JPS55147304A - Monitoring method of quantity of change in shape - Google Patents

Monitoring method of quantity of change in shape

Info

Publication number
JPS55147304A
JPS55147304A JP5502279A JP5502279A JPS55147304A JP S55147304 A JPS55147304 A JP S55147304A JP 5502279 A JP5502279 A JP 5502279A JP 5502279 A JP5502279 A JP 5502279A JP S55147304 A JPS55147304 A JP S55147304A
Authority
JP
Japan
Prior art keywords
pattern
shape change
change quantity
shape
circle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5502279A
Other languages
Japanese (ja)
Inventor
Kazuo Terada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP5502279A priority Critical patent/JPS55147304A/en
Publication of JPS55147304A publication Critical patent/JPS55147304A/en
Pending legal-status Critical Current

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)

Abstract

PURPOSE: To easily and uniformly control the quantity of the change in a shape among lots, by previously making a shape change quantity monitoring pattern together with a desired pattern.
CONSTITUTION: A shape change quantity pattern comprises a group of pattern elements 11, 110 in which boundary arc lines between light and dark parts constitute a circle, another group of pattern elements 12, 120 whose boundary arc lines are located at a distance of 1μm from a circle, and still another group of pattern elements 13, 130 whose boundary arc lines are also located at a distance of 1μm from a circle. Photoetching is effected as the shape change quantity pattern is present together with a pattern to be made. The shape change quantity monitoring pattern of a worked surface film is observed by a microscope to easily measure a shape change quantity.
COPYRIGHT: (C)1980,JPO&Japio
JP5502279A 1979-05-04 1979-05-04 Monitoring method of quantity of change in shape Pending JPS55147304A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5502279A JPS55147304A (en) 1979-05-04 1979-05-04 Monitoring method of quantity of change in shape

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5502279A JPS55147304A (en) 1979-05-04 1979-05-04 Monitoring method of quantity of change in shape

Publications (1)

Publication Number Publication Date
JPS55147304A true JPS55147304A (en) 1980-11-17

Family

ID=12987033

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5502279A Pending JPS55147304A (en) 1979-05-04 1979-05-04 Monitoring method of quantity of change in shape

Country Status (1)

Country Link
JP (1) JPS55147304A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3224462A1 (en) * 1981-06-30 1983-01-13 Tokyo Shibaura Denki K.K., Kawasaki, Kanagawa METHOD FOR EVALUATING THE ACCURACY OF A PATTERN DESIGNED ON A SUBSTRATE, AND PHOTOMASK HERE

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5375768A (en) * 1976-12-17 1978-07-05 Fujitsu Ltd Size check pattern
JPS53108772A (en) * 1977-03-04 1978-09-21 Mitsubishi Electric Corp Production of semiconductor device
JPS5453864A (en) * 1977-10-05 1979-04-27 Sanyo Electric Co Ltd Monitoring method of line widths

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5375768A (en) * 1976-12-17 1978-07-05 Fujitsu Ltd Size check pattern
JPS53108772A (en) * 1977-03-04 1978-09-21 Mitsubishi Electric Corp Production of semiconductor device
JPS5453864A (en) * 1977-10-05 1979-04-27 Sanyo Electric Co Ltd Monitoring method of line widths

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3224462A1 (en) * 1981-06-30 1983-01-13 Tokyo Shibaura Denki K.K., Kawasaki, Kanagawa METHOD FOR EVALUATING THE ACCURACY OF A PATTERN DESIGNED ON A SUBSTRATE, AND PHOTOMASK HERE

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