JPS5358761A - Vapor phase growth apparatus - Google Patents
Vapor phase growth apparatusInfo
- Publication number
- JPS5358761A JPS5358761A JP13509876A JP13509876A JPS5358761A JP S5358761 A JPS5358761 A JP S5358761A JP 13509876 A JP13509876 A JP 13509876A JP 13509876 A JP13509876 A JP 13509876A JP S5358761 A JPS5358761 A JP S5358761A
- Authority
- JP
- Japan
- Prior art keywords
- vapor phase
- phase growth
- growth apparatus
- vapor
- substances
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001947 vapour-phase growth Methods 0.000 title 1
- 239000000126 substance Substances 0.000 abstract 2
- 239000012495 reaction gas Substances 0.000 abstract 1
Landscapes
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13509876A JPS5358761A (en) | 1976-11-08 | 1976-11-08 | Vapor phase growth apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13509876A JPS5358761A (en) | 1976-11-08 | 1976-11-08 | Vapor phase growth apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5358761A true JPS5358761A (en) | 1978-05-26 |
| JPS5744010B2 JPS5744010B2 (enrdf_load_stackoverflow) | 1982-09-18 |
Family
ID=15143778
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13509876A Granted JPS5358761A (en) | 1976-11-08 | 1976-11-08 | Vapor phase growth apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5358761A (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58193362A (ja) * | 1982-04-30 | 1983-11-11 | Shimadzu Corp | プラズマcvd装置 |
| JPS60122795A (ja) * | 1983-12-07 | 1985-07-01 | Mitsubishi Metal Corp | ダイヤモンドの低圧合成装置 |
| JPS60126833A (ja) * | 1983-11-24 | 1985-07-06 | Mitsubishi Electric Corp | プラズマエツチング装置 |
| JPS62241336A (ja) * | 1986-04-11 | 1987-10-22 | Nec Kyushu Ltd | プラズマエツチング装置 |
| JPS62279862A (ja) * | 1986-05-28 | 1987-12-04 | Anelva Corp | 薄膜形成装置 |
-
1976
- 1976-11-08 JP JP13509876A patent/JPS5358761A/ja active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58193362A (ja) * | 1982-04-30 | 1983-11-11 | Shimadzu Corp | プラズマcvd装置 |
| JPS60126833A (ja) * | 1983-11-24 | 1985-07-06 | Mitsubishi Electric Corp | プラズマエツチング装置 |
| JPS60122795A (ja) * | 1983-12-07 | 1985-07-01 | Mitsubishi Metal Corp | ダイヤモンドの低圧合成装置 |
| JPS62241336A (ja) * | 1986-04-11 | 1987-10-22 | Nec Kyushu Ltd | プラズマエツチング装置 |
| JPS62279862A (ja) * | 1986-05-28 | 1987-12-04 | Anelva Corp | 薄膜形成装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5744010B2 (enrdf_load_stackoverflow) | 1982-09-18 |
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