JPS56114320A - Aligning method - Google Patents

Aligning method

Info

Publication number
JPS56114320A
JPS56114320A JP1636080A JP1636080A JPS56114320A JP S56114320 A JPS56114320 A JP S56114320A JP 1636080 A JP1636080 A JP 1636080A JP 1636080 A JP1636080 A JP 1636080A JP S56114320 A JPS56114320 A JP S56114320A
Authority
JP
Japan
Prior art keywords
die
aligned
center
step sizes
cross
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1636080A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6255690B2 (enrdf_load_stackoverflow
Inventor
Nobuhiro Endo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP1636080A priority Critical patent/JPS56114320A/ja
Publication of JPS56114320A publication Critical patent/JPS56114320A/ja
Publication of JPS6255690B2 publication Critical patent/JPS6255690B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Projection-Type Copiers In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP1636080A 1980-02-13 1980-02-13 Aligning method Granted JPS56114320A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1636080A JPS56114320A (en) 1980-02-13 1980-02-13 Aligning method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1636080A JPS56114320A (en) 1980-02-13 1980-02-13 Aligning method

Publications (2)

Publication Number Publication Date
JPS56114320A true JPS56114320A (en) 1981-09-08
JPS6255690B2 JPS6255690B2 (enrdf_load_stackoverflow) 1987-11-20

Family

ID=11914165

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1636080A Granted JPS56114320A (en) 1980-02-13 1980-02-13 Aligning method

Country Status (1)

Country Link
JP (1) JPS56114320A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6266631A (ja) * 1985-09-19 1987-03-26 Nippon Kogaku Kk <Nikon> ステツプ・アンド・リピ−ト露光装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6266631A (ja) * 1985-09-19 1987-03-26 Nippon Kogaku Kk <Nikon> ステツプ・アンド・リピ−ト露光装置

Also Published As

Publication number Publication date
JPS6255690B2 (enrdf_load_stackoverflow) 1987-11-20

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