JPS5734650B2 - - Google Patents
Info
- Publication number
- JPS5734650B2 JPS5734650B2 JP9002879A JP9002879A JPS5734650B2 JP S5734650 B2 JPS5734650 B2 JP S5734650B2 JP 9002879 A JP9002879 A JP 9002879A JP 9002879 A JP9002879 A JP 9002879A JP S5734650 B2 JPS5734650 B2 JP S5734650B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
- Welding Or Cutting Using Electron Beams (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9002879A JPS5536990A (en) | 1979-07-16 | 1979-07-16 | Apparatus for applying electron beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9002879A JPS5536990A (en) | 1979-07-16 | 1979-07-16 | Apparatus for applying electron beam |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1977276A Division JPS52103965A (en) | 1976-02-25 | 1976-02-25 | Electron beam projector unit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5536990A JPS5536990A (en) | 1980-03-14 |
| JPS5734650B2 true JPS5734650B2 (https=) | 1982-07-24 |
Family
ID=13987215
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9002879A Granted JPS5536990A (en) | 1979-07-16 | 1979-07-16 | Apparatus for applying electron beam |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5536990A (https=) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5787131A (en) * | 1980-11-20 | 1982-05-31 | Jeol Ltd | Exposing method of electron beam |
| US4468565A (en) * | 1981-12-31 | 1984-08-28 | International Business Machines Corporation | Automatic focus and deflection correction in E-beam system using optical target height measurements |
| JPS58145122A (ja) * | 1982-02-23 | 1983-08-29 | Jeol Ltd | 電子ビ−ム露光装置 |
| JPS59150422A (ja) * | 1983-01-31 | 1984-08-28 | Fujitsu Ltd | 露光処理方法 |
| JPS6045022A (ja) * | 1983-08-23 | 1985-03-11 | Toshiba Corp | Ｌｓｉ製造装置における高さ補正方法 |
| JPS6355936A (ja) * | 1986-08-27 | 1988-03-10 | Omron Tateisi Electronics Co | 電子ビ−ム描画装置 |
| JP2642945B2 (ja) * | 1988-04-20 | 1997-08-20 | 富士通株式会社 | 電子ビーム露光装置 |
| JP2002004956A (ja) | 2000-06-23 | 2002-01-09 | Aisan Ind Co Ltd | 蒸発燃料放出防止装置 |
-
1979
- 1979-07-16 JP JP9002879A patent/JPS5536990A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5536990A (en) | 1980-03-14 |