JPS5587144A - Resist image printing method - Google Patents
Resist image printing methodInfo
- Publication number
- JPS5587144A JPS5587144A JP15930278A JP15930278A JPS5587144A JP S5587144 A JPS5587144 A JP S5587144A JP 15930278 A JP15930278 A JP 15930278A JP 15930278 A JP15930278 A JP 15930278A JP S5587144 A JPS5587144 A JP S5587144A
- Authority
- JP
- Japan
- Prior art keywords
- beams
- resist image
- substrate
- laser
- photoresist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To easily print a fine pattern resist image on a photoresist on a substrate without bringing a mask into contact with the substrate by using parllel laser beams.
CONSTITUTION: The laser beams are emitted from light souce 1, passed through hole 7 of parabolic mirror 3, and diffusion reflected by reflection sphere 4 (fixed in the focus of mirror 3) to give parallel beams 2. These beams 2 are transmitted through mask 5, radiated to the photoresist on substrate 6, and this resist is developed to form a resist image. It is desirable that He-Cd laser releasing about 400W 300nm wavelength light or modulalble dye laser is used for the above laser beams.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15930278A JPS5587144A (en) | 1978-12-26 | 1978-12-26 | Resist image printing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15930278A JPS5587144A (en) | 1978-12-26 | 1978-12-26 | Resist image printing method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5587144A true JPS5587144A (en) | 1980-07-01 |
Family
ID=15690822
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15930278A Pending JPS5587144A (en) | 1978-12-26 | 1978-12-26 | Resist image printing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5587144A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5739858A (en) * | 1991-05-02 | 1998-04-14 | Canon Kabushiki Kaisha | Automatic focusing device using a plurality of different frequency components extracted at the same point |
-
1978
- 1978-12-26 JP JP15930278A patent/JPS5587144A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5739858A (en) * | 1991-05-02 | 1998-04-14 | Canon Kabushiki Kaisha | Automatic focusing device using a plurality of different frequency components extracted at the same point |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4362809A (en) | Multilayer photoresist process utilizing an absorbant dye | |
JPS5560944A (en) | Image forming method | |
JPS5590931A (en) | Production of micro structure element array | |
JPS647618A (en) | Method and apparatus for exposing semiconductor | |
EP0127045A2 (en) | Apparatus for producing a light source of required shape | |
KR930008964A (en) | Exposure Method of Photoresist Composition and Photoresist | |
JPS5587144A (en) | Resist image printing method | |
JPS57181537A (en) | Light pattern projector | |
JPH01114035A (en) | Aligner | |
JPS60158449A (en) | Exposing device | |
JPS57106128A (en) | Forming method for pattern | |
JPS62265722A (en) | Optical system for illumination | |
JPS5657037A (en) | Projection exposing method | |
JPS56140768A (en) | Optical device for multibeam scanning | |
JPS6487169A (en) | Laser marking device | |
JPS58222522A (en) | Projection aligner | |
JPS56144539A (en) | Formation of fine pattern | |
JPS51115822A (en) | Silver halogenide photo emulsion for ruby laser exposure | |
JPS5581347A (en) | Alignment mechanism | |
JPS6477936A (en) | Reduction type x-ray lithographic device | |
JPS55126240A (en) | Marking-off method by laser beam | |
JPS51115821A (en) | Silver halogenide photo emulsion for ruby laser exposure | |
JPS5454579A (en) | Exposure method | |
ATE67612T1 (en) | X-RAY LITHOGRAPHY. | |
KR970030231A (en) | Halftone Phase Inversion Mask |