JPS58162901A - Plastic optical element - Google Patents

Plastic optical element

Info

Publication number
JPS58162901A
JPS58162901A JP57044687A JP4468782A JPS58162901A JP S58162901 A JPS58162901 A JP S58162901A JP 57044687 A JP57044687 A JP 57044687A JP 4468782 A JP4468782 A JP 4468782A JP S58162901 A JPS58162901 A JP S58162901A
Authority
JP
Japan
Prior art keywords
optical element
lens
thin film
water absorption
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57044687A
Other languages
Japanese (ja)
Inventor
Sota Kawakami
壮太 川上
Hidenori Murata
秀紀 村田
Satoshi Matsunaga
聡 松永
Hisanori Tsuchino
久憲 土野
Toshihiko Kiriki
俊彦 桐木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP57044687A priority Critical patent/JPS58162901A/en
Publication of JPS58162901A publication Critical patent/JPS58162901A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films

Abstract

PURPOSE:To constitute a titled element so that its surface accuracy and refracted index are not varied even if the environmental condition is varied, by providing a hydrophobic thin film on the surfaces of an optical element by a plasma polymerizing method. CONSTITUTION:On the surface of a base board of an optical element consisting of a resin composite whose coefficient of water absorption by ASTMD-570 is >=0.15%, for instance, a lens, a prism, a reflector, an optical fiber, etc., a hydrophobic thin film is formed by a plasma polymerizing method. For instance, a lens (thickness of the center part is 3mm.) obtained by inject-molding polymethyl methacrylate resin is dried at 50 deg.C for three days, and thereafter, a plasma polymerized film of octafluorocyclobutane is formed under the conditions of 70 deg.C base board temperature, 13.56MHz discharge frequency, 10W high frequency power, 0.1Torr pressure, and such an element is made to absorb water under the conditions of ASTMD-570, 23 deg.C, 100% RH and 24hr, and as a result, its coefficient of water absorption is 0.08% and remarkably below 0.28% of an untreated lens.

Description

【発明の詳細な説明】 本発#4#i光学用樹脂!II!物を成型して成る光学
用素子の基盤の表面に、特電重合法による疎水軽薄at
形成して成る、改良されたプラスチック光学用素子に関
する。
[Detailed description of the invention] #4#i optical resin of the present invention! II! The surface of the substrate of an optical element made by molding an object is coated with a hydrophobic light and thin layer using special electropolymerization method.
The present invention relates to an improved plastic optical element formed by forming an optical element.

本艷明のプラスチック光学用素子とは、儒えばスチール
カメラ用、ビデオカメラ用、望遠鏡用、II−用、ハー
ドコンタクトレンズ用、太陽光1に光用等のいわゆるレ
ンズ類、ベンメプリズム等のフ゛リズ^−1凹血鏡、ポ
リゴン等の鏡餉、オプティカルファイバー、光導波路等
光導性素子類、光学7+jtビデオデイスク、オーディ
オディスク等のディスク−等、光を透過することによっ
て機能を発揮する電子tりう。
Our plastic optical elements include so-called lenses for still cameras, video cameras, telescopes, II-lens lenses, hard contact lenses, solar light and other lenses, as well as lenses such as Benme prisms. -1 Concave blood mirrors, mirror plates such as polygons, optical fibers, light guide elements such as optical waveguides, disks such as optical 7+JT video disks, audio disks, etc., which perform their functions by transmitting light.

かかるプラスチック光学用素子はスチレン−Tクリロニ
トリル共東合体やポリメチルメタクリレート相島、ポリ
カーボネート樹脂等O汎用榴脂を光学用樹脂としてaa
i+作製されておシ、騒lで、大量生産が容品であるこ
とから、近年その需III!が増大してhる。
Such plastic optical elements are made of styrene-T-crylonitrile co-topolymer, polymethyl methacrylate Aijima, polycarbonate resin, etc.O general-purpose resin is used as optical resin.
In recent years, there has been a huge demand for i+, as it has been manufactured and is noisy, and mass production is required. is increasing.

しかし、従来の汎用樹脂によるプラスチック光学用素子
ではその樹脂特性として、吸水性が大きいことにより環
境条件変化によって、光学用素子の特性変化等が現われ
て、光学系として不安定となることがToシ、問題であ
りた。
However, due to the resin properties of conventional plastic optical elements made of general-purpose resins, the characteristics of the optical elements change due to changes in environmental conditions due to the resin's high water absorption, making the optical system unstable. , was a problem.

?IJ iばポリメチルメタクリL7Sネを成型した光
学用素子は、艮好な光学的U特性をもったものであるが
吸水性が大きく、積境条t!#−変化によみ面精1のく
るいや屈折率変化が大きいという欠点があつ友。
? Optical elements molded from polymethyl methacrylate L7S have excellent optical U characteristics, but they have high water absorption and are highly water-absorbing. # - A friend that has the disadvantage of a large change in surface quality 1 and a large change in refractive index.

不発−者等は鋭意研究のJi!F来、光学用素子の基盤
の表面にフ゛ラズマ重合法によって疎水性の薄膜を形成
することで吸水性を改善し、′光学用素子の光学的特性
の安定化が図れることを見い出した。
Ji! Since then, we have discovered that by forming a hydrophobic thin film on the surface of the substrate of an optical element by plasma polymerization, water absorption can be improved and the optical properties of the optical element can be stabilized.

本発明の目的は、特定の重合法によって疎水性薄iIを
設けることで、環境条件変化によって41糟1のくるい
や屈折率変化が無い光学用素子を提供することである。
An object of the present invention is to provide an optical element that does not exhibit distortion or change in refractive index due to changes in environmental conditions by providing a hydrophobic thin film using a specific polymerization method.

かかる本発明の目的は、ム8TMD−570による吸水
率が0.15鳴以上のl1firffi成物tFfL脂
して城る光学用素子の基110表面に、プラズマ1合法
によって形歇された疎氷性O薄穣【有すること管特徴と
するプラスデック光学る素子によって達成される。
It is an object of the present invention to coat the surface of the base 110 of an optical element with a l1firffi product tFfL having a water absorption rate of 0.15 or more by Mu8TMD-570, formed by the plasma 1 method, with an icephobic property. This is achieved by a PLUSDEC optical element which is characterized by a thin tube.

本発明の好ましい実緬態様に従えば、プラズマ重合法に
よる疎水性の薄膜の膜厚が5nm〜2000鳳mである
こと、皺薄論の水蒸気透過率が111g020g、40
℃、Ru2O憾、厚さ305mの条件で200 g/j
/24 h r以下であること、そして前記薄@が、多
屑薄喚の少なくとも一層として設けられ、各層の屈折率
を14ならゼることである。
According to a preferred embodiment of the present invention, the thickness of the hydrophobic thin film formed by plasma polymerization is 5 nm to 2000 m, and the water vapor permeability of wrinkle thinning is 111 g, 020 g, 40 g.
℃, Ru2O, 200 g/j under the conditions of 305 m thickness
/24 hr or less, and the thin @ is provided as at least one layer of a multi-layer thin film, and the refractive index of each layer is 14.

史に他の好ましい実線態様に従えは1本発明のプラズマ
11酋による疎水性の薄at形成した後の表面硬度がJ
lBK−5651で鉛線硬度2H〜10H1好ましくt
14H〜8Hであることである。
According to another preferred embodiment of the solid line, the surface hardness after forming a hydrophobic thin layer by the plasma 11 of the present invention is J.
lBK-5651 with lead wire hardness of 2H to 10H1 preferably t
It is 14H to 8H.

環境変化により光学用素子の面精度のくるいや屈折率変
化等の製性質化が有る場合は、光学系全体の特性が不安
定となり、信頼柱管低下する。そのため、本発明の疎水
性薄膜を形成することで、耐吸水性1r向上させ、光学
的な特性安定化を改良することは、極めて重畳な結果を
得るものである。
If there is a change in the surface precision of an optical element or a change in the refractive index due to environmental changes, the characteristics of the entire optical system become unstable and the reliability of the optical element decreases. Therefore, by forming the hydrophobic thin film of the present invention, improving the water absorption resistance 1r and improving the optical property stabilization will yield extremely overlapping results.

プラズマ重合法による疎水性の*m’i形成する方法は
、例えd%高真仝中の反応槽に光学用素子基盤を置き、
これに薄S形成素材、例λはクロルンランガス、フロン
ガス、水素ガス等の気体や、スナレン、塩化ビニリデン
、エテレデン、弗化ど二すデン、アクリロニトリル等の
単量体等管導入し、反応槽中で高圧放電さゼ、高温電離
ガス状態を形成させ、混合カスまたは単量体相互を反応
させる。その結果得られる反応生成物が前記光学用素子
基−表Ikに沈着固着して層形成し、本@明の疎水性薄
膜となるものである。
The method of forming hydrophobic *m'i by plasma polymerization is, for example, placing an optical element substrate in a reaction tank in d% high polymer.
A thin S-forming material, for example λ, is a gas such as chlorofuran gas, chlorofluorocarbon gas, hydrogen gas, etc., and monomers such as sunalene, vinylidene chloride, eteledene, dodisdene fluoride, acrylonitrile, etc. are introduced into the reaction tank. A high-pressure discharge is carried out in the process to form a high-temperature ionized gas state, causing the mixed sludge or monomers to react with each other. The resulting reaction product is deposited and fixed on the optical element group Table Ik to form a layer, forming the hydrophobic thin film of this @ Ming.

このよう和して優られた薄@に、薄m形成素材’t*K
して、幾重にも薄II【1畳することで多層化もでき、
光学用素子基盤社その表面に多層膜−の形成された光学
的に改善された特性を有する光学用素子とできる。この
多層膜ll0llIFiiL材料及び膜厚によって透過
光に対して選択性を示す特性を有し、透過光の色バラン
ス、反射光の発生を4改善する仁とができる。
Thin m forming material 't*K
Then, it can be made into multiple layers by making it thin II [1 tatami mat].
By forming a multilayer film on the surface of the optical element, an optical element having optically improved characteristics can be obtained. Depending on the material and thickness of this multilayer film, it has the property of exhibiting selectivity to transmitted light, and can improve the color balance of transmitted light and the generation of reflected light.

本発明(係る光学用素子によれに、環境条件変化によっ
て変動する湿度等に対して、本発明のプラズマ重合によ
る疎水性薄膜が極めて好適な防御手段となシ光字用素子
の基II材料#/C対して耐吸水性の向上を充分に給与
させることができる。前記多層膜の少なくとも一層が本
I&qoプラズマ菖合による疎水性薄膜であると、本発
&jLlのft字字素素子その光学的特性が明確#C改
良される。かかる本発W!#による疎水性11m10所
在はいずれでもよく、最外層【S城してiる必豐はな鱒
The present invention (Basic II material for optical elements in which the plasma-polymerized hydrophobic thin film of the present invention is an extremely suitable means of protection against humidity, etc. that fluctuates due to changes in environmental conditions) /C can sufficiently improve the water absorption resistance.If at least one layer of the multilayer film is a hydrophobic thin film formed by the present I&Qo plasma combination, the optical property of the present &jLl ft-shaped element can be The characteristics are clearly improved.The hydrophobicity of this newly developed W!# can be in any location, and the outermost layer is essential for trout.

ここに吸水率とはASTMD−570規格で表示するも
のである。本発明のプラスチック光学用素子に用いる素
子基IjIFi前記吸水率が0.15憾以上の比較的吸
水率の高い樹脂組酸物(例えばポリメチルメタクリレー
ト樹脂、ボ1」カーボネー)樹脂、スナレンーアクリロ
ニトリル共重合体など。)?成型して成るものであるが
、本発明のプラズマ重合による疎水性薄膜の形fiFi
充分その1IIA能と効果全発揮するものである。
Here, the water absorption rate is expressed in accordance with the ASTM D-570 standard. Element base used in the plastic optical element of the present invention: IjIFi; a resin composite acid having a relatively high water absorption rate of 0.15 or more (e.g., polymethyl methacrylate resin, BO1'' carbonate) resin, sunalene-acrylonitrile resin, etc. polymers etc. )? Although it is formed by molding, it is a hydrophobic thin film formed by plasma polymerization according to the present invention.
It fully demonstrates its 1IIA capabilities and effects.

本発明のプラズマ重合による疎水性薄膜の**け5nm
〜2000nm、さらに好ましくは1100n〜500
fimであることが望ましい。5nm未満で4、あfシ
疎水性即ち、水蒸気不透過能が埃われ難い、一方、20
00nmi越える場合でに、耐吸水性や水蒸気不透過能
が良くとも材′/#Fによっては、徽看色して光透過性
等が低下し適切でない。疎水性のf仕としては水蒸気透
過率が用いられるがJI8Z(1208によシ規定され
た一方法で40℃、90囁Rf(、厚さ30 pmの条
件で200g/m’/24時間以下、特に20に7ml
/24時間以上であることが望ましい。
Hydrophobic thin film produced by plasma polymerization of the present invention with a thickness of 5 nm
~2000nm, more preferably 1100n~500nm
It is desirable to be fim. Below 5 nm, 4 is hydrophobic, that is, water vapor impermeability is difficult to get dusty, while 20
If it exceeds 00 nm, even if the water absorption resistance and water vapor impermeability are good, depending on the material '/#F, the color may appear and the light transmittance etc. will decrease, making it unsuitable. Water vapor permeability is used as the hydrophobic property, but one method specified by JI8Z (1208) is 40°C, 90 whisper Rf (200 g/m'/24 hours or less at a thickness of 30 pm, Especially 7ml for 20
/24 hours or more is desirable.

レンズの自amは元学調定法によって基準曲率面との関
°でのニュートンりンダ0変化数を針側することで求め
られる。また−yts#J素子表面に形成された薄膜の
表rkJWl駄は実用に除し、耐用性を有するためには
JISK585.1で規定されている鉛線tjI駁2H
〜108.好ましくは4H〜8Hであると、充分機能を
発揮する。
The self-am of the lens can be found by subtracting the number of changes in Newtonian cylinder 0 in relation to the standard curvature surface using the Gengakucho method. In addition, the surface of the thin film formed on the surface of the -yts#J element is excluded from practical use, and in order to have durability, the lead wire specified in JISK585.1 must be
~108. Preferably, 4H to 8H exhibits sufficient functionality.

また侮られた薄膜の表面固有抵抗率t−IJIBK69
11で規定されてpる方法で、lXl0  Ω以下、好
ましくはlXl0  Ω以下であれば、レンズ表fiO
帝電性會防止し得、ホコリ等の付mt防止するC)K有
効である。
Also, the surface resistivity of the thin film, t-IJIBK69, which was underestimated.
If it is less than lXl0 Ω, preferably less than lXl0 Ω, the lens surface fiO
C)K is effective in preventing electrical problems and the accumulation of dust, etc.

本発明の光学用素子に用iられる基盤は耐光性同上のた
めに、紫外線吸収鋼を含有していてもよい。紫外線吸収
鋼としては、cil視域の過通率まで減少させる4ので
なく、他の樹脂特性を劣化させるものでなければ良いが
、例えdo−ヒドロ中ン?lJ?A=酸フェニル系化合
物、0−ヒドロキシベンゾ2エノン系化合物、2−(o
−ヒドロ命ジフェニル)−ベンゾトリアゾール糸化曾物
、シアノアクリレート糸化合物等を用いることができる
The substrate used in the optical element of the present invention may contain ultraviolet absorbing steel for light resistance. As for the ultraviolet absorbing steel, it is fine as long as it does not reduce the transmission rate to the cil viewing range, and it does not degrade other resin properties, but even if it does not degrade the properties of other resins, for example, do-hydro medium? LJ? A=acid phenyl compound, 0-hydroxybenzo2enone compound, 2-(o
-hydro-diphenyl)-benzotriazole thread compounds, cyanoacrylate thread compounds, etc. can be used.

また、熱安定嗣として2.6−ジー第三ブチル−p−ク
レゾール、2,4−ジ−メチル−6−第三ブチルフェノ
ール、2.2’−メチレンビス(4−メチル−6−#!
三プナルフェノール)、4.4′−1テリデンビス(3
−メチル−6−第三ブチルフェノール)、4.4′−ナ
オビス(3−メチル−6−第三ブチルフェノール)、1
.1.3−トリス(2−メチル−4−ヒドロ午シー5−
m三ブチル2エニル)ブタン、 以下余白 H CH3t−邸U (R: C1g7−C,鵬のアル中ル基)  、ジ“ラ
ウリルテオジグロビオネート、ジステアリルナオジフロ
ピオネート、ジステγリルβ、β′−テオシブナレート
、  ()−o−P(−0−Cl0H21)2、(○ト
O÷2P−0−CIOH21%pro Cl0H21)
5等を含有していてもよい。
In addition, as heat stabilizers, 2,6-di-tert-butyl-p-cresol, 2,4-di-methyl-6-tert-butylphenol, 2,2'-methylenebis(4-methyl-6-#!
3pnarphenol), 4.4'-1teridenebis(3
-methyl-6-tert-butylphenol), 4,4'-naobis(3-methyl-6-tert-butylphenol), 1
.. 1.3-Tris(2-methyl-4-hydro-5-
m-tributyl-2-enyl)butane, below blank H CH3t-teiU (R: C1g7-C, Peng's alkyl group), di-lauryl theodiglobionate, distearyl naodifuropionate, distearyl β, β '-Teosibunarate, ()-o-P(-0-Cl0H21)2, (○toO÷2P-0-CIOH21%pro Cl0H21)
5 etc. may be contained.

その成形時の流動性會より向上させるための可塑剤を含
有していても良い。arm剤としては、2−エナルヘキ
ンルフタレート、n−7テルフタレート、インデカニル
フタレート、トリデカニル2タレート、ヘプチルフタレ
ート、ノニルフタレート等のアルキルフタレー)類、2
−エチルへキンルアジベート、セバシン酸、2−エチル
ヘキシル等の二塩基瞭のアル午ルエステル類、リン酸ト
リブチル、りン酸トリオクチル、リン酸) +3クレジ
ル、リン酸トリ2エニル、リン酸) +4キシレニル等
のりン酸アルキルエステル類、エポキシ化オレイン酸オ
クチル、エボキン化オレイン酸ブチル等のエポキシ化脂
肪酸エステル、その他、ポリエステル糸町塑嗣、塩素化
脂肪酸エステル類等、およそ川−塑剤としての働きを有
するものであれば、どんなものでも用いることができる
。又、これらは二種以上併用しても艮い。またm形鋼と
して、シリコンオイル、ジメチルポリシロキサン、ポリ
シロキサン、脂肪族20ロカー・ボ1%塊動又は固形の
バックイン、ブナルアジッドホスフェート、ブトキシエ
チルTジッドホス2エート、2−エチルへ中シルアフッ
ドホスフェート、声−pロロエデルアンツドホスフエー
ト、ジ(2−エチルへ中シル)ホス2エート、エチレン
グリコ−ルア7ツドホスフエート、(2−とドローキ7
エテ゛ル)メメクリレート・Tジッドホスフェート勢【
含有していてもよい。
It may contain a plasticizer to improve the fluidity during molding. Examples of arm agents include alkyl phthalates such as 2-enalhexyl phthalate, n-7 terphthalate, indecanyl phthalate, tridecanyl 2-talate, heptyl phthalate, and nonyl phthalate;
- Dibasic alkyl esters such as ethylhexyl adibate, sebacic acid, 2-ethylhexyl, tributyl phosphate, trioctyl phosphate, phosphoric acid) +3 cresyl, tri2enyl phosphate, phosphoric acid) +4 xylenyl glue, etc. Epoxidized fatty acid esters such as alkyl esters, epoxidized octyl oleate, and butyl oleate, other polyesters, chlorinated fatty acid esters, and other substances that function as plasticizers. If so, you can use anything. Also, two or more of these may be used in combination. In addition, as m-shaped steel, silicone oil, dimethylpolysiloxane, polysiloxane, aliphatic 20-carbohydrate, 1% lump or solid back-in, bunalazide phosphate, butoxyethyl Tzidphos2ate, 2-ethyl to medium silane fluoride phosphate, di(2-ethyl)phosphate, ethylene glycol phosphate, (2- and droxy7)
Ether) memethacrylate/T-dide phosphate group [
May contain.

本発明のプラスチック光学用素子oimの5[法はいず
れであってもよい。例えば射出既製法のはか、圧5WL
W法あるいは射出成層と圧置城型の折衷法例えばローり
ンクス法、1イクロモールデイング法等、およそ−担l
1llilをS厳あるいは半溶融させてaaVさせる方
法はすべて適用できる。
The plastic optical element oim of the present invention may be of any type. For example, injection ready-made method, pressure 5WL
The W method or a compromise method of injection layering and compression molding, such as the Rawlinx method, 1 micromolding method, etc.
Any method of making 1 lil S-solid or semi-molten to aaV can be applied.

以下、実−例によ〉本発明を具体的Ki1!明するが、
本発明はこ’t>に限足されない。なお、以下の賽#1
桝において「部」とに「重量部」【承す。
Hereinafter, based on actual examples, the present invention will be explained in detail. To clarify,
The present invention is not limited to this. In addition, the following dice #1
In a box, "parts" and "parts by weight" are used.

実極例1 ポリメナルメ!クリレート樹脂を射出改溜することによ
って得られ九銅脂a瀧レンズ(中心部の厚さ3箇)t″
50 Cで3日間乾燥した後、これに下記の条件でオク
タフルオロンクロプ!ンのプラズマ血合薄IIt−形成
した。
Practical example 1 Polimenarume! Kudozo A-taki lens obtained by injection and distillation of acrylate resin (thickness of 3 parts in the center) t''
After drying at 50 C for 3 days, octafluoron crop was applied to this under the following conditions. A plasma blood mixture IIt was formed.

〔プラズマ重合条件〕[Plasma polymerization conditions]

基Mltlf70℃、放電崗波数13.56圃ム高−波
電力10W、圧力C1,I Torr、。
Base Mltlf 70°C, discharge wave number 13.56, high-wave power 10W, pressure C1, I Torr.

こうして形成されたプラズマ菖合薄110mIIU10
0 n mであ)、屈折率Fi1.42、表110硬1
jは4H,表面固有抵抗は2 X 10”Ωであった。
The plasma iris thin 110 mIIU10 formed in this way
0 nm), refractive index Fi1.42, Table 110 Hardness 1
j was 4H, and the surface resistivity was 2 x 10''Ω.

こうして両面とも薄喚がコーティングされた本発明ノ樹
脂tftll レン4YtAsTM D−570、23
℃。
In this way, both sides of the resin of the present invention were coated with a thin film.
℃.

1()0鳴R)1.24時間の条件で吸水させたところ
、吸水率が0.084と、未処理1IIi1成薯レンズ
の0.28%を大幅に下まわった。
When the lens was allowed to absorb water for 1.24 hours, the water absorption rate was 0.084, which was significantly lower than 0.28% of the untreated 1IIi1 lens.

父、本発明の樹1に底蓋レンズを75℃、100%RH
v)条件で6時間放置し友が、伺ら面精![変化tXみ
られずニュートンリングが零本であったが、未処m*脂
成型レンズでは、ニュートンリング本数が3〜2本変化
するtSを生じ、着しい―精良変化が−められた。
Father, put the bottom cover lens on Tree 1 of the present invention at 75℃ and 100%RH.
v) My friend asked me to leave it for 6 hours under the conditions! [No change in tX was observed and there were zero Newton rings, but in the untreated m* resin molded lens, tS occurred in which the number of Newton rings changed by 3 to 2, and a significant change in quality was observed.

実極@2 実極例1と同様にして得九乾燥済みの佃脂収濶レンズに
、下記条件で第1表12)A−Fの単量体のプラズマ重
酋薄襖【設は九〇 〔プラズマ1台条件〕 基11a11j60C,放t14m数13.56MHz
、a同波電力10W1圧力0.05 ’I”orr。
Practical pole @2 A dried Tsukuda-containing lens obtained in the same manner as in Practical pole example 1 was coated with plasma-enriched thin fusuma of the monomers of Table 1 12) A-F under the following conditions. [Conditions for one plasma] Base 11a11j 60C, radiation 14m number 13.56MHz
,a Same wave power 10W1 pressure 0.05'I”orr.

吸水率比較結果t−第1表に示す。The water absorption rate comparison results are shown in Table 1.

以下余白 第1表から明らかなように、不発#Uによれば吸水性を
改良し、環境変化による面精1変化を防止できることが
わかる。
As is clear from Table 1 below, it can be seen that dud #U can improve water absorption and prevent changes in face quality due to environmental changes.

特許出願人  小西六写真工業株式会社代理人弁理士 
 坂 口 信 昭 (11か1名)
Patent applicant: Konishiroku Photo Industry Co., Ltd., agent patent attorney
Nobuaki Sakaguchi (11 or 1 person)

Claims (1)

【特許請求の範囲】[Claims] ム87MD−570&Cよる吸水率が0.15鳴以上O
惨kMi成物をW、撤して成る光学用素子の基盤の表h
K、プラズマ1合法によって形成された疎水性の薄II
t有すLこkVr特徴とするプラスチック光学用素子。
Water absorption rate by Mu87MD-570&C is 0.15 or more O
Table h of the base of an optical element made by removing the Mi product.
K, hydrophobic thin II formed by plasma 1 method
A plastic optical element having a characteristic of LkVr.
JP57044687A 1982-03-23 1982-03-23 Plastic optical element Pending JPS58162901A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57044687A JPS58162901A (en) 1982-03-23 1982-03-23 Plastic optical element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57044687A JPS58162901A (en) 1982-03-23 1982-03-23 Plastic optical element

Publications (1)

Publication Number Publication Date
JPS58162901A true JPS58162901A (en) 1983-09-27

Family

ID=12698333

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57044687A Pending JPS58162901A (en) 1982-03-23 1982-03-23 Plastic optical element

Country Status (1)

Country Link
JP (1) JPS58162901A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61286801A (en) * 1985-06-13 1986-12-17 Tokai Rika Co Ltd Anti-clouding mirror
WO1995023062A3 (en) * 1994-02-28 1995-10-12 Sola International Inc Barrier package
US5827583A (en) * 1994-02-28 1998-10-27 Sola International, Inc. Barrier package
US6180031B1 (en) * 1994-01-31 2001-01-30 Bausch & Lomb Incorporated Treatment of contact lenses with supercritical fluid
JP2005173326A (en) * 2003-12-12 2005-06-30 Fuji Photo Film Co Ltd Plastic optical component

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5250739A (en) * 1975-10-20 1977-04-23 Nasa Antireflection coating for plastic lens
JPS5673321A (en) * 1979-10-25 1981-06-18 Hughes Aircraft Co Optical element* environment thereof is protected* and its manufacture
JPS56116002A (en) * 1980-02-19 1981-09-11 Showa Denko Kk Plastic lens

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5250739A (en) * 1975-10-20 1977-04-23 Nasa Antireflection coating for plastic lens
JPS5673321A (en) * 1979-10-25 1981-06-18 Hughes Aircraft Co Optical element* environment thereof is protected* and its manufacture
JPS56116002A (en) * 1980-02-19 1981-09-11 Showa Denko Kk Plastic lens

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61286801A (en) * 1985-06-13 1986-12-17 Tokai Rika Co Ltd Anti-clouding mirror
US6180031B1 (en) * 1994-01-31 2001-01-30 Bausch & Lomb Incorporated Treatment of contact lenses with supercritical fluid
US6610221B2 (en) 1994-01-31 2003-08-26 Bausch & Lomb Incorporated Treatment of contact lenses with supercritical fluid
WO1995023062A3 (en) * 1994-02-28 1995-10-12 Sola International Inc Barrier package
US5827583A (en) * 1994-02-28 1998-10-27 Sola International, Inc. Barrier package
EP1074383A1 (en) * 1994-02-28 2001-02-07 Sola International Inc. Barrier package
JP2005173326A (en) * 2003-12-12 2005-06-30 Fuji Photo Film Co Ltd Plastic optical component

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