JPS5249990A - Method for vacuum evaporation of multi layr film - Google Patents

Method for vacuum evaporation of multi layr film

Info

Publication number
JPS5249990A
JPS5249990A JP12493975A JP12493975A JPS5249990A JP S5249990 A JPS5249990 A JP S5249990A JP 12493975 A JP12493975 A JP 12493975A JP 12493975 A JP12493975 A JP 12493975A JP S5249990 A JPS5249990 A JP S5249990A
Authority
JP
Japan
Prior art keywords
film
vacuum evaporation
layr
evaporation
multi layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12493975A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5521106B2 (enrdf_load_stackoverflow
Inventor
Hirotaka Nakano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP12493975A priority Critical patent/JPS5249990A/ja
Publication of JPS5249990A publication Critical patent/JPS5249990A/ja
Publication of JPS5521106B2 publication Critical patent/JPS5521106B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate
    • C23C14/545Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Physical Vapour Deposition (AREA)
JP12493975A 1975-10-17 1975-10-17 Method for vacuum evaporation of multi layr film Granted JPS5249990A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12493975A JPS5249990A (en) 1975-10-17 1975-10-17 Method for vacuum evaporation of multi layr film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12493975A JPS5249990A (en) 1975-10-17 1975-10-17 Method for vacuum evaporation of multi layr film

Publications (2)

Publication Number Publication Date
JPS5249990A true JPS5249990A (en) 1977-04-21
JPS5521106B2 JPS5521106B2 (enrdf_load_stackoverflow) 1980-06-07

Family

ID=14897914

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12493975A Granted JPS5249990A (en) 1975-10-17 1975-10-17 Method for vacuum evaporation of multi layr film

Country Status (1)

Country Link
JP (1) JPS5249990A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104647820A (zh) * 2015-03-16 2015-05-27 广东迪奥应用材料科技有限公司 一种具有ar和af功能的高硬度高介电常数的盖板

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57204185U (enrdf_load_stackoverflow) * 1981-06-19 1982-12-25
WO2002061169A1 (fr) * 2001-02-01 2002-08-08 Nikon Corporation Procede et dispositif pour former un film et procede de fabrication d'un element optique

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS495834A (enrdf_load_stackoverflow) * 1972-04-15 1974-01-19

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS495834A (enrdf_load_stackoverflow) * 1972-04-15 1974-01-19

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104647820A (zh) * 2015-03-16 2015-05-27 广东迪奥应用材料科技有限公司 一种具有ar和af功能的高硬度高介电常数的盖板

Also Published As

Publication number Publication date
JPS5521106B2 (enrdf_load_stackoverflow) 1980-06-07

Similar Documents

Publication Publication Date Title
JPS51145390A (en) Manufacturing method of a coated layer of oxygen senser
DK539875A (da) Fremgangsmade og apparat til fremstilling af tynde hinder af en forbindelse
FR2587543B1 (fr) Dispositif pour former un cristal de semi-conducteur
JPS523583A (en) Crystal film forming process
JPS5249990A (en) Method for vacuum evaporation of multi layr film
ES383073A1 (es) Procedimiento para mejorar superficies.
JPS51140560A (en) Method of monitoring homoepitaxy film thickness
JPS5256148A (en) Process for preparing active substances having improved
JPS53109475A (en) Manufacture for semiconductor device
JPS5234391A (en) Production method of transparent electrode film
JPS5265183A (en) Production process of thin film of compounds
JPS5374294A (en) Production method of thin film resistor
JPS524167A (en) Manufacturing process of p-n junction type solid element
JPS525682A (en) Sputtering apparatus for long length substrates
JPS5397983A (en) Controlling method and apparatus for thickness of vacuum deposited film
JPS5253781A (en) Method of producing thin film by spattering
JPS5232694A (en) Manufacturing method of solid pickup device
JPS51144400A (en) Process for production of thin film silicon nitride
JPS5274329A (en) Production of stylus for video disc apparatus
JPS51142973A (en) Production method of flat multi figure display unit
JPS51117981A (en) Optical multi-layer film depositing apparatus
JPS51147483A (en) An evaporating apparatus
JPS51147263A (en) Etching method of insulating film
JPS5249796A (en) Method for manufacture of thin film tunnel element
JPS5235590A (en) Manufacturing process of pickup tube target