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Application filedfiledCritical
Priority to JP11526775ApriorityCriticalpatent/JPS5245326A/ja
Publication of JPS5245326ApublicationCriticalpatent/JPS5245326A/ja
Publication of JPS5636414B2publicationCriticalpatent/JPS5636414B2/ja
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
G03C1/00—Photosensitive materials
G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
G03C1/825—Photosensitive materials characterised by the base or auxiliary layers characterised by antireflection means or visible-light filtering means, e.g. antihalation
G03C1/835—Macromolecular substances therefor, e.g. mordants
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Physics & Mathematics
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Spectroscopy & Molecular Physics
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Chemical & Material Sciences
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Engineering & Computer Science
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Materials Engineering
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General Physics & Mathematics
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Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications
(AREA)
JP11526775A1975-09-231975-09-23Photographic light sensitiv material
GrantedJPS5245326A
(en)
