JPS5234669A - Gaseous phase growing apparatus of semiconductor - Google Patents

Gaseous phase growing apparatus of semiconductor

Info

Publication number
JPS5234669A
JPS5234669A JP11033075A JP11033075A JPS5234669A JP S5234669 A JPS5234669 A JP S5234669A JP 11033075 A JP11033075 A JP 11033075A JP 11033075 A JP11033075 A JP 11033075A JP S5234669 A JPS5234669 A JP S5234669A
Authority
JP
Japan
Prior art keywords
semiconductor
gaseous phase
growing apparatus
phase growing
stainless steel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11033075A
Other languages
Japanese (ja)
Other versions
JPS5841656B2 (en
Inventor
Harushige Kurokawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
Original Assignee
Kokusai Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Electric Corp filed Critical Kokusai Electric Corp
Priority to JP11033075A priority Critical patent/JPS5841656B2/en
Publication of JPS5234669A publication Critical patent/JPS5234669A/en
Publication of JPS5841656B2 publication Critical patent/JPS5841656B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45502—Flow conditions in reaction chamber
    • C23C16/45508—Radial flow
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber

Abstract

PURPOSE:To prevent gas leaks by fixing a quartz bell jar onto the cylindrical stainless steel stand in air-tight condition, and by arranging the stainless steel stand on the base in such a way that the former can be opened and closed freely.
JP11033075A 1975-09-11 1975-09-11 Hand-painted construction Expired JPS5841656B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11033075A JPS5841656B2 (en) 1975-09-11 1975-09-11 Hand-painted construction

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11033075A JPS5841656B2 (en) 1975-09-11 1975-09-11 Hand-painted construction

Publications (2)

Publication Number Publication Date
JPS5234669A true JPS5234669A (en) 1977-03-16
JPS5841656B2 JPS5841656B2 (en) 1983-09-13

Family

ID=14532993

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11033075A Expired JPS5841656B2 (en) 1975-09-11 1975-09-11 Hand-painted construction

Country Status (1)

Country Link
JP (1) JPS5841656B2 (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56135021A (en) * 1980-03-25 1981-10-22 Nippon Kokan Kk <Nkk> Lining for internal surface of welded part of steel pipe
JPS5983031U (en) * 1982-11-27 1984-06-05 東芝機械株式会社 Vertical vapor phase growth equipment
JPS61155377U (en) * 1985-03-19 1986-09-26
US5520142A (en) * 1994-03-28 1996-05-28 Tokyo Electron Kabushiki Kaisha Decompression container
US5676757A (en) * 1994-03-28 1997-10-14 Tokyo Electron Limited Decompression container
US20090297725A1 (en) * 2005-07-21 2009-12-03 Ray William Reynoldson Duplex Surface Treatment of Metal Objects
CN104103556A (en) * 2013-04-05 2014-10-15 古河机械金属株式会社 Bell-shaped Cover And Vacuum Processing Device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56135021A (en) * 1980-03-25 1981-10-22 Nippon Kokan Kk <Nkk> Lining for internal surface of welded part of steel pipe
JPS5983031U (en) * 1982-11-27 1984-06-05 東芝機械株式会社 Vertical vapor phase growth equipment
JPS61155377U (en) * 1985-03-19 1986-09-26
US5520142A (en) * 1994-03-28 1996-05-28 Tokyo Electron Kabushiki Kaisha Decompression container
US5676757A (en) * 1994-03-28 1997-10-14 Tokyo Electron Limited Decompression container
US20090297725A1 (en) * 2005-07-21 2009-12-03 Ray William Reynoldson Duplex Surface Treatment of Metal Objects
US8317926B2 (en) * 2005-07-21 2012-11-27 Hard Technologies Pty Ltd. Duplex surface treatment of metal objects
CN104103556A (en) * 2013-04-05 2014-10-15 古河机械金属株式会社 Bell-shaped Cover And Vacuum Processing Device
JP2014201803A (en) * 2013-04-05 2014-10-27 古河機械金属株式会社 Bell jar and vacuum processing device

Also Published As

Publication number Publication date
JPS5841656B2 (en) 1983-09-13

Similar Documents

Publication Publication Date Title
JPS5234669A (en) Gaseous phase growing apparatus of semiconductor
JPS51151264A (en) A reliquefying apparatus of evaporation gas
JPS51151265A (en) A reliquefying apparatus of evaporation gas
JPS51142396A (en) Gas detection method and device which detects selectively the reductio n gas of specified kinds
CA566917A (en) Method and apparatus for odorizing liquefied gas
CA533567A (en) Process of and apparatus for regulating the mixing ratio of a gas and a vapor
CA582214A (en) Process and apparatus for promptly detecting chlorine gas leaks from chlorine containers
CA882419A (en) Process and apparatus for vaporizing liquefied natural gas
CA528664A (en) Apparatus for mixing air and liquefied petroleum gases
CA520679A (en) Apparatus for signalling the escape of illuminating gas and other similar combustible gases
JPS525006A (en) Supporting construction for radiation-sealed devices of a low-temperat ure apparatus
CA612431A (en) Method and apparatus for preparing natural gas for liquefaction
CA528231A (en) Method and apparatus for promoting gas phase chemical reactions
CA581014A (en) Process and apparatus for recovering hydrocarbons from gas streams
CA530497A (en) Apparatus and procedure for continuous gas analysis
CA532288A (en) Apparatus for starting and operating gaseous discharge devices
CA516122A (en) Apparatus and process for treating a liquid with a gas
AU211299B2 (en) Improvements in stoves andother apparatus using a combustible gas liquefied under pressure
CA570642A (en) Mobile gas detecting apparatus and method
CA520490A (en) Apparatus for igniting and operating gaseous discharge devices
JPS51133186A (en) A high purity gas system of liquid phase crystal growth apparatus
JPS51140881A (en) A process for production of liquid air using the coldness of liquefied natural gas
JPS51140880A (en) A process for production of liquid air using the coldness of liquefied natural gas
CA522885A (en) Apparatus for producing carbon black from gaseous and vaporous hydrocarbons
CA546273A (en) Method and apparatus for storing cold, liquefied combustible gas