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Priority to JP9842275ApriorityCriticalpatent/JPS5222924A/ja
Publication of JPS5222924ApublicationCriticalpatent/JPS5222924A/ja
Publication of JPS562945B2publicationCriticalpatent/JPS562945B2/ja
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/004—Photosensitive materials
G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
Engineering & Computer Science
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Architecture
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Structural Engineering
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Physics & Mathematics
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General Physics & Mathematics
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Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography
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