JPS55151643A - Thin film treating method - Google Patents

Thin film treating method

Info

Publication number
JPS55151643A
JPS55151643A JP6108179A JP6108179A JPS55151643A JP S55151643 A JPS55151643 A JP S55151643A JP 6108179 A JP6108179 A JP 6108179A JP 6108179 A JP6108179 A JP 6108179A JP S55151643 A JPS55151643 A JP S55151643A
Authority
JP
Japan
Prior art keywords
thin film
film
treating method
film treating
implanted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6108179A
Other languages
Japanese (ja)
Inventor
Kazuhiro Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP6108179A priority Critical patent/JPS55151643A/en
Publication of JPS55151643A publication Critical patent/JPS55151643A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings

Abstract

PURPOSE:To enhance the durability of a metal compound thin film and elongate the lifetime of a hard mask by forming the thin film on a substrate and implanting ions in the film surface. CONSTITUTION:Iron oxide thin film 12 is formed on glass substrate 11 by vapor deposition or sputtering, and about 10<18>-10<15> IONS/cm<2> of B<+> are implanted in film 12 at an accelerating voltage of 10keV. Layer 12 is then annealed for about 1hr to form surface ion-implanted layer 13 contg. compounds such as Fe2B and FeB produced.
JP6108179A 1979-05-16 1979-05-16 Thin film treating method Pending JPS55151643A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6108179A JPS55151643A (en) 1979-05-16 1979-05-16 Thin film treating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6108179A JPS55151643A (en) 1979-05-16 1979-05-16 Thin film treating method

Publications (1)

Publication Number Publication Date
JPS55151643A true JPS55151643A (en) 1980-11-26

Family

ID=13160803

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6108179A Pending JPS55151643A (en) 1979-05-16 1979-05-16 Thin film treating method

Country Status (1)

Country Link
JP (1) JPS55151643A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61105548A (en) * 1984-10-29 1986-05-23 Nec Corp Preparation of photomask for photographic etching
US8871528B2 (en) 2011-09-30 2014-10-28 HGST Netherlands B.V. Medium patterning method and associated apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61105548A (en) * 1984-10-29 1986-05-23 Nec Corp Preparation of photomask for photographic etching
JPH0458621B2 (en) * 1984-10-29 1992-09-18 Nippon Electric Co
US8871528B2 (en) 2011-09-30 2014-10-28 HGST Netherlands B.V. Medium patterning method and associated apparatus

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