JPS5521106B2 - - Google Patents

Info

Publication number
JPS5521106B2
JPS5521106B2 JP12493975A JP12493975A JPS5521106B2 JP S5521106 B2 JPS5521106 B2 JP S5521106B2 JP 12493975 A JP12493975 A JP 12493975A JP 12493975 A JP12493975 A JP 12493975A JP S5521106 B2 JPS5521106 B2 JP S5521106B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12493975A
Other languages
Japanese (ja)
Other versions
JPS5249990A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12493975A priority Critical patent/JPS5249990A/ja
Publication of JPS5249990A publication Critical patent/JPS5249990A/ja
Publication of JPS5521106B2 publication Critical patent/JPS5521106B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Physical Vapour Deposition (AREA)
JP12493975A 1975-10-17 1975-10-17 Method for vacuum evaporation of multi layr film Granted JPS5249990A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12493975A JPS5249990A (en) 1975-10-17 1975-10-17 Method for vacuum evaporation of multi layr film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12493975A JPS5249990A (en) 1975-10-17 1975-10-17 Method for vacuum evaporation of multi layr film

Publications (2)

Publication Number Publication Date
JPS5249990A JPS5249990A (en) 1977-04-21
JPS5521106B2 true JPS5521106B2 (enrdf_load_stackoverflow) 1980-06-07

Family

ID=14897914

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12493975A Granted JPS5249990A (en) 1975-10-17 1975-10-17 Method for vacuum evaporation of multi layr film

Country Status (1)

Country Link
JP (1) JPS5249990A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57204185U (enrdf_load_stackoverflow) * 1981-06-19 1982-12-25
WO2002061169A1 (fr) * 2001-02-01 2002-08-08 Nikon Corporation Procede et dispositif pour former un film et procede de fabrication d'un element optique

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104647820A (zh) * 2015-03-16 2015-05-27 广东迪奥应用材料科技有限公司 一种具有ar和af功能的高硬度高介电常数的盖板

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS495834A (enrdf_load_stackoverflow) * 1972-04-15 1974-01-19

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57204185U (enrdf_load_stackoverflow) * 1981-06-19 1982-12-25
WO2002061169A1 (fr) * 2001-02-01 2002-08-08 Nikon Corporation Procede et dispositif pour former un film et procede de fabrication d'un element optique

Also Published As

Publication number Publication date
JPS5249990A (en) 1977-04-21

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