JPS5461299A - Polycarbosilane partially containing siloxane linkage and method of making same - Google Patents

Polycarbosilane partially containing siloxane linkage and method of making same

Info

Publication number
JPS5461299A
JPS5461299A JP12763077A JP12763077A JPS5461299A JP S5461299 A JPS5461299 A JP S5461299A JP 12763077 A JP12763077 A JP 12763077A JP 12763077 A JP12763077 A JP 12763077A JP S5461299 A JPS5461299 A JP S5461299A
Authority
JP
Japan
Prior art keywords
making same
containing siloxane
partially containing
siloxane linkage
polycarbosilane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12763077A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6149334B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Seishi Yajima
Kiyoto Okamura
Yoshio Hasegawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOKUSHIYU MUKI ZAIRIYOU KENKIY
Original Assignee
TOKUSHIYU MUKI ZAIRIYOU KENKIY
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOKUSHIYU MUKI ZAIRIYOU KENKIY filed Critical TOKUSHIYU MUKI ZAIRIYOU KENKIY
Priority to JP12763077A priority Critical patent/JPS5461299A/ja
Priority to GB7841523A priority patent/GB2009196B/en
Priority to US05/953,518 priority patent/US4220600A/en
Priority to DE19782846529 priority patent/DE2846529A1/de
Priority to DE2858374A priority patent/DE2858374C2/de
Publication of JPS5461299A publication Critical patent/JPS5461299A/ja
Priority to US06/047,845 priority patent/US4283376A/en
Publication of JPS6149334B2 publication Critical patent/JPS6149334B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Carbon And Carbon Compounds (AREA)
  • Silicon Polymers (AREA)
  • Ceramic Products (AREA)
  • Compositions Of Oxide Ceramics (AREA)
JP12763077A 1977-10-26 1977-10-26 Polycarbosilane partially containing siloxane linkage and method of making same Granted JPS5461299A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP12763077A JPS5461299A (en) 1977-10-26 1977-10-26 Polycarbosilane partially containing siloxane linkage and method of making same
GB7841523A GB2009196B (en) 1977-10-26 1978-10-23 Polycarbosilane process for its prudiction and its use as material for producing silicon carbide
US05/953,518 US4220600A (en) 1977-10-26 1978-10-23 Polycarbosilane, process for its production, and its use as material for producing silicon carbide fibers
DE19782846529 DE2846529A1 (de) 1977-10-26 1978-10-25 Polycarbosilan, verfahren zu dessen herstellung und dessen verwendung als material zur herstellung von siliciumcarbid
DE2858374A DE2858374C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1977-10-26 1978-10-25
US06/047,845 US4283376A (en) 1977-10-26 1979-06-12 Method of producing silicon carbide fibers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12763077A JPS5461299A (en) 1977-10-26 1977-10-26 Polycarbosilane partially containing siloxane linkage and method of making same

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP58002817A Division JPS58136626A (ja) 1983-01-13 1983-01-13 シロキサン結合を一部含むポリカルボシラン

Publications (2)

Publication Number Publication Date
JPS5461299A true JPS5461299A (en) 1979-05-17
JPS6149334B2 JPS6149334B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1986-10-29

Family

ID=14964830

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12763077A Granted JPS5461299A (en) 1977-10-26 1977-10-26 Polycarbosilane partially containing siloxane linkage and method of making same

Country Status (1)

Country Link
JP (1) JPS5461299A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3444306A1 (de) * 1983-12-05 1985-06-13 Shin-Etsu Chemical Co., Ltd., Tokio/Tokyo Borsiliciumorganisches polymeres und herstellungsverfahren dafuer
US4560526A (en) * 1983-03-18 1985-12-24 Shin Nisso Kako Co., Ltd. Process for preparing molded silicon carbide product
US4650773A (en) * 1984-06-25 1987-03-17 Nippon Carbon Co., Ltd. Continuous inorganic fiber consisting of Si, N and O and a method of producing the same
JPS62260778A (ja) * 1986-05-02 1987-11-13 科学技術庁航空宇宙技術研究所長 超耐熱熱防御構造用三次元織物強化セラミツクス複合材
DE3790151C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1986-03-11 1991-04-04 The Research Institute For Special Inorganic Materials, Asahi, Ibaraki, Jp
JP2003261317A (ja) * 2002-03-08 2003-09-16 National Institute Of Advanced Industrial & Technology 炭化ケイ素の製造方法
WO2005068541A1 (ja) * 2004-01-16 2005-07-28 Jsr Corporation 有機シリカ系膜の形成方法、有機シリカ系膜、配線構造体、半導体装置、および膜形成用組成物
WO2005068539A1 (ja) * 2004-01-16 2005-07-28 Jsr Corporation ポリマーの製造方法、ポリマー、絶縁膜形成用組成物、絶縁膜の製造方法、および絶縁膜
WO2005082976A1 (ja) * 2004-02-26 2005-09-09 Jsr Corporation ポリマーおよびその製造方法、絶縁膜形成用組成物、ならびに絶縁膜およびその形成方法
WO2005108468A1 (ja) * 2004-05-11 2005-11-17 Jsr Corporation 有機シリカ系膜の形成方法、有機シリカ系膜、配線構造体、半導体装置、および膜形成用組成物
WO2005108469A1 (ja) * 2004-05-11 2005-11-17 Jsr Corporation 有機シリカ系膜の形成方法、有機シリカ系膜、配線構造体、半導体装置、および膜形成用組成物
JP2005350651A (ja) * 2004-05-11 2005-12-22 Jsr Corp 絶縁膜形成用組成物およびその製造方法、ならびにシリカ系絶縁膜およびその形成方法
US8431189B2 (en) 2009-12-22 2013-04-30 Korea University Research And Business Foundation Carbon nanotube-nanofiber composite structure
JP2017524744A (ja) * 2014-06-28 2017-08-31 中国科学院化学研究所 ポリカルボシランの触媒による転位の製造方法
JP2018503004A (ja) * 2014-11-04 2018-02-01 ダイネティクス，インコーポレイテッド 高強度耐熱繊維材料

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008239404A (ja) * 2007-03-27 2008-10-09 Covalent Materials Corp 超微細ＳｉＣ粒子およびその製造方法、超微細ＳｉＣ焼結体

Cited By (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4560526A (en) * 1983-03-18 1985-12-24 Shin Nisso Kako Co., Ltd. Process for preparing molded silicon carbide product
DE3444306A1 (de) * 1983-12-05 1985-06-13 Shin-Etsu Chemical Co., Ltd., Tokio/Tokyo Borsiliciumorganisches polymeres und herstellungsverfahren dafuer
US4650773A (en) * 1984-06-25 1987-03-17 Nippon Carbon Co., Ltd. Continuous inorganic fiber consisting of Si, N and O and a method of producing the same
DE3790151C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1986-03-11 1991-04-04 The Research Institute For Special Inorganic Materials, Asahi, Ibaraki, Jp
JPS62260778A (ja) * 1986-05-02 1987-11-13 科学技術庁航空宇宙技術研究所長 超耐熱熱防御構造用三次元織物強化セラミツクス複合材
JP2003261317A (ja) * 2002-03-08 2003-09-16 National Institute Of Advanced Industrial & Technology 炭化ケイ素の製造方法
JP5110243B2 (ja) * 2004-01-16 2012-12-26 Ｊｓｒ株式会社 ポリマーの製造方法
WO2005068539A1 (ja) * 2004-01-16 2005-07-28 Jsr Corporation ポリマーの製造方法、ポリマー、絶縁膜形成用組成物、絶縁膜の製造方法、および絶縁膜
WO2005068540A1 (ja) * 2004-01-16 2005-07-28 Jsr Corporation 絶縁膜形成用組成物およびその製造方法、ならびにシリカ系絶縁膜およびその形成方法
WO2005068538A1 (ja) * 2004-01-16 2005-07-28 Jsr Corporation ポリマーの製造方法、ポリマー、絶縁膜形成用組成物、絶縁膜の製造方法、および絶縁膜
WO2005068541A1 (ja) * 2004-01-16 2005-07-28 Jsr Corporation 有機シリカ系膜の形成方法、有機シリカ系膜、配線構造体、半導体装置、および膜形成用組成物
JP5013045B2 (ja) * 2004-01-16 2012-08-29 Ｊｓｒ株式会社 ポリマーの製造方法
JP5105041B2 (ja) * 2004-01-16 2012-12-19 Ｊｓｒ株式会社 絶縁膜形成用組成物およびその製造方法、ならびにシリカ系絶縁膜およびその形成方法
US7528207B2 (en) 2004-01-16 2009-05-05 Jsr Corporation Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film
US7875317B2 (en) 2004-01-16 2011-01-25 Jsr Corporation Composition for forming insulating film, method for producing same, silica-based insulating film, and method for forming same
WO2005082976A1 (ja) * 2004-02-26 2005-09-09 Jsr Corporation ポリマーおよびその製造方法、絶縁膜形成用組成物、ならびに絶縁膜およびその形成方法
US8404786B2 (en) 2004-02-26 2013-03-26 Jsr Corporation Polymer and process for producing the same, composition for forming insulating film, and insulating film and method of forming the same
WO2005108469A1 (ja) * 2004-05-11 2005-11-17 Jsr Corporation 有機シリカ系膜の形成方法、有機シリカ系膜、配線構造体、半導体装置、および膜形成用組成物
US8268403B2 (en) 2004-05-11 2012-09-18 Jsr Corporation Method for forming organic silica film, organic silica film, wiring structure, semiconductor device, and composition for film formation
JP2005350653A (ja) * 2004-05-11 2005-12-22 Jsr Corp 有機シリカ系膜の形成方法、有機シリカ系膜、配線構造体、半導体装置、および膜形成用組成物
JP2005350651A (ja) * 2004-05-11 2005-12-22 Jsr Corp 絶縁膜形成用組成物およびその製造方法、ならびにシリカ系絶縁膜およびその形成方法
WO2005108468A1 (ja) * 2004-05-11 2005-11-17 Jsr Corporation 有機シリカ系膜の形成方法、有機シリカ系膜、配線構造体、半導体装置、および膜形成用組成物
US8431189B2 (en) 2009-12-22 2013-04-30 Korea University Research And Business Foundation Carbon nanotube-nanofiber composite structure
JP2017524744A (ja) * 2014-06-28 2017-08-31 中国科学院化学研究所 ポリカルボシランの触媒による転位の製造方法
JP2018503004A (ja) * 2014-11-04 2018-02-01 ダイネティクス，インコーポレイテッド 高強度耐熱繊維材料
JP2021059833A (ja) * 2014-11-04 2021-04-15 ダイネティクス，インコーポレイテッド 高強度耐熱繊維材料

Also Published As

Publication number Publication date
JPS6149334B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1986-10-29

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