JPS5814674B2 - カンコウセイオフセツトインサツバンノセイホウ - Google Patents

カンコウセイオフセツトインサツバンノセイホウ

Info

Publication number
JPS5814674B2
JPS5814674B2 JP10005275A JP10005275A JPS5814674B2 JP S5814674 B2 JPS5814674 B2 JP S5814674B2 JP 10005275 A JP10005275 A JP 10005275A JP 10005275 A JP10005275 A JP 10005275A JP S5814674 B2 JPS5814674 B2 JP S5814674B2
Authority
JP
Japan
Prior art keywords
coating
photosensitive
layer coating
copying
carrier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10005275A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5144004A (ja
Inventor
ヘルベルト・シユレーテル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of JPS5144004A publication Critical patent/JPS5144004A/ja
Publication of JPS5814674B2 publication Critical patent/JPS5814674B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
JP10005275A 1974-08-19 1975-08-18 カンコウセイオフセツトインサツバンノセイホウ Expired JPS5814674B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742439730 DE2439730C2 (de) 1974-08-19 1974-08-19 Verfahren zum Herstellen einer lichtempfindlichen Offset-Druckplatte

Publications (2)

Publication Number Publication Date
JPS5144004A JPS5144004A (ja) 1976-04-15
JPS5814674B2 true JPS5814674B2 (ja) 1983-03-22

Family

ID=5923563

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10005275A Expired JPS5814674B2 (ja) 1974-08-19 1975-08-18 カンコウセイオフセツトインサツバンノセイホウ

Country Status (6)

Country Link
JP (1) JPS5814674B2 (enrdf_load_stackoverflow)
CA (1) CA1044512A (enrdf_load_stackoverflow)
DE (1) DE2439730C2 (enrdf_load_stackoverflow)
FR (1) FR2282660A1 (enrdf_load_stackoverflow)
GB (1) GB1514506A (enrdf_load_stackoverflow)
IT (1) IT1041240B (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59181586U (ja) * 1983-05-20 1984-12-04 日本電池株式会社 無漏液鉛蓄電池

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57171591U (enrdf_load_stackoverflow) * 1981-04-23 1982-10-28
GB2128769A (en) * 1982-10-14 1984-05-02 Unilever Plc Lithographic printing plate
US4587199A (en) * 1983-07-11 1986-05-06 E. I. Du Pont De Nemours And Company Controlled roughening of a photosensitive composition
DE3433247A1 (de) * 1984-09-11 1986-03-20 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung
JPH0425295Y2 (enrdf_load_stackoverflow) * 1985-05-13 1992-06-17

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1813445C3 (de) * 1968-12-09 1979-04-12 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Kopiermaterial für das Herstellen einer Lichtdruckform und Verfahren zum Herstellen der Lichtdruckform
US3891443A (en) * 1973-02-01 1975-06-24 Polychrome Corp Mat finish photosensitive relief plates

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59181586U (ja) * 1983-05-20 1984-12-04 日本電池株式会社 無漏液鉛蓄電池

Also Published As

Publication number Publication date
DE2439730C2 (de) 1983-09-15
JPS5144004A (ja) 1976-04-15
FR2282660B3 (enrdf_load_stackoverflow) 1978-04-07
CA1044512A (en) 1978-12-19
IT1041240B (it) 1980-01-10
DE2439730A1 (de) 1976-03-04
FR2282660A1 (fr) 1976-03-19
GB1514506A (en) 1978-06-14

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