JPS5477070A - Production of photo mask - Google Patents
Production of photo maskInfo
- Publication number
- JPS5477070A JPS5477070A JP14433677A JP14433677A JPS5477070A JP S5477070 A JPS5477070 A JP S5477070A JP 14433677 A JP14433677 A JP 14433677A JP 14433677 A JP14433677 A JP 14433677A JP S5477070 A JPS5477070 A JP S5477070A
- Authority
- JP
- Japan
- Prior art keywords
- emulsion
- layer
- portions
- chromium
- blackened
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14433677A JPS5477070A (en) | 1977-12-01 | 1977-12-01 | Production of photo mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14433677A JPS5477070A (en) | 1977-12-01 | 1977-12-01 | Production of photo mask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5477070A true JPS5477070A (en) | 1979-06-20 |
| JPS6122457B2 JPS6122457B2 (https=) | 1986-05-31 |
Family
ID=15359733
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14433677A Granted JPS5477070A (en) | 1977-12-01 | 1977-12-01 | Production of photo mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5477070A (https=) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5212002A (en) * | 1975-06-30 | 1977-01-29 | Ibm | Method of high aspect ratio mask |
| JPS52136001A (en) * | 1976-05-10 | 1977-11-14 | Dainippon Printing Co Ltd | Method of adjusting dimensions of lines on photo mask |
-
1977
- 1977-12-01 JP JP14433677A patent/JPS5477070A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5212002A (en) * | 1975-06-30 | 1977-01-29 | Ibm | Method of high aspect ratio mask |
| JPS52136001A (en) * | 1976-05-10 | 1977-11-14 | Dainippon Printing Co Ltd | Method of adjusting dimensions of lines on photo mask |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6122457B2 (https=) | 1986-05-31 |
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