JPS5457862A - Ion-beam irradiation device - Google Patents
Ion-beam irradiation deviceInfo
- Publication number
- JPS5457862A JPS5457862A JP12348177A JP12348177A JPS5457862A JP S5457862 A JPS5457862 A JP S5457862A JP 12348177 A JP12348177 A JP 12348177A JP 12348177 A JP12348177 A JP 12348177A JP S5457862 A JPS5457862 A JP S5457862A
- Authority
- JP
- Japan
- Prior art keywords
- current
- controlled
- uniform irradiation
- directional
- scanning electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010884 ion-beam technique Methods 0.000 title 1
- 230000010354 integration Effects 0.000 abstract 1
Landscapes
- Welding Or Cutting Using Electron Beams (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12348177A JPS5457862A (en) | 1977-10-17 | 1977-10-17 | Ion-beam irradiation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12348177A JPS5457862A (en) | 1977-10-17 | 1977-10-17 | Ion-beam irradiation device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5457862A true JPS5457862A (en) | 1979-05-10 |
| JPS6212624B2 JPS6212624B2 (enrdf_load_stackoverflow) | 1987-03-19 |
Family
ID=14861691
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12348177A Granted JPS5457862A (en) | 1977-10-17 | 1977-10-17 | Ion-beam irradiation device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5457862A (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61250953A (ja) * | 1985-04-27 | 1986-11-08 | Jeol Ltd | イオンビ−ム描画装置 |
| JPS6212040A (ja) * | 1985-07-10 | 1987-01-21 | Ulvac Corp | イオン注入装置用ビ−ムセンサ |
| JPH01500310A (ja) * | 1986-04-09 | 1989-02-02 | イクリプス・イオン・テクノロジー・インコーポレイテッド | イオンビーム走査方法および装置 |
| JP2010507194A (ja) * | 2006-10-11 | 2010-03-04 | アクセリス テクノロジーズ, インコーポレイテッド | イオン注入装置のためのセンサ |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3778626A (en) * | 1972-07-28 | 1973-12-11 | Western Electric Co | Mechanical scan system for ion implantation |
| JPS5182567A (enrdf_load_stackoverflow) * | 1974-06-25 | 1976-07-20 | Lintott Eng Ltd |
-
1977
- 1977-10-17 JP JP12348177A patent/JPS5457862A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3778626A (en) * | 1972-07-28 | 1973-12-11 | Western Electric Co | Mechanical scan system for ion implantation |
| JPS5182567A (enrdf_load_stackoverflow) * | 1974-06-25 | 1976-07-20 | Lintott Eng Ltd |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61250953A (ja) * | 1985-04-27 | 1986-11-08 | Jeol Ltd | イオンビ−ム描画装置 |
| JPS6212040A (ja) * | 1985-07-10 | 1987-01-21 | Ulvac Corp | イオン注入装置用ビ−ムセンサ |
| JPH01500310A (ja) * | 1986-04-09 | 1989-02-02 | イクリプス・イオン・テクノロジー・インコーポレイテッド | イオンビーム走査方法および装置 |
| JP2010507194A (ja) * | 2006-10-11 | 2010-03-04 | アクセリス テクノロジーズ, インコーポレイテッド | イオン注入装置のためのセンサ |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6212624B2 (enrdf_load_stackoverflow) | 1987-03-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE2149344A1 (de) | Verfahren und Anordnung zur Beaufschlagung genau angeordneter Gebiete eines Elementes mit einem Elektronenstrahl bestimmter Gestalt | |
| KR850005149A (ko) | 무(無) 마스크 공정의 이온 주입장치와 방법 | |
| JPS5457862A (en) | Ion-beam irradiation device | |
| EP0334334A3 (en) | Photo-cathode image projection apparatus for patterning a semiconductor device | |
| EP0390118A3 (en) | Field emission scanning electron microsope and method of controlling beam aperture angle | |
| JPS52143776A (en) | Electron beam exposure apparatus | |
| JPS5750433A (en) | Electron beam exposure method | |
| JPS5613649A (en) | Correcting method and device for astigmatism in scanning type electron microscope and the like | |
| DE2427701A1 (de) | Verfahren und anordnung zur fertigung eines schaltungsmusters durch genaues ausrichten eines elektronenstrahls mit ausgewaehlten bereichen einer hauptflaeche eines koerpers | |
| JPS556829A (en) | Electron beam exposure method | |
| JPS51130222A (en) | A process for producing an electron beam resist image | |
| JPS52128053A (en) | Electron microscope | |
| EP0269613A3 (en) | Device for ion beam projection lithography | |
| KR910019134A (ko) | 이온주입장치 | |
| JPS54152976A (en) | Testing method for integrated circuit | |
| JPS5635343A (en) | System for removing foreign object from cathode-ray tube | |
| DE2558383A1 (de) | Geraet zum feststellen einer charakteristik einer kathodenstrahlroehre | |
| JPH0535540B2 (enrdf_load_stackoverflow) | ||
| JPS6441216A (en) | Electron beam lithography equipment | |
| JPS5642946A (en) | Scanning type electron microscope device | |
| JPS56133829A (en) | Control for beam width | |
| DE2138800A1 (de) | Vorrichtung zum Analysieren, insbesondere zum Messen von Elektronenenergie | |
| JPS54105973A (en) | Axis matching device for electron beam device | |
| JPH0234751Y2 (enrdf_load_stackoverflow) | ||
| JPS51126030A (en) | Tip process for thermion radiation cathodes |