JPS52141587A - Semiconductor device and its process - Google Patents

Semiconductor device and its process

Info

Publication number
JPS52141587A
JPS52141587A JP5865076A JP5865076A JPS52141587A JP S52141587 A JPS52141587 A JP S52141587A JP 5865076 A JP5865076 A JP 5865076A JP 5865076 A JP5865076 A JP 5865076A JP S52141587 A JPS52141587 A JP S52141587A
Authority
JP
Japan
Prior art keywords
semiconductor device
injector
diffusion
hfe
deeply
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5865076A
Other languages
Japanese (ja)
Inventor
Haruyasu Yamada
Tsutomu Fujita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP5865076A priority Critical patent/JPS52141587A/en
Publication of JPS52141587A publication Critical patent/JPS52141587A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0214Particular design considerations for integrated circuits for internal polarisation, e.g. I2L
    • H01L27/0229Particular design considerations for integrated circuits for internal polarisation, e.g. I2L of bipolar structures
    • H01L27/0233Integrated injection logic structures [I2L]
    • H01L27/0244I2L structures integrated in combination with analog structures

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Bipolar Transistors (AREA)
  • Bipolar Integrated Circuits (AREA)

Abstract

PURPOSE:To improve the hFE of the pnp transistor by forming a diffused layer of injector simultaneously with the isolation diffusion or by diffusing the injector deeply independently of the base diffusion of npn transistor.
JP5865076A 1976-05-20 1976-05-20 Semiconductor device and its process Pending JPS52141587A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5865076A JPS52141587A (en) 1976-05-20 1976-05-20 Semiconductor device and its process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5865076A JPS52141587A (en) 1976-05-20 1976-05-20 Semiconductor device and its process

Publications (1)

Publication Number Publication Date
JPS52141587A true JPS52141587A (en) 1977-11-25

Family

ID=13090450

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5865076A Pending JPS52141587A (en) 1976-05-20 1976-05-20 Semiconductor device and its process

Country Status (1)

Country Link
JP (1) JPS52141587A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5527697A (en) * 1978-08-11 1980-02-27 Siemens Ag Bipolar semiconductor integrated circuit and method of manufacturing same

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS515974A (en) * 1974-05-31 1976-01-19 Itt
JPS516487A (en) * 1974-07-05 1976-01-20 Hitachi Ltd
JPS5132285A (en) * 1974-09-13 1976-03-18 Hitachi Ltd
JPS5150585A (en) * 1974-10-30 1976-05-04 Tokyo Shibaura Electric Co
JPS5154379A (en) * 1974-10-29 1976-05-13 Fairchild Camera Instr Co

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS515974A (en) * 1974-05-31 1976-01-19 Itt
JPS516487A (en) * 1974-07-05 1976-01-20 Hitachi Ltd
JPS5132285A (en) * 1974-09-13 1976-03-18 Hitachi Ltd
JPS5154379A (en) * 1974-10-29 1976-05-13 Fairchild Camera Instr Co
JPS5150585A (en) * 1974-10-30 1976-05-04 Tokyo Shibaura Electric Co

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5527697A (en) * 1978-08-11 1980-02-27 Siemens Ag Bipolar semiconductor integrated circuit and method of manufacturing same

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