JPS5512775A - Manufacturing method of semiconductor - Google Patents
Manufacturing method of semiconductorInfo
- Publication number
- JPS5512775A JPS5512775A JP8585278A JP8585278A JPS5512775A JP S5512775 A JPS5512775 A JP S5512775A JP 8585278 A JP8585278 A JP 8585278A JP 8585278 A JP8585278 A JP 8585278A JP S5512775 A JPS5512775 A JP S5512775A
- Authority
- JP
- Japan
- Prior art keywords
- wiring layer
- layer
- insulating film
- silicone
- side face
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To cause no disconnection in the second wiring layer formed on an insulating film by forming the first wiring layer to have a side face of a gentle incline and by rendering the above insulating film evenly thick.
CONSTITUTION: On an insulating film 2 on a base plate 1 is formed the first wiring layer 7 made of polycrystalline silicone, on which is formed the second wiring layer 9 with an insulating film 8 beneath it. In the middle section of the polycrystalline silicone layer forming the first wiring layer 7 is put a thin layer of oxidized silicone. Etching is performed on the polycrystalline silicone layer holding this oxidized silicone layer to form the first wiring layer 7 having a side face of a gradual incline.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8585278A JPS5512775A (en) | 1978-07-14 | 1978-07-14 | Manufacturing method of semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8585278A JPS5512775A (en) | 1978-07-14 | 1978-07-14 | Manufacturing method of semiconductor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5512775A true JPS5512775A (en) | 1980-01-29 |
Family
ID=13870394
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8585278A Pending JPS5512775A (en) | 1978-07-14 | 1978-07-14 | Manufacturing method of semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5512775A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6007590A (en) * | 1996-05-03 | 1999-12-28 | 3M Innovative Properties Company | Method of making a foraminous abrasive article |
-
1978
- 1978-07-14 JP JP8585278A patent/JPS5512775A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6007590A (en) * | 1996-05-03 | 1999-12-28 | 3M Innovative Properties Company | Method of making a foraminous abrasive article |
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