JPS5338595B2 - - Google Patents
Info
- Publication number
- JPS5338595B2 JPS5338595B2 JP285177A JP285177A JPS5338595B2 JP S5338595 B2 JPS5338595 B2 JP S5338595B2 JP 285177 A JP285177 A JP 285177A JP 285177 A JP285177 A JP 285177A JP S5338595 B2 JPS5338595 B2 JP S5338595B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30625—With simultaneous mechanical treatment, e.g. mechanico-chemical polishing
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Weting (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19762600990 DE2600990A1 (de) | 1976-01-13 | 1976-01-13 | Verfahren zum polieren von halbleiteroberflaechen, insbesondere galliumphosphidoberflaechen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5287976A JPS5287976A (en) | 1977-07-22 |
| JPS5338595B2 true JPS5338595B2 (US06826419-20041130-M00005.png) | 1978-10-16 |
Family
ID=5967341
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP285177A Granted JPS5287976A (en) | 1976-01-13 | 1977-01-13 | Method of polishing nonnconductive surface * especially gallium phosphide surface |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US4043861A (US06826419-20041130-M00005.png) |
| JP (1) | JPS5287976A (US06826419-20041130-M00005.png) |
| DE (1) | DE2600990A1 (US06826419-20041130-M00005.png) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01104265U (US06826419-20041130-M00005.png) * | 1987-12-28 | 1989-07-13 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55153338A (en) * | 1979-05-18 | 1980-11-29 | Fujitsu Ltd | Surface treatment of semiconductor substrate |
| DE3237235C2 (de) * | 1982-10-07 | 1986-07-10 | Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen | Verfahren zum Polieren von III-V-Halbleiteroberflächen |
| US5188987A (en) * | 1989-04-10 | 1993-02-23 | Kabushiki Kaisha Toshiba | Method of manufacturing a semiconductor device using a polishing step prior to a selective vapor growth step |
| US8623318B2 (en) * | 2004-07-12 | 2014-01-07 | Powell Technologies Llc | Manufacture of high-strength, low-salt aqueous sodium hypochlorite bleach and substantially dry crystalline salt |
| US20070215280A1 (en) * | 2006-03-15 | 2007-09-20 | Sandhu Rajinder R | Semiconductor surface processing |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3342652A (en) * | 1964-04-02 | 1967-09-19 | Ibm | Chemical polishing of a semi-conductor substrate |
| US3738882A (en) * | 1971-10-14 | 1973-06-12 | Ibm | Method for polishing semiconductor gallium arsenide planar surfaces |
| US3775201A (en) * | 1971-10-26 | 1973-11-27 | Ibm | Method for polishing semiconductor gallium phosphide planar surfaces |
| US3869324A (en) * | 1973-12-28 | 1975-03-04 | Ibm | Method of polishing cadmium telluride |
-
1976
- 1976-01-13 DE DE19762600990 patent/DE2600990A1/de active Pending
- 1976-12-09 US US05/749,194 patent/US4043861A/en not_active Expired - Lifetime
-
1977
- 1977-01-13 JP JP285177A patent/JPS5287976A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01104265U (US06826419-20041130-M00005.png) * | 1987-12-28 | 1989-07-13 |
Also Published As
| Publication number | Publication date |
|---|---|
| US4043861A (en) | 1977-08-23 |
| DE2600990A1 (de) | 1977-07-21 |
| JPS5287976A (en) | 1977-07-22 |
