JPS58147188A - Semiconductor laser device - Google Patents
Semiconductor laser deviceInfo
- Publication number
- JPS58147188A JPS58147188A JP57031156A JP3115682A JPS58147188A JP S58147188 A JPS58147188 A JP S58147188A JP 57031156 A JP57031156 A JP 57031156A JP 3115682 A JP3115682 A JP 3115682A JP S58147188 A JPS58147188 A JP S58147188A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor laser
- film
- insulating film
- laser device
- heat sink
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/023—Mount members, e.g. sub-mount members
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/0233—Mounting configuration of laser chips
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/0235—Method for mounting laser chips
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/0235—Method for mounting laser chips
- H01S5/02355—Fixing laser chips on mounts
- H01S5/0237—Fixing laser chips on mounts by soldering
Abstract
Description
【発明の詳細な説明】
れ)発明の技術分野
本発明は活性領域をストライプ構造とした半導体レーザ
素子のヒートシンクに固着する側の電極構造の改良に関
するものである。DETAILED DESCRIPTION OF THE INVENTION Technical Field of the Invention The present invention relates to an improvement in the electrode structure of the side fixed to a heat sink of a semiconductor laser element whose active region has a striped structure.
(′b)従来技術と問題点
従来ストライプ構造の半導体レーザとしては、第1図に
示すように例えばp導電型の鉛、硫黄、セレン(PbS
Se)からなる化合物半導体基板1上のn導電型領域2
形成予定面以外の表面に蒸着法等によって選択的に例え
ばSing等の絶縁膜8を形成し、該絶縁膜8をマスク
にして前記基板l上に拡散法によシストライプ状のn導
電型領域2を形成した後、前記基板1のnst型領域2
面を含む絶縁膜8上及びその裏面に金(Au)電極4.
5成シてレーザ素子、即ちプレーナストフィプ型半導体
レーザ素子が製作される。さらにこのように構成された
半導体レーザ素子は、動作時にその接合部で発生する熱
を放散して良好にレーザ光τ連続発振させるために図示
の如く高熱伝導度を有する銅製のヒートシンク基台6上
に、前記n導電型領域2と接続され九金電極令を介して
インジウム(In)7によって固着した構成がとられて
いる。('b) Prior art and problems Conventional semiconductor lasers with a stripe structure include, for example, p-conductivity type lead, sulfur, and selenium (PbS), as shown in Figure 1.
N conductivity type region 2 on compound semiconductor substrate 1 made of Se)
An insulating film 8 such as Sing is selectively formed on a surface other than the surface to be formed by a vapor deposition method, and using the insulating film 8 as a mask, stripe-shaped n-conductivity type regions are formed on the substrate l by a diffusion method. 2, the nst type region 2 of the substrate 1 is formed.
Gold (Au) electrodes 4.
5. A laser device, that is, a planar fiber type semiconductor laser device is fabricated. Furthermore, the semiconductor laser device configured in this manner is mounted on a heat sink base 6 made of copper having high thermal conductivity as shown in the figure, in order to dissipate the heat generated at the junction during operation and to achieve good continuous oscillation of the laser beam τ. The structure is connected to the n-conductivity type region 2 and fixed with indium (In) 7 via a nine-metal electrode.
ところで上述の如き構成の従来の半導体レーザ素子にお
いては、n4を型領域2側に設けられた金電極4と絶縁
膜8との接着強度が弱いため、ヒートシンク基台6上に
該金電極4を介して固着された前記素子が金電極4と絶
縁膜8との接着面で結果レーザ光の発振しきい値電流の
増加、ならびに発振波長が変化するといった欠点があっ
た。また極端な場合にはヒートシンク基台6よシ素子が
完全にはがれてしまうという好ましくない不都合も生じ
ていた。By the way, in the conventional semiconductor laser device having the above-mentioned configuration, the adhesion strength between the gold electrode 4 provided on the side of the mold region 2 and the insulating film 8 is weak, so the gold electrode 4 is placed on the heat sink base 6. As a result, the oscillation threshold current of the laser beam increases and the oscillation wavelength changes at the bonding surface between the gold electrode 4 and the insulating film 8, which causes the element to be fixed thereon. Furthermore, in extreme cases, the heat sink base 6 and the heat sink element may be completely peeled off, which is an undesirable inconvenience.
(Q) 発明の目的
本発明は上記欠点を解消するためになされたもので、そ
の目的は、半導体レーザ素子のn導電型領域面側に配設
する電極を絶縁膜に対して接着力の良好危金属部材で構
成し、該素子とヒートシンク基台との接合部における熱
抵抗の変化が危く、熱放散、信頼性のよい新規な半導体
レーザ装置を提供するものである。(Q) Purpose of the Invention The present invention has been made in order to eliminate the above-mentioned drawbacks, and its purpose is to provide an electrode disposed on the n-conductivity type region surface side of a semiconductor laser device with good adhesion to an insulating film. It is an object of the present invention to provide a novel semiconductor laser device which is constructed from a dangerous metal member, has a dangerous change in thermal resistance at the junction between the element and a heat sink base, and has good heat dissipation and reliability.
峻)発明の構成 、′。Shun) Structure of the invention ,′.
即ち、本発明はストライプ形状の活性部をそなえた半導
体レーザ素子において、前記活性部に電気的に接続する
電極を形成すると共に、該電極の上面に接して、かつ素
子基板表面の絶縁膜上に延在するクローム層を形成し、
該クローム層を介して当該レーザ素子をヒートシンクに
固着してなることを特徴とするものである。That is, the present invention provides a semiconductor laser device having a striped active region, in which an electrode is formed that is electrically connected to the active region, and is in contact with the upper surface of the electrode and on an insulating film on the surface of the device substrate. forming an extended chrome layer,
It is characterized in that the laser element is fixed to a heat sink via the chrome layer.
(e)発明の実施例
以下図面を用いて本発明の好まし本実施例について詳細
に説朋する。(e) Embodiments of the Invention Preferred embodiments of the invention will be described in detail below with reference to the drawings.
第2図は本発明に保る半導体レーザ装置の一実施例を示
す概略斜視図であり、第1図と同等部分には同一符号を
付している。図において1は例えばp導電型のPbSS
eからなる化合物半導体基板であり、2は該基板l上に
5iOs+からなる絶縁膜8を被着し、該絶縁@Sの中
央部をストライプ状に選択エツチングによって除去し、
かつその絶縁膜8をマスクにして拡散法によって形成さ
れたn導電型領域であり、該n導電型領域8即ちストラ
イプ形状の活性領域上に電気的に接続する電極21は図
示のように金(Au)を蒸着法によってストフィプパタ
ーン状にもうけられている。しかしてかかるストライプ
電極21の上面に接し、かつ前記素子基板lの全面に□
、前記絶縁11118を介して、該絶縁膜8との接着強
度が優れているクローム(Or)映22が蒸着法等によ
シ被着形成されている。FIG. 2 is a schematic perspective view showing an embodiment of a semiconductor laser device according to the present invention, and the same parts as in FIG. 1 are given the same reference numerals. In the figure, 1 is, for example, PbSS of p-conductivity type.
2 is a compound semiconductor substrate consisting of E, and 2 is an insulating film 8 made of 5iOs+ deposited on the substrate l, and the central part of the insulating @S is removed by selective etching in a stripe shape.
The n-conductivity type region is formed by a diffusion method using the insulating film 8 as a mask, and the electrode 21 electrically connected to the n-conductivity type region 8, that is, the striped active region, is made of gold (as shown in the figure). Au) is deposited in a stopophe pattern by vapor deposition. □ is in contact with the upper surface of the stripe electrode 21 and on the entire surface of the element substrate l.
A chrome (Or) film 22 having excellent adhesion strength to the insulating film 8 is deposited via the insulating film 11118 by vapor deposition or the like.
5は基板lIs面にもうけられた金電極である。5 is a gold electrode provided on the surface of the substrate IIs.
このように構成された半導体レーザ索子はそのクローム
$22を介してCuからなるヒートシンク基台6上にイ
ンジウム(In)7によって固着し九構成がとられてい
るので、前記ストライプ電極21及びクローム膜2gが
従来のように素子基板1よシはがれるというような致命
的な障害が生ずることがなくなり、熱放散性、及び発振
特性が大幅に向上する。The semiconductor laser wire thus constructed is fixed to the heat sink base 6 made of Cu through the chrome 22 with indium (In) 7, so that the stripe electrode 21 and the chrome A fatal failure such as the film 2g peeling off from the element substrate 1 as in the conventional case does not occur, and heat dissipation and oscillation characteristics are greatly improved.
(f)発明の効果
以上の説明から明らかなように本発明に係る半導体レー
ザ装置の構成によれば、半導体レーザ素子とヒートシン
ク基台との接着強度が向上し、この間での接触熱抵抗が
大幅に減ぜられるので熱放散性がよく、かつ発振特性が
安定す本等、信頼度の高いヌトライプ構造の半導体レー
ザ装置が得られる。よって本実施例において説明に供し
たPbSSe糸のプレーナストフイブ型の半導体レーザ
装置に限らず、各種化合物半導体を用いた例えば埋込み
ストライプ型あるいはメサストライプ型半導体レーザ装
置等にも適用可能なことは勿論であり、すぐれ九効来が
発揮される。(f) Effects of the Invention As is clear from the above explanation, the structure of the semiconductor laser device according to the present invention improves the adhesive strength between the semiconductor laser element and the heat sink base, and significantly reduces the contact thermal resistance between them. Therefore, it is possible to obtain a highly reliable semiconductor laser device with a nutripe structure, such as a semiconductor laser device with good heat dissipation and stable oscillation characteristics. Therefore, it is of course applicable not only to the planar fiber type semiconductor laser device made of PbSSe thread explained in this embodiment, but also to buried stripe type or mesa stripe type semiconductor laser devices using various compound semiconductors. It has nine excellent effects.
第1図は従来のプレーナストライプ型半導体レーザ装置
の構造を示す概略斜視図、第2図は本発明に係る半導体
レーザ装置の一実施例を示す概略斜視図である。
図において1はp4w型の化合物半導体基板、2はスト
ライプ状のn導電型領域(活性領稙)、8は絶縁膜、5
は金電極、6はヒートシンク基台、7はインジウム、2
1はストライプ電極、22はクローム膜を示す。FIG. 1 is a schematic perspective view showing the structure of a conventional planar stripe type semiconductor laser device, and FIG. 2 is a schematic perspective view showing an embodiment of the semiconductor laser device according to the present invention. In the figure, 1 is a p4w type compound semiconductor substrate, 2 is a striped n-conductivity type region (active region), 8 is an insulating film, and 5 is a p4w type compound semiconductor substrate.
is a gold electrode, 6 is a heat sink base, 7 is indium, 2
Reference numeral 1 indicates a stripe electrode, and reference numeral 22 indicates a chrome film.
Claims (1)
おいて、前記活性部に電気的に接続する電極を形成する
と共に、該電極の上面に接して、かつ素子基板表面の絶
縁膜上に延在するクローム層を形成し、該クローム層を
介して当咳し−ザ素子ヲヒートシンクに固着してなるこ
とを特徴とする半導体レーザ装置。In a semiconductor laser device having a striped active region, a chromium layer is provided which forms an electrode electrically connected to the active region, and which is in contact with the upper surface of the electrode and extends over an insulating film on the surface of the device substrate. What is claimed is: 1. A semiconductor laser device comprising: a chromium layer formed thereon;
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57031156A JPS58147188A (en) | 1982-02-26 | 1982-02-26 | Semiconductor laser device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57031156A JPS58147188A (en) | 1982-02-26 | 1982-02-26 | Semiconductor laser device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS58147188A true JPS58147188A (en) | 1983-09-01 |
Family
ID=12323573
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57031156A Pending JPS58147188A (en) | 1982-02-26 | 1982-02-26 | Semiconductor laser device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58147188A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0613711A (en) * | 1992-03-25 | 1994-01-21 | American Teleph & Telegr Co <Att> | Surface light emitting laser and manufacture thereof |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5666079A (en) * | 1979-11-01 | 1981-06-04 | Fujitsu Ltd | Photo semiconductor device |
-
1982
- 1982-02-26 JP JP57031156A patent/JPS58147188A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5666079A (en) * | 1979-11-01 | 1981-06-04 | Fujitsu Ltd | Photo semiconductor device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0613711A (en) * | 1992-03-25 | 1994-01-21 | American Teleph & Telegr Co <Att> | Surface light emitting laser and manufacture thereof |
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