JPS542179A - Low concentration radioactive gas measuring apparatus provided with enrichment rate corrector - Google Patents
Low concentration radioactive gas measuring apparatus provided with enrichment rate correctorInfo
- Publication number
- JPS542179A JPS542179A JP6672777A JP6672777A JPS542179A JP S542179 A JPS542179 A JP S542179A JP 6672777 A JP6672777 A JP 6672777A JP 6672777 A JP6672777 A JP 6672777A JP S542179 A JPS542179 A JP S542179A
- Authority
- JP
- Japan
- Prior art keywords
- measuring apparatus
- low concentration
- apparatus provided
- gas measuring
- radioactive gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Sampling And Sample Adjustment (AREA)
- Measurement Of Radiation (AREA)
Abstract
PURPOSE: To perform correction of the apparatus automatically and readily by operating the measured values, etc. of gas concentration and the gas concentration after enriching and storage, and performing correction of the enriching part.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6672777A JPS542179A (en) | 1977-06-08 | 1977-06-08 | Low concentration radioactive gas measuring apparatus provided with enrichment rate corrector |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6672777A JPS542179A (en) | 1977-06-08 | 1977-06-08 | Low concentration radioactive gas measuring apparatus provided with enrichment rate corrector |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS542179A true JPS542179A (en) | 1979-01-09 |
Family
ID=13324206
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6672777A Pending JPS542179A (en) | 1977-06-08 | 1977-06-08 | Low concentration radioactive gas measuring apparatus provided with enrichment rate corrector |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS542179A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6277492A (en) * | 1985-09-30 | 1987-04-09 | Hokoku Jushi Kogyo Kk | Manufacture of electroformed die |
JPH0259337A (en) * | 1988-08-25 | 1990-02-28 | Mitsubishi Gas Chem Co Inc | Manufacture of thin copper foil plated circuit substrate |
CN105203717A (en) * | 2015-10-22 | 2015-12-30 | 中国核动力研究设计院 | Inert gas monitor field calibration device and application method thereof |
-
1977
- 1977-06-08 JP JP6672777A patent/JPS542179A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6277492A (en) * | 1985-09-30 | 1987-04-09 | Hokoku Jushi Kogyo Kk | Manufacture of electroformed die |
JPH0419314B2 (en) * | 1985-09-30 | 1992-03-30 | Hokoku Jushi Kogyo | |
JPH0259337A (en) * | 1988-08-25 | 1990-02-28 | Mitsubishi Gas Chem Co Inc | Manufacture of thin copper foil plated circuit substrate |
CN105203717A (en) * | 2015-10-22 | 2015-12-30 | 中国核动力研究设计院 | Inert gas monitor field calibration device and application method thereof |
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