JPS5753308B2 - - Google Patents
Info
- Publication number
- JPS5753308B2 JPS5753308B2 JP1617175A JP1617175A JPS5753308B2 JP S5753308 B2 JPS5753308 B2 JP S5753308B2 JP 1617175 A JP1617175 A JP 1617175A JP 1617175 A JP1617175 A JP 1617175A JP S5753308 B2 JPS5753308 B2 JP S5753308B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/36—Carbonitrides
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Carbon And Carbon Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH170474A CH593345A5 (en) | 1974-02-07 | 1974-02-07 | Depositing carbide, nitride and carbonitride coatings - on inorg. substrates by using cyano cpds. as sources of carbon and nitrogen |
| CH170374A CH589723A5 (en) | 1974-02-07 | 1974-02-07 | Depositing carbide, nitride and carbonitride coatings - on inorg. substrates by using cyano cpds. as sources of carbon and nitrogen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50117809A JPS50117809A (US20080094685A1-20080424-C00004.png) | 1975-09-16 |
| JPS5753308B2 true JPS5753308B2 (US20080094685A1-20080424-C00004.png) | 1982-11-12 |
Family
ID=25688425
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1617175A Expired JPS5753308B2 (US20080094685A1-20080424-C00004.png) | 1974-02-07 | 1975-02-07 |
Country Status (6)
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50124904A (US20080094685A1-20080424-C00004.png) * | 1974-03-20 | 1975-10-01 | ||
| GB2227755B (en) * | 1988-12-08 | 1993-03-10 | Univ Hull | A process for improving the wear and corrosion resistance of metallic components |
| DE502005005932D1 (de) * | 2004-05-17 | 2008-12-24 | Braecker Ag | Ringläufer und Verfahren zu dessen Herstellung |
| DE102005049393B4 (de) * | 2005-10-15 | 2019-08-08 | Kennametal Widia Produktions Gmbh & Co. Kg | Verfahren zur Herstellung eines beschichteten Substratkörpers, Substratkörper mit einer Beschichtung und Verwendung des beschichteten Substratkörpers |
| JP2011166160A (ja) * | 2011-03-22 | 2011-08-25 | Tokyo Electron Ltd | 積層膜の形成方法 |
| WO2020068579A1 (en) * | 2018-09-28 | 2020-04-02 | Corning Incorporated | Low temperature methods for depositing inorganic particles on a metal substrate and articles produced by the same |
| CN109243654B (zh) * | 2018-10-10 | 2022-10-18 | 镇江华核装备有限公司 | 一种核泄漏应急用屏蔽服的制备工艺 |
-
1975
- 1975-02-05 CA CA219,428A patent/CA1047899A/en not_active Expired
- 1975-02-06 AT AT92375A patent/AT332697B/de not_active IP Right Cessation
- 1975-02-06 FR FR7503703A patent/FR2273080B1/fr not_active Expired
- 1975-02-06 SE SE7501315A patent/SE410743B/xx not_active IP Right Cessation
- 1975-02-07 GB GB534475A patent/GB1489102A/en not_active Expired
- 1975-02-07 JP JP1617175A patent/JPS5753308B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2505009A1 (de) | 1975-08-14 |
| ATA92375A (de) | 1976-01-15 |
| FR2273080A1 (US20080094685A1-20080424-C00004.png) | 1975-12-26 |
| DE2505009B2 (de) | 1977-06-30 |
| FR2273080B1 (US20080094685A1-20080424-C00004.png) | 1977-09-16 |
| SE7501315L (US20080094685A1-20080424-C00004.png) | 1975-08-08 |
| GB1489102A (en) | 1977-10-19 |
| CA1047899A (en) | 1979-02-06 |
| SE410743B (sv) | 1979-10-29 |
| AT332697B (de) | 1976-10-11 |
| JPS50117809A (US20080094685A1-20080424-C00004.png) | 1975-09-16 |
