JPS56105622A - Manufacture of silicon stick for semiconductor - Google Patents

Manufacture of silicon stick for semiconductor

Info

Publication number
JPS56105622A
JPS56105622A JP790680A JP790680A JPS56105622A JP S56105622 A JPS56105622 A JP S56105622A JP 790680 A JP790680 A JP 790680A JP 790680 A JP790680 A JP 790680A JP S56105622 A JPS56105622 A JP S56105622A
Authority
JP
Japan
Prior art keywords
frame
constructing
core
troubles
bridged
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP790680A
Other languages
Japanese (ja)
Inventor
Seiichi Kirii
Teruhisa Kitagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KOUJIYUNDO SILICON KK
KOUJIYUNDO SILICONE KK
Original Assignee
KOUJIYUNDO SILICON KK
KOUJIYUNDO SILICONE KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KOUJIYUNDO SILICON KK, KOUJIYUNDO SILICONE KK filed Critical KOUJIYUNDO SILICON KK
Priority to JP790680A priority Critical patent/JPS56105622A/en
Publication of JPS56105622A publication Critical patent/JPS56105622A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon
    • C01B33/021Preparation
    • C01B33/027Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/035Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)

Abstract

PURPOSE:To enable to prevent without fail the troubles such as distortion, inclination, collapse and the like generated in the early stage of reaction by a method wherein a plurality of frame-constructing carrier having a metal core are arranged on the curved lines and the space between frame-constructing material is bridged, using an insulating material, fixed and coupled. CONSTITUTION:A gaseous Si compound sent from a tube 3 is being feeded to an airtight container 2. A Ta core 4 is installed with its leg section connected to an electrode 5, its upper section is connected to the upper section of another Ta core 4 by a Ta bridge 6 and a frame-constructing 7 is formed. The leg sections of the plurality of these frame-constructing materials are arranged respectively on the inner and the outer curved lines which are making a polygon, and at the same time, the space between the adjoining frame-construction on a polygon is bridged by an insulating material 8 and coupled in a fixed manner. Accordingly, in the case when an extremely thin metal core is used to the carrier, the troubles such as distortion, inclination, collapse and the like frequently generated in the early stage of reaction can be prevented without fail, thereby enabling to take in a plurality of frame- constructions using a large-sized furnace.
JP790680A 1980-01-25 1980-01-25 Manufacture of silicon stick for semiconductor Pending JPS56105622A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP790680A JPS56105622A (en) 1980-01-25 1980-01-25 Manufacture of silicon stick for semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP790680A JPS56105622A (en) 1980-01-25 1980-01-25 Manufacture of silicon stick for semiconductor

Publications (1)

Publication Number Publication Date
JPS56105622A true JPS56105622A (en) 1981-08-22

Family

ID=11678595

Family Applications (1)

Application Number Title Priority Date Filing Date
JP790680A Pending JPS56105622A (en) 1980-01-25 1980-01-25 Manufacture of silicon stick for semiconductor

Country Status (1)

Country Link
JP (1) JPS56105622A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014100401A1 (en) * 2012-12-19 2014-06-26 Gtat Corporation Methods and systems for stabilizing filaments in a chemical vapor deposition reactor
CN104357807A (en) * 2008-03-26 2015-02-18 Gtat公司 Systems and methods for distributing gas in a chemical vapor deposition reactor
US11167994B2 (en) 2014-12-25 2021-11-09 Shin-Etsu Chemical Co., Ltd. Polycrystalline silicon rod, processing method for polycrystalline silicon rod, method for evaluating polycrystalline silicon rod, and method for producing FZ single crystal silicon

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104357807A (en) * 2008-03-26 2015-02-18 Gtat公司 Systems and methods for distributing gas in a chemical vapor deposition reactor
WO2014100401A1 (en) * 2012-12-19 2014-06-26 Gtat Corporation Methods and systems for stabilizing filaments in a chemical vapor deposition reactor
KR20150096447A (en) * 2012-12-19 2015-08-24 지티에이티 코포레이션 Methods and systems for stabilizing filaments in a chemical vapor deposition reactor
CN104981560A (en) * 2012-12-19 2015-10-14 Gtat公司 Methods and systems for stabilizing filaments in chemical vapor deposition reactor
US9701541B2 (en) 2012-12-19 2017-07-11 Gtat Corporation Methods and systems for stabilizing filaments in a chemical vapor deposition reactor
US10513438B2 (en) 2012-12-19 2019-12-24 Oci Company Ltd. Method for stabilizing filaments in a chemical vapor deposition reactor
US11167994B2 (en) 2014-12-25 2021-11-09 Shin-Etsu Chemical Co., Ltd. Polycrystalline silicon rod, processing method for polycrystalline silicon rod, method for evaluating polycrystalline silicon rod, and method for producing FZ single crystal silicon

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