JPS53118190A - Concentration distribution analyzing method in depth direction - Google Patents

Concentration distribution analyzing method in depth direction

Info

Publication number
JPS53118190A
JPS53118190A JP3349477A JP3349477A JPS53118190A JP S53118190 A JPS53118190 A JP S53118190A JP 3349477 A JP3349477 A JP 3349477A JP 3349477 A JP3349477 A JP 3349477A JP S53118190 A JPS53118190 A JP S53118190A
Authority
JP
Japan
Prior art keywords
concentration distribution
depth direction
analyzing method
distribution analyzing
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3349477A
Other languages
Japanese (ja)
Inventor
Yoshiaki Yoshioka
Kenji Kusao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP3349477A priority Critical patent/JPS53118190A/en
Publication of JPS53118190A publication Critical patent/JPS53118190A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/227—Measuring photoelectric effect, e.g. photoelectron emission microscopy [PEEM]

Abstract

PURPOSE:To perform satisfactory analysis of element concentration distribution of structual elements going from the surface toward the inside by measuring the specimen etching quantity in a vacuum.
JP3349477A 1977-03-25 1977-03-25 Concentration distribution analyzing method in depth direction Pending JPS53118190A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3349477A JPS53118190A (en) 1977-03-25 1977-03-25 Concentration distribution analyzing method in depth direction

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3349477A JPS53118190A (en) 1977-03-25 1977-03-25 Concentration distribution analyzing method in depth direction

Publications (1)

Publication Number Publication Date
JPS53118190A true JPS53118190A (en) 1978-10-16

Family

ID=12388098

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3349477A Pending JPS53118190A (en) 1977-03-25 1977-03-25 Concentration distribution analyzing method in depth direction

Country Status (1)

Country Link
JP (1) JPS53118190A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014524654A (en) * 2011-08-22 2014-09-22 エクソジェネシス コーポレーション Method and apparatus for using an accelerated neutral beam to improve surface analysis

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014524654A (en) * 2011-08-22 2014-09-22 エクソジェネシス コーポレーション Method and apparatus for using an accelerated neutral beam to improve surface analysis

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