JPS52143775A - Reduction projecting and printing method and reduction projecting and printing apparatus used in this method - Google Patents

Reduction projecting and printing method and reduction projecting and printing apparatus used in this method

Info

Publication number
JPS52143775A
JPS52143775A JP6003276A JP6003276A JPS52143775A JP S52143775 A JPS52143775 A JP S52143775A JP 6003276 A JP6003276 A JP 6003276A JP 6003276 A JP6003276 A JP 6003276A JP S52143775 A JPS52143775 A JP S52143775A
Authority
JP
Japan
Prior art keywords
printing
reduction projecting
reduction
apparatus used
projecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6003276A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6132816B2 (enrdf_load_stackoverflow
Inventor
Kiyoshi Nakagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6003276A priority Critical patent/JPS52143775A/ja
Publication of JPS52143775A publication Critical patent/JPS52143775A/ja
Publication of JPS6132816B2 publication Critical patent/JPS6132816B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Projection-Type Copiers In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP6003276A 1976-05-26 1976-05-26 Reduction projecting and printing method and reduction projecting and printing apparatus used in this method Granted JPS52143775A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6003276A JPS52143775A (en) 1976-05-26 1976-05-26 Reduction projecting and printing method and reduction projecting and printing apparatus used in this method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6003276A JPS52143775A (en) 1976-05-26 1976-05-26 Reduction projecting and printing method and reduction projecting and printing apparatus used in this method

Publications (2)

Publication Number Publication Date
JPS52143775A true JPS52143775A (en) 1977-11-30
JPS6132816B2 JPS6132816B2 (enrdf_load_stackoverflow) 1986-07-29

Family

ID=13130313

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6003276A Granted JPS52143775A (en) 1976-05-26 1976-05-26 Reduction projecting and printing method and reduction projecting and printing apparatus used in this method

Country Status (1)

Country Link
JP (1) JPS52143775A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4615614A (en) * 1983-03-16 1986-10-07 Hitachi, Ltd. Optical exposure apparatus

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6256621A (ja) * 1985-09-04 1987-03-12 Ngk Spark Plug Co Ltd セラミツク軸と金属軸の接合構造

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4615614A (en) * 1983-03-16 1986-10-07 Hitachi, Ltd. Optical exposure apparatus
WO1987002178A1 (en) * 1983-03-16 1987-04-09 Shuji Sugiyama Optical exposure apparatus

Also Published As

Publication number Publication date
JPS6132816B2 (enrdf_load_stackoverflow) 1986-07-29

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