JPS57143874A - Manufacture of solar cell - Google Patents
Manufacture of solar cellInfo
- Publication number
- JPS57143874A JPS57143874A JP56028530A JP2853081A JPS57143874A JP S57143874 A JPS57143874 A JP S57143874A JP 56028530 A JP56028530 A JP 56028530A JP 2853081 A JP2853081 A JP 2853081A JP S57143874 A JPS57143874 A JP S57143874A
- Authority
- JP
- Japan
- Prior art keywords
- solar cell
- electrode film
- type
- titanium
- manufacture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 abstract 3
- 229910021417 amorphous silicon Inorganic materials 0.000 abstract 3
- 229910052719 titanium Inorganic materials 0.000 abstract 3
- 239000010936 titanium Substances 0.000 abstract 3
- 239000004642 Polyimide Substances 0.000 abstract 2
- 230000015556 catabolic process Effects 0.000 abstract 2
- 238000006731 degradation reaction Methods 0.000 abstract 2
- 238000007733 ion plating Methods 0.000 abstract 2
- 229920001721 polyimide Polymers 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 241000127225 Enceliopsis nudicaulis Species 0.000 abstract 1
- 230000003247 decreasing effect Effects 0.000 abstract 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 238000007493 shaping process Methods 0.000 abstract 1
- 238000001771 vacuum deposition Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
- H01L31/03921—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate including only elements of Group IV of the Periodic System
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PIN type
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
Abstract
PURPOSE:To manufacture the light weight solar cell at low cost, and to form the flexible solar cell, secular degradation thereof is little, by shaping an electrode film through an ion plating method. CONSTITUTION:The electrode film 12 in titanium, etc. is deposited onto a substrate 11 made of a high molecular material (such as polyimide) through the ion plating method. An amorphous silicon (a-Si) layer 13 is formed onto the electrode film 12. The a-Si semiconductor layer 13 is composed of the three layers of an N type - an I type - a P type from the titanium electrode 12 side. A transparent electrode film 14 transmitting sunrays 15 such as tin oxide indium is shaped through a vacuum evaporation method. Accordingly, the titanium electrode 12 is not exfoliated from the polyimide substrate 11, and the degradation of the characteristics of the solar cell is decreased.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56028530A JPS57143874A (en) | 1981-02-27 | 1981-02-27 | Manufacture of solar cell |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56028530A JPS57143874A (en) | 1981-02-27 | 1981-02-27 | Manufacture of solar cell |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57143874A true JPS57143874A (en) | 1982-09-06 |
Family
ID=12251214
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56028530A Pending JPS57143874A (en) | 1981-02-27 | 1981-02-27 | Manufacture of solar cell |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57143874A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0103168A2 (en) * | 1982-09-10 | 1984-03-21 | Hitachi, Ltd. | Amorphous silicon solar battery |
US4543441A (en) * | 1983-02-14 | 1985-09-24 | Hitachi, Ltd. | Solar battery using amorphous silicon |
WO2012066136A1 (en) | 2010-11-18 | 2012-05-24 | Dsm Ip Assets B.V. | Flexible electrical generators |
-
1981
- 1981-02-27 JP JP56028530A patent/JPS57143874A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0103168A2 (en) * | 1982-09-10 | 1984-03-21 | Hitachi, Ltd. | Amorphous silicon solar battery |
EP0103168A3 (en) * | 1982-09-10 | 1986-07-02 | Hitachi, Ltd. | Amorphous silicon solar battery |
US4543441A (en) * | 1983-02-14 | 1985-09-24 | Hitachi, Ltd. | Solar battery using amorphous silicon |
WO2012066136A1 (en) | 2010-11-18 | 2012-05-24 | Dsm Ip Assets B.V. | Flexible electrical generators |
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