JPS5243069B2 - - Google Patents

Info

Publication number
JPS5243069B2
JPS5243069B2 JP51074186A JP7418676A JPS5243069B2 JP S5243069 B2 JPS5243069 B2 JP S5243069B2 JP 51074186 A JP51074186 A JP 51074186A JP 7418676 A JP7418676 A JP 7418676A JP S5243069 B2 JPS5243069 B2 JP S5243069B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP51074186A
Other languages
Japanese (ja)
Other versions
JPS5242080A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP51074186A priority Critical patent/JPS5242080A/en
Publication of JPS5242080A publication Critical patent/JPS5242080A/en
Publication of JPS5243069B2 publication Critical patent/JPS5243069B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007Multistep manufacturing processes
    • H01L29/66075Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66409Unipolar field-effect transistors
    • H01L29/66477Unipolar field-effect transistors with an insulated gate, i.e. MISFET
    • H01L29/66674DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
    • H01L29/66681Lateral DMOS transistors, i.e. LDMOS transistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/423Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
    • H01L29/42312Gate electrodes for field effect devices
    • H01L29/42316Gate electrodes for field effect devices for field-effect transistors
    • H01L29/4232Gate electrodes for field effect devices for field-effect transistors with insulated gate
    • H01L29/42364Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the insulating layer, e.g. thickness or uniformity
    • H01L29/42368Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the insulating layer, e.g. thickness or uniformity the thickness being non-uniform
JP51074186A 1976-06-23 1976-06-23 Micro channel type insulated gate field effect transistor and process for productin thereof Granted JPS5242080A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51074186A JPS5242080A (en) 1976-06-23 1976-06-23 Micro channel type insulated gate field effect transistor and process for productin thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51074186A JPS5242080A (en) 1976-06-23 1976-06-23 Micro channel type insulated gate field effect transistor and process for productin thereof

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP10492771A Division JPS53674B2 (en) 1971-12-23 1971-12-23

Publications (2)

Publication Number Publication Date
JPS5242080A JPS5242080A (en) 1977-04-01
JPS5243069B2 true JPS5243069B2 (en) 1977-10-28

Family

ID=13539877

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51074186A Granted JPS5242080A (en) 1976-06-23 1976-06-23 Micro channel type insulated gate field effect transistor and process for productin thereof

Country Status (1)

Country Link
JP (1) JPS5242080A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5191396B1 (en) * 1978-10-13 1995-12-26 Int Rectifier Corp High power mosfet with low on-resistance and high breakdown voltage
JPS5553462A (en) * 1978-10-13 1980-04-18 Int Rectifier Corp Mosfet element
US5869371A (en) * 1995-06-07 1999-02-09 Stmicroelectronics, Inc. Structure and process for reducing the on-resistance of mos-gated power devices

Also Published As

Publication number Publication date
JPS5242080A (en) 1977-04-01

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