JPS52102684A - Apparatus for establishing parallel of head for shim correction - Google Patents

Apparatus for establishing parallel of head for shim correction

Info

Publication number
JPS52102684A
JPS52102684A JP15328876A JP15328876A JPS52102684A JP S52102684 A JPS52102684 A JP S52102684A JP 15328876 A JP15328876 A JP 15328876A JP 15328876 A JP15328876 A JP 15328876A JP S52102684 A JPS52102684 A JP S52102684A
Authority
JP
Japan
Prior art keywords
head
establishing parallel
shim correction
shim
correction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15328876A
Other languages
English (en)
Inventor
Jiyusu Binfuriito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SUESS KG KARL
Original Assignee
SUESS KG KARL
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SUESS KG KARL filed Critical SUESS KG KARL
Publication of JPS52102684A publication Critical patent/JPS52102684A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP15328876A 1976-02-25 1976-12-20 Apparatus for establishing parallel of head for shim correction Pending JPS52102684A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762607607 DE2607607C2 (de) 1976-02-25 1976-02-25 Parallelisierlehre in einem Keilfehlerkorrekturkopf

Publications (1)

Publication Number Publication Date
JPS52102684A true JPS52102684A (en) 1977-08-29

Family

ID=5970809

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15328876A Pending JPS52102684A (en) 1976-02-25 1976-12-20 Apparatus for establishing parallel of head for shim correction

Country Status (5)

Country Link
US (1) US4136459A (ja)
JP (1) JPS52102684A (ja)
DE (1) DE2607607C2 (ja)
GB (1) GB1540621A (ja)
NL (1) NL7700461A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017027028A (ja) * 2015-07-15 2017-02-02 ズス・マイクロテック・リソグラフィ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングＳｕｓｓ ＭｉｃｒｏＴｅｃ Ｌｉｔｈｏｇｒａｐｈｙ ＧｍｂＨ ウエハ照明ユニット用スペーサー変位装置、及びウエハ照明ユニット

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4868992A (en) * 1988-04-22 1989-09-26 Intel Corporation Anode cathode parallelism gap gauge
DE19741487C2 (de) * 1997-09-19 2000-08-31 Univ Eberhard Karls Vorrichtung für einen Zugang in den Subretinalraum eines Auges
DE102010007970A1 (de) 2010-02-15 2011-08-18 Suss MicroTec Lithography GmbH, 85748 Verfahren und Vorrichtung zum aktiven Keilfehlerausgleich zwischen zwei im wesentlichen zueinander parallel positionierbaren Gegenständen
CN114815521B (zh) * 2022-05-07 2022-11-04 魅杰光电科技(上海)有限公司 一种楔形误差补偿装置及其相应的补偿楔形误差的方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4866975A (ja) * 1971-12-17 1973-09-13

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1411351A (en) * 1918-11-19 1922-04-04 United Shoe Machinery Corp Device for forming heel lifts
US1818167A (en) * 1930-01-20 1931-08-11 Sears Edward Chuck for machine tools
US2906205A (en) * 1955-08-02 1959-09-29 American Viscose Corp Humidifier and control system
US3988865A (en) * 1973-03-02 1976-11-02 Charles Weisman Clamp and jig for use therewith
US3858978A (en) * 1973-08-10 1975-01-07 Kasper Instruments Chuck for use in out-of-contact optical alignment and exposure apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4866975A (ja) * 1971-12-17 1973-09-13

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017027028A (ja) * 2015-07-15 2017-02-02 ズス・マイクロテック・リソグラフィ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングＳｕｓｓ ＭｉｃｒｏＴｅｃ Ｌｉｔｈｏｇｒａｐｈｙ ＧｍｂＨ ウエハ照明ユニット用スペーサー変位装置、及びウエハ照明ユニット

Also Published As

Publication number Publication date
NL7700461A (nl) 1977-08-29
DE2607607C2 (de) 1977-12-08
DE2607607B1 (de) 1977-02-24
GB1540621A (en) 1979-02-14
US4136459A (en) 1979-01-30

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