JPS5625775B2 - - Google Patents

Info

Publication number
JPS5625775B2
JPS5625775B2 JP1923777A JP1923777A JPS5625775B2 JP S5625775 B2 JPS5625775 B2 JP S5625775B2 JP 1923777 A JP1923777 A JP 1923777A JP 1923777 A JP1923777 A JP 1923777A JP S5625775 B2 JPS5625775 B2 JP S5625775B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1923777A
Other versions
JPS53105376A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1923777A priority Critical patent/JPS5625775B2/ja
Publication of JPS53105376A publication Critical patent/JPS53105376A/en
Publication of JPS5625775B2 publication Critical patent/JPS5625775B2/ja
Application status is Expired legal-status Critical

Links

JP1923777A 1977-02-25 1977-02-25 Expired JPS5625775B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1923777A JPS5625775B2 (en) 1977-02-25 1977-02-25

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1923777A JPS5625775B2 (en) 1977-02-25 1977-02-25

Publications (2)

Publication Number Publication Date
JPS53105376A JPS53105376A (en) 1978-09-13
JPS5625775B2 true JPS5625775B2 (en) 1981-06-15

Family

ID=11993774

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1923777A Expired JPS5625775B2 (en) 1977-02-25 1977-02-25

Country Status (1)

Country Link
JP (1) JPS5625775B2 (en)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0140492B2 (en) * 1980-11-07 1989-08-29 Nikon Kk
JPS57183031A (en) * 1981-05-06 1982-11-11 Toshiba Corp Method for wafer exposure and device thereof
JPS587824A (en) * 1981-07-06 1983-01-17 Hitachi Ltd Alignment method and device thereof
JPS5828748A (en) * 1981-08-13 1983-02-19 Nippon Kogaku Kk <Nikon> Positioning device for transcribing device
JPS5944841A (en) * 1982-09-07 1984-03-13 Tokyo Seimitsu Co Ltd Method and apparatus for probe alignment of semiconductor element inspecting apparatus
JPS5976425A (en) * 1982-10-25 1984-05-01 Canon Inc Printing apparatus for semiconductor
JPS5989419A (en) * 1982-11-15 1984-05-23 Canon Inc Positioning device
JPS6354213B2 (en) * 1982-11-30 1988-10-27 Canon Kk
JPS59100531A (en) * 1982-11-30 1984-06-09 Canon Inc Position detector
JPH0510814B2 (en) * 1983-06-29 1993-02-10 Hitachi Ltd
JPH0727853B2 (en) * 1983-08-10 1995-03-29 日本電信電話株式会社 Reduction projection exposure method
NL8401710A (en) * 1984-05-29 1985-12-16 Philips Nv An apparatus for imaging a mask pattern on a substrate.
JPH0543169B2 (en) * 1984-10-01 1993-06-30 Canon Kk
US4937618A (en) * 1984-10-18 1990-06-26 Canon Kabushiki Kaisha Alignment and exposure apparatus and method for manufacture of integrated circuits
JPH0334846B2 (en) * 1984-11-30 1991-05-24 Canon Kk
JPH0615966B2 (en) * 1984-12-26 1994-03-02 株式会社日立製作所 Pattern - down detection device
JPH0754793B2 (en) * 1986-04-21 1995-06-07 株式会社ニコン Projection exposure apparatus
SG88823A1 (en) 1996-11-28 2002-05-21 Nikon Corp Projection exposure apparatus
JPH10209039A (en) 1997-01-27 1998-08-07 Nikon Corp Method and apparatus for projection exposure

Also Published As

Publication number Publication date
JPS53105376A (en) 1978-09-13

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