JPS5684475A - Etching liquid for phosphorus containing glass - Google Patents
Etching liquid for phosphorus containing glassInfo
- Publication number
- JPS5684475A JPS5684475A JP16052579A JP16052579A JPS5684475A JP S5684475 A JPS5684475 A JP S5684475A JP 16052579 A JP16052579 A JP 16052579A JP 16052579 A JP16052579 A JP 16052579A JP S5684475 A JPS5684475 A JP S5684475A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- etching liquid
- containing glass
- phosphorus containing
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- ing And Chemical Polishing (AREA)
- Weting (AREA)
Abstract
PURPOSE:To enable the safe and stable etching at an appropriate etching speed as well as to reduce a cost by constituting the titled etching liquid from a specific composition of ammonium hydroxide, hydrogen peroxide and water. CONSTITUTION:The etching liquid for the phosphorus containing glass is characterized in constituted from 7-45wt% of ammonium hydroxide, 7-20wt%. of hydrogen peroxide and a balance of water. This etching liquid has an appropriate etching speed and it is not necessary to add an expensive chemical agent for controlling the etching speed as a conventional etching liquid as well as handling is safe and accidents are not generated during etching work.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16052579A JPS6042177B2 (en) | 1979-12-11 | 1979-12-11 | Etching solution for glass containing phosphorus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16052579A JPS6042177B2 (en) | 1979-12-11 | 1979-12-11 | Etching solution for glass containing phosphorus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5684475A true JPS5684475A (en) | 1981-07-09 |
JPS6042177B2 JPS6042177B2 (en) | 1985-09-20 |
Family
ID=15716837
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16052579A Expired JPS6042177B2 (en) | 1979-12-11 | 1979-12-11 | Etching solution for glass containing phosphorus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6042177B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5413678A (en) * | 1993-05-14 | 1995-05-09 | Texas Instruments Incorporated | Heated SC1 solution for selective etching |
JP2008105887A (en) * | 2006-10-25 | 2008-05-08 | National Institute Of Advanced Industrial & Technology | Super water-repellent glass substrate and its manufacturing method |
-
1979
- 1979-12-11 JP JP16052579A patent/JPS6042177B2/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5413678A (en) * | 1993-05-14 | 1995-05-09 | Texas Instruments Incorporated | Heated SC1 solution for selective etching |
JP2008105887A (en) * | 2006-10-25 | 2008-05-08 | National Institute Of Advanced Industrial & Technology | Super water-repellent glass substrate and its manufacturing method |
Also Published As
Publication number | Publication date |
---|---|
JPS6042177B2 (en) | 1985-09-20 |
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