JPS52100195A - Permanent magnet for electronic lens - Google Patents
Permanent magnet for electronic lensInfo
- Publication number
- JPS52100195A JPS52100195A JP1603776A JP1603776A JPS52100195A JP S52100195 A JPS52100195 A JP S52100195A JP 1603776 A JP1603776 A JP 1603776A JP 1603776 A JP1603776 A JP 1603776A JP S52100195 A JPS52100195 A JP S52100195A
- Authority
- JP
- Japan
- Prior art keywords
- permanent magnet
- electronic lens
- magnetism
- electronic
- deviated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To reduce distortion of electronic image due to deviated magnetism of a permanent magnet by providing a magnetism relieving plate between two or more ring-stated permanent magnets.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1603776A JPS52100195A (en) | 1976-02-18 | 1976-02-18 | Permanent magnet for electronic lens |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1603776A JPS52100195A (en) | 1976-02-18 | 1976-02-18 | Permanent magnet for electronic lens |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52100195A true JPS52100195A (en) | 1977-08-22 |
Family
ID=11905375
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1603776A Pending JPS52100195A (en) | 1976-02-18 | 1976-02-18 | Permanent magnet for electronic lens |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52100195A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009157054A1 (en) * | 2008-06-24 | 2009-12-30 | 株式会社アドバンテスト | Multicolumn electron beam exposure apparatus and magnetic field generating apparatus |
JP2014194923A (en) * | 2013-02-27 | 2014-10-09 | Param Co Ltd | Electron lens and electron beam device |
-
1976
- 1976-02-18 JP JP1603776A patent/JPS52100195A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009157054A1 (en) * | 2008-06-24 | 2009-12-30 | 株式会社アドバンテスト | Multicolumn electron beam exposure apparatus and magnetic field generating apparatus |
US8390201B2 (en) | 2008-06-24 | 2013-03-05 | Advantest Corp. | Multi-column electron beam exposure apparatus and magnetic field generation device |
JP5363480B2 (en) * | 2008-06-24 | 2013-12-11 | 株式会社アドバンテスト | Multi-column electron beam exposure apparatus and magnetic field generator |
JP2014194923A (en) * | 2013-02-27 | 2014-10-09 | Param Co Ltd | Electron lens and electron beam device |
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