JPS5730331A - Method for exposure of electron beam - Google Patents

Method for exposure of electron beam

Info

Publication number
JPS5730331A
JPS5730331A JP10562780A JP10562780A JPS5730331A JP S5730331 A JPS5730331 A JP S5730331A JP 10562780 A JP10562780 A JP 10562780A JP 10562780 A JP10562780 A JP 10562780A JP S5730331 A JPS5730331 A JP S5730331A
Authority
JP
Japan
Prior art keywords
exposure
exposed
pattern
accuracy
field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10562780A
Other languages
English (en)
Japanese (ja)
Other versions
JPH026215B2 (cs
Inventor
Yasuo Iida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP10562780A priority Critical patent/JPS5730331A/ja
Publication of JPS5730331A publication Critical patent/JPS5730331A/ja
Publication of JPH026215B2 publication Critical patent/JPH026215B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
JP10562780A 1980-07-31 1980-07-31 Method for exposure of electron beam Granted JPS5730331A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10562780A JPS5730331A (en) 1980-07-31 1980-07-31 Method for exposure of electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10562780A JPS5730331A (en) 1980-07-31 1980-07-31 Method for exposure of electron beam

Publications (2)

Publication Number Publication Date
JPS5730331A true JPS5730331A (en) 1982-02-18
JPH026215B2 JPH026215B2 (cs) 1990-02-08

Family

ID=14412713

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10562780A Granted JPS5730331A (en) 1980-07-31 1980-07-31 Method for exposure of electron beam

Country Status (1)

Country Link
JP (1) JPS5730331A (cs)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116009361A (zh) * 2021-10-22 2023-04-25 江苏迪盛智能科技有限公司 一种曝光方法及曝光设备

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52119866A (en) * 1976-03-31 1977-10-07 Fujitsu Ltd Electronic beam deflection device
JPS559447A (en) * 1978-07-06 1980-01-23 Jeol Ltd Electron ray exposure device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52119866A (en) * 1976-03-31 1977-10-07 Fujitsu Ltd Electronic beam deflection device
JPS559447A (en) * 1978-07-06 1980-01-23 Jeol Ltd Electron ray exposure device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116009361A (zh) * 2021-10-22 2023-04-25 江苏迪盛智能科技有限公司 一种曝光方法及曝光设备

Also Published As

Publication number Publication date
JPH026215B2 (cs) 1990-02-08

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