JPS5742970B2 - - Google Patents
Info
- Publication number
- JPS5742970B2 JPS5742970B2 JP14771475A JP14771475A JPS5742970B2 JP S5742970 B2 JPS5742970 B2 JP S5742970B2 JP 14771475 A JP14771475 A JP 14771475A JP 14771475 A JP14771475 A JP 14771475A JP S5742970 B2 JPS5742970 B2 JP S5742970B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14771475A JPS5271174A (en) | 1975-12-10 | 1975-12-10 | Production of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14771475A JPS5271174A (en) | 1975-12-10 | 1975-12-10 | Production of semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5271174A JPS5271174A (en) | 1977-06-14 |
| JPS5742970B2 true JPS5742970B2 (pm) | 1982-09-11 |
Family
ID=15436532
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14771475A Granted JPS5271174A (en) | 1975-12-10 | 1975-12-10 | Production of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5271174A (pm) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5748249A (en) * | 1980-09-08 | 1982-03-19 | Nec Corp | Semiconductor device |
| JPS5848459A (ja) * | 1981-09-16 | 1983-03-22 | Nec Corp | 半導体装置 |
| JPS58101454A (ja) * | 1981-12-12 | 1983-06-16 | Nippon Telegr & Teleph Corp <Ntt> | 半導体装置の電極 |
| JPS60225464A (ja) * | 1984-04-24 | 1985-11-09 | Hitachi Ltd | イメ−ジセンサとその製造方法 |
| JP2776807B2 (ja) * | 1987-01-14 | 1998-07-16 | 株式会社日立製作所 | 半導体装置の製造方法 |
| JP2544477B2 (ja) * | 1989-03-31 | 1996-10-16 | シャープ株式会社 | 窒化チタン膜形成方法 |
| JP3243722B2 (ja) * | 1990-10-24 | 2002-01-07 | 住友金属工業株式会社 | 薄膜の形成方法および半導体装置 |
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1975
- 1975-12-10 JP JP14771475A patent/JPS5271174A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5271174A (en) | 1977-06-14 |