JPS5810852B2 - ヒシヨウシツチタンサンビスマス ノ エツチングエキ - Google Patents
ヒシヨウシツチタンサンビスマス ノ エツチングエキInfo
- Publication number
- JPS5810852B2 JPS5810852B2 JP2878074A JP2878074A JPS5810852B2 JP S5810852 B2 JPS5810852 B2 JP S5810852B2 JP 2878074 A JP2878074 A JP 2878074A JP 2878074 A JP2878074 A JP 2878074A JP S5810852 B2 JPS5810852 B2 JP S5810852B2
- Authority
- JP
- Japan
- Prior art keywords
- etching
- bismuth
- bismuth titanate
- etching exhaust
- titanium sun
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
- Weting (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2878074A JPS5810852B2 (ja) | 1974-03-13 | 1974-03-13 | ヒシヨウシツチタンサンビスマス ノ エツチングエキ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2878074A JPS5810852B2 (ja) | 1974-03-13 | 1974-03-13 | ヒシヨウシツチタンサンビスマス ノ エツチングエキ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS50122477A JPS50122477A (zh) | 1975-09-26 |
JPS5810852B2 true JPS5810852B2 (ja) | 1983-02-28 |
Family
ID=12257907
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2878074A Expired JPS5810852B2 (ja) | 1974-03-13 | 1974-03-13 | ヒシヨウシツチタンサンビスマス ノ エツチングエキ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5810852B2 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0968979A1 (en) * | 1998-06-30 | 2000-01-05 | Siemens Aktiengesellschaft | Etching of Bi-based metal oxides ceramics |
-
1974
- 1974-03-13 JP JP2878074A patent/JPS5810852B2/ja not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0968979A1 (en) * | 1998-06-30 | 2000-01-05 | Siemens Aktiengesellschaft | Etching of Bi-based metal oxides ceramics |
Also Published As
Publication number | Publication date |
---|---|
JPS50122477A (zh) | 1975-09-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5810852B2 (ja) | ヒシヨウシツチタンサンビスマス ノ エツチングエキ | |
US3551220A (en) | Method of producing a transistor | |
JPS61271839A (ja) | パタ−ン形成方法 | |
JPS57167669A (en) | Capacitor and manufacture thereof | |
CN112151369A (zh) | 半导体结构及其形成方法 | |
JP3216173B2 (ja) | 薄膜トランジスタ回路の製造方法 | |
GB1494328A (en) | Process for thinning silicon with special application to producing silicon on insulator | |
JPS52124860A (en) | Electrode formation method for semiconductor devices | |
SU517279A3 (ru) | Способ изготовлени полупроводникового прибора | |
JPS5343481A (en) | Mirror surface etching method of sapphire substrate crystal | |
JPS56137648A (en) | Manufacture of semiconductor device | |
JPS5339873A (en) | Etching method of silicon semiconductor substrate containing gold | |
JPS52153373A (en) | Preparation of semiconductor device | |
JP2853325B2 (ja) | 半導体装置の製造方法 | |
JPS60224228A (ja) | アモルフアスシリコン薄膜トランジスタの製造方法 | |
JPS55145346A (en) | Fabricating method of semiconductor element | |
JPS57118644A (en) | Manufacture of semiconductor device | |
JPS5582451A (en) | Manufacture of semiconductor device | |
JPS57193035A (en) | Manufacture of semiconductor device | |
JP2598922B2 (ja) | 薄膜トランジスタの製造方法 | |
JPS61245538A (ja) | シリコン基板の部分エツチング法 | |
JPS53132279A (en) | Production of semiconductor device | |
JPS5718362A (en) | Semiconductor device and manufacture thereof | |
JPS57128079A (en) | Manufacture of p-n junction element | |
JPS54116185A (en) | Manufacture for semiconductor device |