JPS5794323A - Treating method for waste gas of cvd apparatus - Google Patents

Treating method for waste gas of cvd apparatus

Info

Publication number
JPS5794323A
JPS5794323A JP55169684A JP16968480A JPS5794323A JP S5794323 A JPS5794323 A JP S5794323A JP 55169684 A JP55169684 A JP 55169684A JP 16968480 A JP16968480 A JP 16968480A JP S5794323 A JPS5794323 A JP S5794323A
Authority
JP
Japan
Prior art keywords
gas
silane
liquid
washing
waste gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55169684A
Other languages
English (en)
Inventor
Toru Tejima
Ko Yasui
Kazuaki Hokota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Stanley Electric Co Ltd
Original Assignee
Stanley Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stanley Electric Co Ltd filed Critical Stanley Electric Co Ltd
Priority to JP55169684A priority Critical patent/JPS5794323A/ja
Publication of JPS5794323A publication Critical patent/JPS5794323A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Treating Waste Gases (AREA)
  • Gas Separation By Absorption (AREA)
JP55169684A 1980-12-03 1980-12-03 Treating method for waste gas of cvd apparatus Pending JPS5794323A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55169684A JPS5794323A (en) 1980-12-03 1980-12-03 Treating method for waste gas of cvd apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55169684A JPS5794323A (en) 1980-12-03 1980-12-03 Treating method for waste gas of cvd apparatus

Publications (1)

Publication Number Publication Date
JPS5794323A true JPS5794323A (en) 1982-06-11

Family

ID=15890983

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55169684A Pending JPS5794323A (en) 1980-12-03 1980-12-03 Treating method for waste gas of cvd apparatus

Country Status (1)

Country Link
JP (1) JPS5794323A (ja)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60175522A (ja) * 1984-02-23 1985-09-09 World Giken:Kk 半導体生産工程中の廃ガス乾式処理組成物
JPS6142321A (ja) * 1984-08-06 1986-02-28 Sony Corp シランガス処理装置
JPS61115129U (ja) * 1984-12-28 1986-07-21
JPS63214321A (ja) * 1987-02-28 1988-09-07 Koujiyundo Silicon Kk 珪素化合物を含むガスの処理方法
JPH03178318A (ja) * 1989-12-04 1991-08-02 Iwatani Internatl Corp 水素化物系廃ガスの湿式除害方法
JPH03178317A (ja) * 1989-12-04 1991-08-02 Iwatani Internatl Corp 水素化物系廃ガスの湿式除害方法
FR2727692A1 (fr) * 1994-12-05 1996-06-07 Europ Propulsion Dispositif d'extraction de gaz pour four d'infiltration ou depot chimique en phase vapeur dans une installation de fabrication de pieces en materiau composite
JP2013039521A (ja) * 2011-08-15 2013-02-28 Taiyo Nippon Sanso Corp ガス処理方法、ガス処理装置、微粉末の形成方法及び微粉末形成装置
JP2013099719A (ja) * 2011-11-08 2013-05-23 Nt Corp 有害ガスの無害化処理方法およびその方法を実施するためのスクラバー

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5684619A (en) * 1979-12-12 1981-07-10 Seitetsu Kagaku Co Ltd Nonpolluting method of gas for semiconductor

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5684619A (en) * 1979-12-12 1981-07-10 Seitetsu Kagaku Co Ltd Nonpolluting method of gas for semiconductor

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6331252B2 (ja) * 1984-02-23 1988-06-23 Waarudo Giken Kk
JPS60175522A (ja) * 1984-02-23 1985-09-09 World Giken:Kk 半導体生産工程中の廃ガス乾式処理組成物
JPS6142321A (ja) * 1984-08-06 1986-02-28 Sony Corp シランガス処理装置
JPH0331085B2 (ja) * 1984-08-06 1991-05-02 Sonii Kk
JPH0344252Y2 (ja) * 1984-12-28 1991-09-18
JPS61115129U (ja) * 1984-12-28 1986-07-21
JPS63214321A (ja) * 1987-02-28 1988-09-07 Koujiyundo Silicon Kk 珪素化合物を含むガスの処理方法
JPH03178318A (ja) * 1989-12-04 1991-08-02 Iwatani Internatl Corp 水素化物系廃ガスの湿式除害方法
JPH03178317A (ja) * 1989-12-04 1991-08-02 Iwatani Internatl Corp 水素化物系廃ガスの湿式除害方法
FR2727692A1 (fr) * 1994-12-05 1996-06-07 Europ Propulsion Dispositif d'extraction de gaz pour four d'infiltration ou depot chimique en phase vapeur dans une installation de fabrication de pieces en materiau composite
WO1996017972A1 (fr) * 1994-12-05 1996-06-13 Societe Europeenne De Propulsion Dispositif d'extraction de gaz
JP2013039521A (ja) * 2011-08-15 2013-02-28 Taiyo Nippon Sanso Corp ガス処理方法、ガス処理装置、微粉末の形成方法及び微粉末形成装置
JP2013099719A (ja) * 2011-11-08 2013-05-23 Nt Corp 有害ガスの無害化処理方法およびその方法を実施するためのスクラバー

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