JPS57171699A - Metallic ion replenishing method of plating liquid - Google Patents

Metallic ion replenishing method of plating liquid

Info

Publication number
JPS57171699A
JPS57171699A JP5721081A JP5721081A JPS57171699A JP S57171699 A JPS57171699 A JP S57171699A JP 5721081 A JP5721081 A JP 5721081A JP 5721081 A JP5721081 A JP 5721081A JP S57171699 A JPS57171699 A JP S57171699A
Authority
JP
Japan
Prior art keywords
plating
plating liquid
tank
metal
metallic ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5721081A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6116358B2 (enrdf_load_stackoverflow
Inventor
Hiroaki Okudaira
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5721081A priority Critical patent/JPS57171699A/ja
Publication of JPS57171699A publication Critical patent/JPS57171699A/ja
Publication of JPS6116358B2 publication Critical patent/JPS6116358B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electroplating Methods And Accessories (AREA)
JP5721081A 1981-04-17 1981-04-17 Metallic ion replenishing method of plating liquid Granted JPS57171699A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5721081A JPS57171699A (en) 1981-04-17 1981-04-17 Metallic ion replenishing method of plating liquid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5721081A JPS57171699A (en) 1981-04-17 1981-04-17 Metallic ion replenishing method of plating liquid

Publications (2)

Publication Number Publication Date
JPS57171699A true JPS57171699A (en) 1982-10-22
JPS6116358B2 JPS6116358B2 (enrdf_load_stackoverflow) 1986-04-30

Family

ID=13049147

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5721081A Granted JPS57171699A (en) 1981-04-17 1981-04-17 Metallic ion replenishing method of plating liquid

Country Status (1)

Country Link
JP (1) JPS57171699A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0288790A (ja) * 1988-09-22 1990-03-28 C Uyemura & Co Ltd ビスマス―錫合金電気めっき方法
JPH03180494A (ja) * 1989-12-07 1991-08-06 C Uyemura & Co Ltd めっき浴への金属イオン補給方法
US5234572A (en) * 1991-07-09 1993-08-10 C. Uyemura & Co., Ltd. Metal ion replenishment to plating bath
JP2013177680A (ja) * 2012-02-10 2013-09-09 Yuken Industry Co Ltd 電気エネルギーおよび組成物の製造装置、および当該装置を備えるめっき設備
WO2024190061A1 (ja) * 2023-03-16 2024-09-19 ユケン工業株式会社 亜鉛溶解方法、および亜鉛溶解装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0288790A (ja) * 1988-09-22 1990-03-28 C Uyemura & Co Ltd ビスマス―錫合金電気めっき方法
JPH03180494A (ja) * 1989-12-07 1991-08-06 C Uyemura & Co Ltd めっき浴への金属イオン補給方法
US5234572A (en) * 1991-07-09 1993-08-10 C. Uyemura & Co., Ltd. Metal ion replenishment to plating bath
JP2013177680A (ja) * 2012-02-10 2013-09-09 Yuken Industry Co Ltd 電気エネルギーおよび組成物の製造装置、および当該装置を備えるめっき設備
WO2024190061A1 (ja) * 2023-03-16 2024-09-19 ユケン工業株式会社 亜鉛溶解方法、および亜鉛溶解装置

Also Published As

Publication number Publication date
JPS6116358B2 (enrdf_load_stackoverflow) 1986-04-30

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