-sectional view showing a connector plate used to connect the wiring layers of two wiring boards with micro-bins; Figure 3 is shown in Figure 2] Use the connector board to connect the two -
, a line sectional view showing the state in which the IIA layers of the wiring board with a microbin are connected, and FIGS. It is a sectional view of the route. 6A to 6A to 6A are sequential cross-sectional views of the -L culm showing an embodiment of the method for manufacturing a wiring board with a microbin according to the present invention. 1......Body body 5...
・・・・・・・・・・・・Pad layer 6・・・・・・・・・
・・・・・・Wiring layer 9・・・・・・・・・・・・・・・
Wiring board 10...Micro pin 51...Protective layer 52.
・・・・・・・・・・・・・・・Right machine polymer material layer 5.4・
・・・・・・・・・・・・Mask layer 553...
・・・・・・・・・Column 59 made of organic polymer material...
......, conductor layer 60...
...... Oxidation-resistant conductor layer Applicant: Nippon Telegraph and Telephone Public Corporation l ψ (Oq);

Claims (1)

【特許請求の範囲】 厚板本体上に配線層が形成され、該配線層が[記基恢本
体、トに形成せるパッド層に連結されCなる構成の配線
基板を用意する工程と、F記配線基板のパッド層上(こ
それに比し小なる横断面を有する有機高分子材でなる社
を形成する工程と、 )配Uの外表面上及び上記パッド層上に連続延長Uろ導
体層を、鍍金処理により形成し、上記手↑の外表面上及
び上記パッド層上に連続延長ぜる導体層の形成されてな
る構成をマイクロビンとして得る工程とを含むことを特
徴とするマイクロビン付配線基板の製法。
[Claims] A step of preparing a wiring board having a structure C in which a wiring layer is formed on a thick plate main body, and the wiring layer is connected to a pad layer formed on the main body; A step of forming a conductor layer made of an organic polymer material having a smaller cross section than the pad layer of the wiring board; , a step of forming a conductor layer formed by plating and continuously extending on the outer surface of the hand ↑ and on the pad layer to obtain a microbin structure. Substrate manufacturing method.
JP7696382A 1982-05-08 1982-05-08 Method of producing circuit board with micropins Pending JPS58194396A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7696382A JPS58194396A (en) 1982-05-08 1982-05-08 Method of producing circuit board with micropins

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7696382A JPS58194396A (en) 1982-05-08 1982-05-08 Method of producing circuit board with micropins

Publications (1)

Publication Number Publication Date
JPS58194396A true JPS58194396A (en) 1983-11-12

Family

ID=13620436

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7696382A Pending JPS58194396A (en) 1982-05-08 1982-05-08 Method of producing circuit board with micropins

Country Status (1)

Country Link
JP (1) JPS58194396A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000036886A1 (en) * 1998-12-16 2000-06-22 Ibiden Co., Ltd. Conductive connecting pin and package board

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000036886A1 (en) * 1998-12-16 2000-06-22 Ibiden Co., Ltd. Conductive connecting pin and package board
US7847393B2 (en) 1998-12-16 2010-12-07 Ibiden Co., Ltd. Conductive connecting pins for a package substrate
US7902659B2 (en) 1998-12-16 2011-03-08 Ibiden Co., Ltd. Conductive connecting pin and package substrate
US8035214B1 (en) 1998-12-16 2011-10-11 Ibiden Co., Ltd. Conductive connecting pin for package substance
US8110917B2 (en) 1998-12-16 2012-02-07 Ibiden Co., Ltd. Package substrate with a conductive connecting pin
US8536696B2 (en) 1998-12-16 2013-09-17 Ibiden Co., Ltd. Conductive pin attached to package substrate

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