JPS5329277U - - Google Patents
Info
- Publication number
- JPS5329277U JPS5329277U JP11118376U JP11118376U JPS5329277U JP S5329277 U JPS5329277 U JP S5329277U JP 11118376 U JP11118376 U JP 11118376U JP 11118376 U JP11118376 U JP 11118376U JP S5329277 U JPS5329277 U JP S5329277U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11118376U JPS5329277U (en) | 1976-08-19 | 1976-08-19 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11118376U JPS5329277U (en) | 1976-08-19 | 1976-08-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5329277U true JPS5329277U (en) | 1978-03-13 |
Family
ID=28721021
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11118376U Pending JPS5329277U (en) | 1976-08-19 | 1976-08-19 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5329277U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6045252A (en) * | 1983-08-23 | 1985-03-11 | Canon Inc | Illuminating system of projecting and exposing device |
US7567368B2 (en) | 2005-01-06 | 2009-07-28 | Asml Holding N.V. | Systems and methods for minimizing scattered light in multi-SLM maskless lithography |
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1976
- 1976-08-19 JP JP11118376U patent/JPS5329277U/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6045252A (en) * | 1983-08-23 | 1985-03-11 | Canon Inc | Illuminating system of projecting and exposing device |
US7567368B2 (en) | 2005-01-06 | 2009-07-28 | Asml Holding N.V. | Systems and methods for minimizing scattered light in multi-SLM maskless lithography |