JPS558814A - Purification of waste gas of nox absorption tower - Google Patents

Purification of waste gas of nox absorption tower

Info

Publication number
JPS558814A
JPS558814A JP8048478A JP8048478A JPS558814A JP S558814 A JPS558814 A JP S558814A JP 8048478 A JP8048478 A JP 8048478A JP 8048478 A JP8048478 A JP 8048478A JP S558814 A JPS558814 A JP S558814A
Authority
JP
Japan
Prior art keywords
waste gas
ammonium nitrate
nitrite
pressure
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8048478A
Other languages
Japanese (ja)
Other versions
JPS618731B2 (en
Inventor
Kazumasa Tsunemi
Seiji Shibata
Keiji Ekoshi
Masaki Kashibe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd filed Critical Ube Industries Ltd
Priority to JP8048478A priority Critical patent/JPS558814A/en
Publication of JPS558814A publication Critical patent/JPS558814A/en
Publication of JPS618731B2 publication Critical patent/JPS618731B2/ja
Granted legal-status Critical Current

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  • Treating Waste Gases (AREA)

Abstract

PURPOSE: To prevent a danger of explosion due to accumulation of ammonium nitrate, etc. by washing a waste gas in a spray tower to reduce amounts of ammonium nitrate and ammonium nitrite to below a given amount, elevating the pressure, heating, adding NH3 and decomposing NOx in a reactor filled with a catalyst.
CONSTITUTION: Waste gas containing NOx and small amount of ammonium nitrate and nitrite, is washed in a spray tower under a spray pressure of 2 to 20 kg/cm2, in a total spray amount of 2 to 20 l per Nm3 of the waste gas and at a temperature of below 30°C, to reduce the total amount of ammonium nitrate and nitrite present in the waste gas to below 20 ppm. After elevating the pressure, heating and adding NH3 to the gas, the resulting gas is introduced into a reactor 5 filled with a catalyst. NOx is decomposed by a catalytic decomposition reaction to remove it. A preferred gas pressure of the waste gas to be introduced into the reactor 5 is from 300 to 800 mAq, and the preferred temperature is from 250 to 400°C. The operation can be conducted continuously for a long time without the accumulation of ammonium nitrate and nitrite in any steps. The waste gas can be purified without the danger of explosion.
COPYRIGHT: (C)1980,JPO&Japio
JP8048478A 1978-07-04 1978-07-04 Purification of waste gas of nox absorption tower Granted JPS558814A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8048478A JPS558814A (en) 1978-07-04 1978-07-04 Purification of waste gas of nox absorption tower

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8048478A JPS558814A (en) 1978-07-04 1978-07-04 Purification of waste gas of nox absorption tower

Publications (2)

Publication Number Publication Date
JPS558814A true JPS558814A (en) 1980-01-22
JPS618731B2 JPS618731B2 (en) 1986-03-17

Family

ID=13719546

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8048478A Granted JPS558814A (en) 1978-07-04 1978-07-04 Purification of waste gas of nox absorption tower

Country Status (1)

Country Link
JP (1) JPS558814A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4940889A (en) * 1972-08-25 1974-04-17
JPS6156431A (en) * 1984-08-28 1986-03-22 Nec Corp High-voltage semiconductor integrated circuit
CN112978635A (en) * 2021-02-24 2021-06-18 广东大唐国际雷州发电有限责任公司 Lifting device for operation platform of absorption tower

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01234707A (en) * 1988-03-11 1989-09-20 Rinnai Corp Infrared radiation combustion plate and baking burner and heating burner using the plate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4940889A (en) * 1972-08-25 1974-04-17
JPS6156431A (en) * 1984-08-28 1986-03-22 Nec Corp High-voltage semiconductor integrated circuit
CN112978635A (en) * 2021-02-24 2021-06-18 广东大唐国际雷州发电有限责任公司 Lifting device for operation platform of absorption tower

Also Published As

Publication number Publication date
JPS618731B2 (en) 1986-03-17

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