JPS5744145A - Radiaton sensitive positive type resist composition and its solution - Google Patents
Radiaton sensitive positive type resist composition and its solutionInfo
- Publication number
- JPS5744145A JPS5744145A JP12051180A JP12051180A JPS5744145A JP S5744145 A JPS5744145 A JP S5744145A JP 12051180 A JP12051180 A JP 12051180A JP 12051180 A JP12051180 A JP 12051180A JP S5744145 A JPS5744145 A JP S5744145A
- Authority
- JP
- Japan
- Prior art keywords
- butyl
- resist composition
- methacrylate monomer
- radiaton
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title abstract 2
- 239000000178 monomer Substances 0.000 abstract 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 abstract 3
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical group COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 abstract 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 abstract 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 abstract 2
- 229920001577 copolymer Polymers 0.000 abstract 1
- 239000000839 emulsion Substances 0.000 abstract 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 abstract 1
- 230000000379 polymerizing effect Effects 0.000 abstract 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 abstract 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- 239000000725 suspension Substances 0.000 abstract 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12051180A JPS5744145A (en) | 1980-08-29 | 1980-08-29 | Radiaton sensitive positive type resist composition and its solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12051180A JPS5744145A (en) | 1980-08-29 | 1980-08-29 | Radiaton sensitive positive type resist composition and its solution |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5744145A true JPS5744145A (en) | 1982-03-12 |
| JPS649614B2 JPS649614B2 (enrdf_load_stackoverflow) | 1989-02-17 |
Family
ID=14788017
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12051180A Granted JPS5744145A (en) | 1980-08-29 | 1980-08-29 | Radiaton sensitive positive type resist composition and its solution |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5744145A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5968264U (ja) * | 1982-10-30 | 1984-05-09 | 大崎電気工業株式会社 | アナログ−電流変換回路 |
| JPS60117244A (ja) * | 1983-11-30 | 1985-06-24 | Fujitsu Ltd | パタ−ン形成方法 |
-
1980
- 1980-08-29 JP JP12051180A patent/JPS5744145A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5968264U (ja) * | 1982-10-30 | 1984-05-09 | 大崎電気工業株式会社 | アナログ−電流変換回路 |
| JPS60117244A (ja) * | 1983-11-30 | 1985-06-24 | Fujitsu Ltd | パタ−ン形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS649614B2 (enrdf_load_stackoverflow) | 1989-02-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR870001242A (ko) | 유동성이 개선된 스티렌성 중합체 수지 | |
| DK188589A (da) | Polymer komposition | |
| JPS5744145A (en) | Radiaton sensitive positive type resist composition and its solution | |
| DK211177A (da) | Merkaptanaktivering med syre ved copolymerisation af acrylnitril | |
| JPS5433583A (en) | Ethylene-tetrafluoroethylene copolymer and its preparation | |
| IE42015L (en) | Olefinic nitrile copolymers | |
| JPS5759920A (en) | Photocrosslinkable resin composition | |
| JPS5516015A (en) | Styrene-acrylic resin and its production | |
| JPS5448830A (en) | Resin composition for corrosion preventing coating | |
| JPS5499190A (en) | Solvent-resistant acrylic resin and its preparation | |
| JPS56125414A (en) | Coating resin composition | |
| JPS6425147A (en) | Photosensitive resin composition | |
| JPS5223150A (en) | Polyvinyl chloride resin composition | |
| DE58903097D1 (de) | Vertraegliche polymermischungen (i). | |
| JPS5423641A (en) | Water-dispersed adhesive composition | |
| JPS5490387A (en) | Preparation of self-curing resin | |
| JPS5430288A (en) | New perfluoroalkyl-group-containing copolymer | |
| JPS5223138A (en) | Sticking agent | |
| JPS5287449A (en) | Methacrylic resin composition | |
| JPS548651A (en) | Dyeability improver consisting of aqueous acrylonitrile polymer emulsion | |
| SE8206271D0 (sv) | Fogmassa | |
| JPS5319397A (en) | Preparation of styrene-acrylonitrile copolymer | |
| KR890014606A (ko) | 방향족 비닐 화합물-비닐 시아나이드 화합물 공중합체의 제조방법 | |
| JPS5473892A (en) | Production of methyl methacrylate polymer | |
| JPS5375292A (en) | Suspension copolymerization of acrylonitrile with acrylicacid alkyl ester |